BE615056A - - Google Patents

Info

Publication number
BE615056A
BE615056A BE615056DA BE615056A BE 615056 A BE615056 A BE 615056A BE 615056D A BE615056D A BE 615056DA BE 615056 A BE615056 A BE 615056A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE615056A publication Critical patent/BE615056A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE615056D 1961-03-15 BE615056A (en17)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEK43194A DE1206308B (de) 1961-03-15 1961-03-15 Lichtempfindliche Schicht mit gerbenden Eigenschaften
DEK0050933 1963-09-26

Publications (1)

Publication Number Publication Date
BE615056A true BE615056A (en17)

Family

ID=25983383

Family Applications (2)

Application Number Title Priority Date Filing Date
BE615056D BE615056A (en17) 1961-03-15
BE653467A BE653467A (en17) 1961-03-15 1964-09-23

Family Applications After (1)

Application Number Title Priority Date Filing Date
BE653467A BE653467A (en17) 1961-03-15 1964-09-23

Country Status (7)

Country Link
US (2) US3189451A (en17)
BE (2) BE653467A (en17)
CH (2) CH419833A (en17)
DE (2) DE1206308B (en17)
GB (2) GB998838A (en17)
NL (2) NL6410778A (en17)
SE (2) SE317257B (en17)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE615056A (en17) * 1961-03-15
DE1224611B (de) * 1963-09-25 1966-09-08 Kalle Ag Lichtempfindliches Kopiermaterial fuer die Diazotypie mit 2, 5-Dialkoxy-4-tert.-aminobenzol-diazoniumsalzen
US3390992A (en) * 1964-06-15 1968-07-02 North American Rockwell Non-etching circuit fabrication
US3463638A (en) * 1965-08-20 1969-08-26 Ibm Heat-fixable light-sensitive compositions and elements
DE2057473C2 (de) * 1970-11-23 1982-04-08 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
US3853561A (en) * 1970-11-26 1974-12-10 Hoechst Ag Process for the preparation of screen printing stencils using intermediate support for light sensitive layer
DE2058178C2 (de) * 1970-11-26 1982-04-01 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung von Siebdruckformen
DE2522225C2 (de) * 1975-05-20 1983-12-08 Nippon Paint Co., Ltd., Osaka Wässriges lichtempfindliches Gemisch und seine Verwendung für die Herstellung von Siebdruckschablonen
US4154614A (en) * 1975-07-02 1979-05-15 Nippon Paint Co., Ltd. Photosensitive diazo composition with graft copolymer for use in printing screen
FR2411432A1 (fr) * 1977-12-09 1979-07-06 Issec Labo Physicochimie Appli Procede d'impressions couleur photochimique et dispositif pour sa mise en oeuvre
AU557375B2 (en) * 1981-06-19 1986-12-18 Sericol Group Ltd. Photo sensitive compositions and their use
DE3135804A1 (de) * 1981-09-10 1983-03-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
EP0363504A1 (en) * 1988-10-10 1990-04-18 Dräger Nederland B.V. Method of providing a substrate with a layer comprising a polyvinylbased hydrogel and a biochemically active material
FR2866887A1 (fr) * 2004-02-27 2005-09-02 Oreal Para-phenylenediamine secondaire n-heteroaryle, compositon tinctoriale comprenant une telle para-phenylenediamine, procede mettant en oeuvre cette composition et utilisation
US7329288B2 (en) 2004-02-27 2008-02-12 L'oreal S.A. N-heteroaryl secondary para-phenylenediamine, a dye composition comprising such a para-phenylenediamine, a process for preparing this composition and use thereof

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2679498A (en) * 1954-05-25 Atent office
DE596731C (de) * 1932-05-23 1934-05-09 Kalle & Co Akt Ges Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen
NL70798C (en17) * 1948-10-15
NL150528B (nl) * 1949-05-14 Hollandse Signaalapparaten Bv Werkwijze voor het vervaardigen van twistloos of nagenoeg twistloos garen en het door toepassing van deze werkwijze verkregen garen.
US2690968A (en) * 1952-10-04 1954-10-05 Powers Chemco Inc Development of diazo and azide sensitized colloids
NL92615C (en17) * 1953-05-28
US2937085A (en) * 1954-01-11 1960-05-17 Ditto Inc Composite photosensitive plate, and method of making printing plate therefrom
US3012886A (en) * 1954-05-10 1961-12-12 Harry H Lerner Emulsion coating and method of preparation
US3029146A (en) * 1955-02-25 1962-04-10 Azoplate Corp Reproduction material
BE549814A (en17) * 1955-07-29
AT209359B (de) * 1958-01-22 1960-06-10 Kalle & Co Ag Lichtempfindliches Reproduktionsmaterial, bestehend aus Schichtträger und lichtempfindlicher Kolloidschicht
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
US2976152A (en) * 1958-12-19 1961-03-21 Gen Aniline & Film Corp Photographic gelatin layers containing triazine hardeners
BE595534A (en17) * 1959-10-02
BE615056A (en17) * 1961-03-15

Also Published As

Publication number Publication date
DE1206308B (de) 1965-12-02
GB1069366A (en) 1967-05-17
CH419833A (de) 1966-08-31
NL6410778A (en17) 1965-03-29
GB998838A (en) 1965-07-21
US3322541A (en) 1967-05-30
NL275561A (en17)
US3189451A (en) 1965-06-15
SE317257B (en17) 1969-11-10
SE334813B (en17) 1971-05-03
CH459760A (de) 1968-07-15
BE653467A (en17) 1965-03-23
DE1447729B (de) 1969-09-04

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