AU564776B2 - Depositing thin transmissive film on semiconductor - Google Patents

Depositing thin transmissive film on semiconductor

Info

Publication number
AU564776B2
AU564776B2 AU22231/83A AU2223183A AU564776B2 AU 564776 B2 AU564776 B2 AU 564776B2 AU 22231/83 A AU22231/83 A AU 22231/83A AU 2223183 A AU2223183 A AU 2223183A AU 564776 B2 AU564776 B2 AU 564776B2
Authority
AU
Australia
Prior art keywords
semiconductor
transmissive film
depositing thin
thin transmissive
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU22231/83A
Other languages
English (en)
Other versions
AU2223183A (en
Inventor
Prem Nath
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23779157&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=AU564776(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of AU2223183A publication Critical patent/AU2223183A/en
Application granted granted Critical
Publication of AU564776B2 publication Critical patent/AU564776B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H10F71/107—Continuous treatment of the devices, e.g. roll-to roll processes or multi-chamber deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photovoltaic Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Non-Insulated Conductors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)
AU22231/83A 1982-12-09 1983-12-08 Depositing thin transmissive film on semiconductor Ceased AU564776B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US448139 1982-12-09
US06/448,139 US4605565A (en) 1982-12-09 1982-12-09 Method of depositing a highly conductive, highly transmissive film

Publications (2)

Publication Number Publication Date
AU2223183A AU2223183A (en) 1984-06-14
AU564776B2 true AU564776B2 (en) 1987-08-27

Family

ID=23779157

Family Applications (1)

Application Number Title Priority Date Filing Date
AU22231/83A Ceased AU564776B2 (en) 1982-12-09 1983-12-08 Depositing thin transmissive film on semiconductor

Country Status (12)

Country Link
US (1) US4605565A (enExample)
EP (1) EP0112132B1 (enExample)
JP (1) JPH0622202B2 (enExample)
KR (1) KR910007380B1 (enExample)
AU (1) AU564776B2 (enExample)
BR (1) BR8306745A (enExample)
CA (1) CA1219968A (enExample)
DE (1) DE3379489D1 (enExample)
ES (2) ES527828A0 (enExample)
IN (1) IN163675B (enExample)
MX (1) MX155196A (enExample)
ZA (1) ZA838885B (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4514437A (en) * 1984-05-02 1985-04-30 Energy Conversion Devices, Inc. Apparatus for plasma assisted evaporation of thin films and corresponding method of deposition
US4639277A (en) * 1984-07-02 1987-01-27 Eastman Kodak Company Semiconductor material on a substrate, said substrate comprising, in order, a layer of organic polymer, a layer of metal or metal alloy and a layer of dielectric material
DE3781990T2 (de) * 1986-03-12 1993-02-18 Murayama Yoichi Kontinuierliche plattierungsanordnung eines schnell bewegenden films.
JPH0734332B2 (ja) * 1986-03-12 1995-04-12 株式会社ト−ビ 透明導電性フイルムの製造方法
US4842705A (en) * 1987-06-04 1989-06-27 Siemens Aktiengesellschaft Method for manufacturing transparent conductive indium-tin oxide layers
JP2686266B2 (ja) * 1988-01-28 1997-12-08 株式会社日立製作所 受光素子の製造方法
US5008215A (en) * 1989-07-07 1991-04-16 Industrial Technology Research Institute Process for preparing high sensitivity semiconductive magnetoresistance element
US5462771A (en) * 1992-11-09 1995-10-31 Akira Motoki Method of manufacturing electromagnetic wave shielding plastic molding
US5698262A (en) * 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
US6153271A (en) * 1999-12-30 2000-11-28 General Vacuum, Inc. Electron beam evaporation of transparent indium tin oxide
KR20010078862A (ko) * 2001-05-02 2001-08-22 조육형 산화물 증착 플라스틱 필름의 연속 열처리 방법 및 시스템
EP1289025A1 (fr) * 2001-08-30 2003-03-05 Universite De Neuchatel Procédé de dépot d'une couche d'oxyde sur un substrat et cellule photovoltaique utilisant ce substrat
DE60334998D1 (de) * 2002-08-28 2010-12-30 Moxtronics Inc Hybridstrahl-beschichtungssystem und verfahren zur herstellung von zno-schichten
WO2004072329A1 (en) * 2003-02-14 2004-08-26 The University Of Hong Kong Device for and method of generating ozone
US20070054158A1 (en) * 2005-09-07 2007-03-08 Ovshinsky Stanford R Combination of photovoltaic devices and batteries which utilize a solid polymeric electrolyte
US9276142B2 (en) 2010-12-17 2016-03-01 First Solar, Inc. Methods for forming a transparent oxide layer for a photovoltaic device
US8476105B2 (en) 2010-12-22 2013-07-02 General Electric Company Method of making a transparent conductive oxide layer and a photovoltaic device
JP2014107421A (ja) * 2012-11-28 2014-06-09 Shimadzu Corp 成膜装置、放射線検出器および放射線検出器の製造方法
JP6419091B2 (ja) * 2014-01-28 2018-11-07 株式会社カネカ 透明電極付き基板およびその製造方法
RU2609764C1 (ru) * 2015-10-26 2017-02-02 Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский университет "Московский институт электронной техники" (МИЭТ) Способ получения аморфных пленок халькогенидных стеклообразных полупроводников с эффектом фазовой памяти

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4170662A (en) * 1974-11-05 1979-10-09 Eastman Kodak Company Plasma plating
US4342631A (en) * 1980-06-16 1982-08-03 Illinois Tool Works Inc. Gasless ion plating process and apparatus
US4336277A (en) * 1980-09-29 1982-06-22 The Regents Of The University Of California Transparent electrical conducting films by activated reactive evaporation
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
US4417092A (en) * 1981-03-16 1983-11-22 Exxon Research And Engineering Co. Sputtered pin amorphous silicon semi-conductor device and method therefor
JPS5880877A (ja) * 1981-11-10 1983-05-16 Konishiroku Photo Ind Co Ltd 太陽電池及びその製造方法

Also Published As

Publication number Publication date
CA1219968A (en) 1987-03-31
ES8505838A1 (es) 1985-06-16
EP0112132A2 (en) 1984-06-27
DE3379489D1 (en) 1989-04-27
IN163675B (enExample) 1988-10-29
ES527828A0 (es) 1985-06-16
ES8700977A1 (es) 1986-11-16
EP0112132A3 (en) 1985-07-03
ES540320A0 (es) 1986-11-16
US4605565A (en) 1986-08-12
ZA838885B (en) 1984-07-25
JPS59117178A (ja) 1984-07-06
EP0112132B1 (en) 1989-03-22
KR910007380B1 (ko) 1991-09-25
MX155196A (es) 1988-02-01
AU2223183A (en) 1984-06-14
BR8306745A (pt) 1984-07-17
JPH0622202B2 (ja) 1994-03-23
KR850003480A (ko) 1985-06-17

Similar Documents

Publication Publication Date Title
AU564776B2 (en) Depositing thin transmissive film on semiconductor
AU554467B2 (en) Thin film electroluminescence structure
DE3370238D1 (en) Thin film deposition by sputtering
AU544194B2 (en) Oriented polypropylene film substrate
AU524505B2 (en) Depositing semiconductor andother films
GB8325412D0 (en) Depositing carbon film on substrate
AU561373B2 (en) Laminated film
GB8421403D0 (en) Thin film transistor
GB2077994B (en) Thin film transistors
GB8411967D0 (en) Thin film transistors
AU7900881A (en) Multi directionally oriented films
GB2084795B (en) Thin film transistor
AU564785B2 (en) Film biaxial orientation
AU4954579A (en) Multi-layer film
AU1757283A (en) Optically enhanced thin film photovoltaic device
GB8334314D0 (en) Thin film transistor
AU554058B2 (en) Thin film transistor
AU540804B2 (en) Polymer-controlled film unit
AU4341685A (en) Thin film field effect transistor utilizing a polypnicitide semiconductor
EP0257103A4 (en) DEVICE FOR FORMING THIN FILMS.
DE3371801D1 (en) A substrate for manufacturing single crystal thin films
GB8311219D0 (en) Thin film transistor
AU568474B2 (en) Thin film deposition
GB8325495D0 (en) Depositing film onto substrate
AU544937B2 (en) Coated eva films

Legal Events

Date Code Title Description
MK14 Patent ceased section 143(a) (annual fees not paid) or expired