AU5651399A - Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system - Google Patents

Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system

Info

Publication number
AU5651399A
AU5651399A AU56513/99A AU5651399A AU5651399A AU 5651399 A AU5651399 A AU 5651399A AU 56513/99 A AU56513/99 A AU 56513/99A AU 5651399 A AU5651399 A AU 5651399A AU 5651399 A AU5651399 A AU 5651399A
Authority
AU
Australia
Prior art keywords
exposure
exposure system
wafer treating
controlling wafer
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU56513/99A
Other languages
English (en)
Inventor
Toshihiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU5651399A publication Critical patent/AU5651399A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU56513/99A 1999-09-14 1999-09-14 Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system Abandoned AU5651399A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1999/005026 WO2001020650A1 (fr) 1999-09-14 1999-09-14 Systeme d'exposition, dispositif d'exposition, dispositif d'application, dispositif de developpement, et procede de regulation de l'environnement de traitement de plaquette dans le systeme d'exposition

Publications (1)

Publication Number Publication Date
AU5651399A true AU5651399A (en) 2001-04-17

Family

ID=14236716

Family Applications (1)

Application Number Title Priority Date Filing Date
AU56513/99A Abandoned AU5651399A (en) 1999-09-14 1999-09-14 Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system

Country Status (3)

Country Link
AU (1) AU5651399A (fr)
TW (1) TW430877B (fr)
WO (1) WO2001020650A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW594835B (en) 2000-05-09 2004-06-21 Tokyo Electron Ltd System for coating and developing
SG115631A1 (en) 2003-03-11 2005-10-28 Asml Netherlands Bv Lithographic projection assembly, load lock and method for transferring objects
EP1457832A1 (fr) * 2003-03-11 2004-09-15 ASML Netherlands B.V. Ensemble de projection lithographique, sas de chargement et méthode de transfert d'objets
WO2005006417A1 (fr) * 2003-07-09 2005-01-20 Nikon Corporation Dispositif d'exposition et procede de fabrication
JP4759272B2 (ja) * 2005-01-13 2011-08-31 ルネサスエレクトロニクス株式会社 露光装置
JP2006286709A (ja) * 2005-03-31 2006-10-19 Toppan Printing Co Ltd 露光装置及び露光装置を用いたフォトレジストパターン形成方法
JP5304647B2 (ja) 2007-06-28 2013-10-02 富士通セミコンダクター株式会社 熱処理装置、及び半導体装置の製造方法
CN113721429A (zh) * 2021-09-10 2021-11-30 大连理工大学 一种无掩模光刻系统及其对应的光刻方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6079358A (ja) * 1983-10-07 1985-05-07 Nippon Kogaku Kk <Nikon> 投影光学装置
JPH0590133A (ja) * 1991-09-27 1993-04-09 Matsushita Electric Ind Co Ltd Ｘ線露光装置

Also Published As

Publication number Publication date
TW430877B (en) 2001-04-21
WO2001020650A1 (fr) 2001-03-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase