AU2003223392A1 - Planar optical waveguide assembly and method of preparing same - Google Patents

Planar optical waveguide assembly and method of preparing same

Info

Publication number
AU2003223392A1
AU2003223392A1 AU2003223392A AU2003223392A AU2003223392A1 AU 2003223392 A1 AU2003223392 A1 AU 2003223392A1 AU 2003223392 A AU2003223392 A AU 2003223392A AU 2003223392 A AU2003223392 A AU 2003223392A AU 2003223392 A1 AU2003223392 A1 AU 2003223392A1
Authority
AU
Australia
Prior art keywords
optical waveguide
planar optical
waveguide assembly
preparing same
preparing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003223392A
Other languages
English (en)
Inventor
Geoffrey Gardner
Randall Schmidt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of AU2003223392A1 publication Critical patent/AU2003223392A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3405—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • G02B1/046—Light guides characterised by the core material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/12097—Ridge, rib or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/121—Channel; buried or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Integrated Circuits (AREA)
AU2003223392A 2002-06-24 2003-03-28 Planar optical waveguide assembly and method of preparing same Abandoned AU2003223392A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/179,096 2002-06-24
US10/179,096 US6905904B2 (en) 2002-06-24 2002-06-24 Planar optical waveguide assembly and method of preparing same
PCT/US2003/009699 WO2004001458A1 (en) 2002-06-24 2003-03-28 Planar optical waveguide assembly and method of preparing same

Publications (1)

Publication Number Publication Date
AU2003223392A1 true AU2003223392A1 (en) 2004-01-06

Family

ID=29734855

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003223392A Abandoned AU2003223392A1 (en) 2002-06-24 2003-03-28 Planar optical waveguide assembly and method of preparing same

Country Status (5)

Country Link
US (2) US6905904B2 (https=)
EP (1) EP1516208B1 (https=)
JP (1) JP4849799B2 (https=)
AU (1) AU2003223392A1 (https=)
WO (1) WO2004001458A1 (https=)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100273011A1 (en) * 1996-12-20 2010-10-28 Bianxiao Zhong Silicone Composition, Silicone Adhesive, Coated and Laminated Substrates
US6907176B2 (en) * 2002-06-24 2005-06-14 Dow Corning Corporation Planar optical waveguide assembly and method of preparing same
US6768828B2 (en) * 2002-11-04 2004-07-27 Little Optics Inc. Integrated optical circuit with dense planarized cladding layer
TWI285664B (en) * 2003-12-25 2007-08-21 Kansai Paint Co Ltd Curable resin composition for optical waveguide, curable dry film for optical waveguide, waveguide, and, method for manufacturing optical waveguide
CN100409050C (zh) * 2004-06-28 2008-08-06 欧姆龙株式会社 薄膜光波导和其制造方法以及电子设备装置
CA2575238C (en) * 2004-08-11 2015-04-21 Dow Corning Corporation Photopolymerizable silicone materials forming semipermeable membranes for sensor applications
CN101163748B (zh) * 2005-05-26 2011-04-13 陶氏康宁公司 用于模塑小的型材的方法和有机硅封装剂组合物
KR101325792B1 (ko) * 2006-01-17 2013-11-04 다우 코닝 코포레이션 열 안정성 투명 실리콘 수지 조성물 및 이의 제조 방법 및용도
CN101336383B (zh) * 2006-02-01 2012-05-09 陶氏康宁公司 抗冲击的光波导管及其制造方法
WO2007100445A2 (en) * 2006-02-24 2007-09-07 Dow Corning Corporation Light emitting device encapsulated with silicones and curable silicone compositions for preparing the silicones
KR101338343B1 (ko) * 2006-08-31 2013-12-06 신닛테츠 수미킨 가가쿠 가부시키가이샤 유기 전계발광 소자 재료 및 유기 전계발광 소자
CN101600664B (zh) * 2006-12-20 2013-02-06 陶氏康宁公司 用多层固化的有机硅树脂组合物涂覆或层合的玻璃基材
CN101563300B (zh) * 2006-12-20 2012-09-05 陶氏康宁公司 用固化的有机硅树脂组合物涂布或层压的玻璃基底
CN101802667B (zh) * 2007-09-19 2014-02-19 日立化成工业株式会社 光波导的制造方法以及由该制造方法所得到的光波导
US7944781B2 (en) * 2007-10-16 2011-05-17 Seagate Technology Llc Flexible waveguide with adjustable index of refraction
WO2009111199A1 (en) * 2008-03-04 2009-09-11 Dow Corning Corporation Silicone composition, silicone adhesive, coated and laminated substrates
CN101959939B (zh) * 2008-03-04 2013-02-06 陶氏康宁公司 硼硅氧烷组合物，硼硅氧烷粘合剂，涂布和层压的基底
CN102046371B (zh) * 2008-05-27 2013-11-06 陶氏康宁公司 粘合带和层压玻璃
TW201004795A (en) * 2008-07-31 2010-02-01 Dow Corning Laminated glass
JP5100681B2 (ja) * 2009-02-16 2012-12-19 富士フイルム株式会社 微細パターン形成用部材
EP2517052B1 (en) * 2009-12-21 2019-06-12 Dow Silicones Corporation Methods for fabricating flexible waveguides using alkyl-functional silsesquioxane resins
DE102010043149A1 (de) * 2010-10-29 2012-05-03 Wacker Chemie Ag Hochtransparente durch Licht vernetzbare Siliconmischungen
JP2014500897A (ja) 2010-11-09 2014-01-16 ダウ コーニング コーポレーション 有機リン酸化合物により可塑化されたヒドロシリル化硬化シリコーン樹脂
JP5490671B2 (ja) * 2010-12-07 2014-05-14 信越化学工業株式会社 シリコーン樹脂組成物の硬化方法
TW201319170A (zh) 2011-05-25 2013-05-16 Dow Corning 在溶劑顯影期間增強膜保留和黏附之含有環氧官能化矽氧烷寡聚物的環氧官能化的可輻射固化組合物
JP5472241B2 (ja) * 2011-09-16 2014-04-16 信越化学工業株式会社 光硬化型シリコーン樹脂組成物を用いる硬化薄膜の製造方法
JP2016526069A (ja) 2013-05-17 2016-09-01 ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ 硬化性組成物、硬化された物品の調製方法、及び該方法により形成された硬化物品
KR20160010866A (ko) * 2013-05-17 2016-01-28 다우 코닝 코포레이션 용품의 제조 방법 및 그에 의해 제조된 용품
JP6217590B2 (ja) * 2013-11-05 2017-10-25 信越化学工業株式会社 紫外線硬化性接着性オルガノポリシロキサン組成物
US11320267B2 (en) 2017-03-23 2022-05-03 Kvh Industries, Inc. Integrated optic wavemeter and method for fiber optic gyroscopes scale factor stabilization
WO2019022856A1 (en) * 2017-07-28 2019-01-31 Dow Silicones Corporation METHOD FOR PREPARING A PLANE SURFACE OPTICAL WAVEGUIDE DEVICE
US10852480B2 (en) * 2017-08-24 2020-12-01 Dow Global Technologies Llc Method for optical waveguide fabrication using polysiloxane, epoxy, photo acid generator, and hydrosilation catalyst
CN110998389B (zh) * 2017-08-24 2022-03-01 陶氏环球技术有限责任公司 光波导制造方法
SG11202001247PA (en) 2017-08-24 2020-03-30 Dow Global Technologies Llc Method for optical waveguide fabrication
KR20200060718A (ko) 2017-09-15 2020-06-01 케이브이에이치 인더스트리즈, 인코포레이티드 광자 집적 회로의 도파관에 광섬유의 자기 정렬 연결을 위한 방법 및 장치
CN112292638B (zh) * 2018-04-24 2024-06-11 美国陶氏有机硅公司 正色调可光图案化有机硅
EP3864373B1 (en) 2018-10-11 2025-04-23 EMCORE Corporation Photonic integrated circuits, fiber optic gyroscopes and methods for making the same
CA3115836A1 (en) 2018-10-31 2020-05-07 Kvh Industries, Inc. Method and apparatus for control and suppression of stray light in a photonic integrated circuit
US11353655B2 (en) * 2019-05-22 2022-06-07 Kvh Industries, Inc. Integrated optical polarizer and method of making same
WO2021132349A1 (ja) * 2019-12-26 2021-07-01 ダウ・東レ株式会社 硬化性オルガノポリシロキサン組成物及びその硬化物、保護剤又は接着剤、並びに電気・電子機器
GB202108979D0 (en) 2021-06-23 2021-08-04 Johnson Matthey Plc Hydrosilylation catalysts
ES1281409Y (es) 2021-07-29 2022-02-01 Univ Valencia Politecnica Dispositivo de ahorro de agua para instalaciones de agua caliente sanitaria
US12352571B2 (en) 2021-08-11 2025-07-08 Emcore Corporation In-situ residual intensity noise measurement method and system
WO2023211518A2 (en) 2021-11-30 2023-11-02 Emcore Corporation Multi-axis fiber optic gyroscope photonic integrated circuit for inertial measurement units and inertial navigation systems
TW202428780A (zh) 2022-12-05 2024-07-16 美商陶氏有機矽公司 Ｕｖ可固化聚矽氧組成物

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3934061A (en) * 1972-03-30 1976-01-20 Corning Glass Works Method of forming planar optical waveguides
ES520422A0 (es) 1983-03-08 1984-03-16 Zottnik Edmund Sistema codificado de validacion y comando.
US5080962A (en) * 1985-02-25 1992-01-14 University Of Florida Method for making silica optical devices and devices produced thereby
JPS61275706A (ja) * 1985-05-30 1986-12-05 Sumitomo Electric Ind Ltd 光導波路
JPS6239660A (ja) * 1985-08-14 1987-02-20 Toshiba Silicone Co Ltd 光学的接合用ゲル組成物
FR2597110A1 (fr) 1986-04-14 1987-10-16 Rhone Poulenc Multi Tech Composition organopolysiloxane, potentiellement reticulable et utilisable notamment en microlithographie, et son procede d'application
JPS63273804A (ja) * 1987-05-01 1988-11-10 Sumitomo Electric Ind Ltd 光導波路
JPS6457207A (en) * 1987-08-28 1989-03-03 Hitachi Ltd Waveguide type optical device
JPS6459302A (en) * 1987-08-31 1989-03-07 Sumitomo Electric Industries Manufacturer of plastic optical waveguide sheet
JP3273519B2 (ja) * 1992-12-04 2002-04-08 日本電信電話株式会社 ポリシロキサン系光導波路の製造方法
JPH07140336A (ja) * 1993-09-22 1995-06-02 Shin Etsu Chem Co Ltd 光導波路
JPH0862440A (ja) * 1994-08-17 1996-03-08 Nippon Telegr & Teleph Corp <Ntt> 光導波路及びその作製方法
JPH07258604A (ja) * 1995-02-21 1995-10-09 Toray Ind Inc 光学材料および光学材料用コーティング組成物
JPH07331173A (ja) * 1995-02-21 1995-12-19 Toray Ind Inc 光学材料形成用塗液組成物および光学材料
JPH09124793A (ja) 1995-11-02 1997-05-13 Nippon Telegr & Teleph Corp <Ntt> 高分子光学材料及びその製造方法及び高分子光導波路
US5972516A (en) 1996-02-29 1999-10-26 Kyocera Corporation Method for manufacturing optical waveguide using siloxane polymer, and optoelectronic hybrid substrate using the optical waveguide
JPH1067935A (ja) * 1996-08-29 1998-03-10 Toray Dow Corning Silicone Co Ltd 硬化性オルガノポリシロキサン組成物
DE19645721A1 (de) * 1996-11-06 1998-05-07 Wacker Chemie Gmbh Vernetzbare Organopolysiloxanmassen
JPH10148729A (ja) 1996-11-21 1998-06-02 Nippon Telegr & Teleph Corp <Ntt> 高分子光導波路コア部のリッジ・パターン形成方法
US6054253A (en) * 1997-10-10 2000-04-25 Mcgill University-The Royal Institute For The Advancement Of Learning Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon
JP3063903B2 (ja) * 1998-03-20 2000-07-12 日本電信電話株式会社 光導波路
US6482551B1 (en) * 1998-03-24 2002-11-19 Inphase Technologies Optical article and process for forming article
JP2000090643A (ja) 1998-09-08 2000-03-31 Matsushita Electric Ind Co Ltd 記憶装置
JP3133039B2 (ja) * 1998-10-05 2001-02-05 日本電信電話株式会社 光導波路用感光性組成物およびその製造方法および高分子光導波路パターン形成方法
WO2001019587A1 (en) * 1999-09-16 2001-03-22 Nippon Sheet Glass Co., Ltd. Method for producing article having predetermined surface shape, and optical waveguide element
TW581746B (en) 1999-11-12 2004-04-01 Nippon Sheet Glass Co Ltd Photosensitive composition, optical waveguide element and production process therefor
JP2001288364A (ja) * 2000-04-05 2001-10-16 Jsr Corp 放射線硬化性組成物およびそれを用いた光導波路ならびに光導波路の製造方法
JP2001318248A (ja) * 2000-05-12 2001-11-16 Mitsubishi Electric Corp 高分子光導波路の製造方法
US6415093B1 (en) * 2000-08-17 2002-07-02 Nippon Sheet Glass Co., Ltd. Optical device and adhesive composition used therefor
US6991887B1 (en) * 2000-11-01 2006-01-31 Battelle Memorial Institute Photopatternable sorbent and functionalized films
US6617674B2 (en) 2001-02-20 2003-09-09 Dow Corning Corporation Semiconductor package and method of preparing same
JP2003131058A (ja) * 2001-08-09 2003-05-08 Kanegafuchi Chem Ind Co Ltd 光導波路および光導波路の作製方法。
JP2004012635A (ja) * 2002-06-04 2004-01-15 Nippon Paint Co Ltd 光電気配線複合実装基板及びその製造方法

Also Published As

Publication number Publication date
EP1516208B1 (en) 2014-11-05
US7358582B2 (en) 2008-04-15
EP1516208A1 (en) 2005-03-23
JP4849799B2 (ja) 2012-01-11
JP2005531029A (ja) 2005-10-13
US6905904B2 (en) 2005-06-14
US20030235383A1 (en) 2003-12-25
WO2004001458A1 (en) 2003-12-31
US20050175301A1 (en) 2005-08-11

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