AU2002223435A1 - Electrochemical coating device and method - Google Patents

Electrochemical coating device and method

Info

Publication number
AU2002223435A1
AU2002223435A1 AU2002223435A AU2002223435A AU2002223435A1 AU 2002223435 A1 AU2002223435 A1 AU 2002223435A1 AU 2002223435 A AU2002223435 A AU 2002223435A AU 2002223435 A AU2002223435 A AU 2002223435A AU 2002223435 A1 AU2002223435 A1 AU 2002223435A1
Authority
AU
Australia
Prior art keywords
layers
coated
substrate
thin layers
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002223435A
Inventor
Karl-Heinz Heckner
Alexander Kraft
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GESIMAT GmbH
Original Assignee
GESIMAT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GESIMAT GmbH filed Critical GESIMAT GmbH
Publication of AU2002223435A1 publication Critical patent/AU2002223435A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

Abstract

The invention relates to a device and method, with which it is possible to electrochemically deposit thin layers with a nearly homogeneous layer thickness on large-surface substrates having relatively high resistances. These thin layers are, for example, metal layers, metal oxide layers or semiconductor layers as well as layers consisting of conductive polymers that, for example, are deposited on transparent electrodes or semiconductor substrates. The counter-electrode for the substrate to be coated is divided into several electrode segments and voltages that differ from one another can be applied between each individual electrode segment and the substrate to be coated. This results in achieving a good homogeneity of the deposited thin layers with respect to thickness and physical properties.
AU2002223435A 2001-01-04 2001-09-24 Electrochemical coating device and method Abandoned AU2002223435A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10100297A DE10100297A1 (en) 2001-01-04 2001-01-04 Device and method for electrochemical coating
DE10100297.1 2001-01-04
PCT/DE2001/003676 WO2002053806A2 (en) 2001-01-04 2001-09-24 Electrochemical coating device and method

Publications (1)

Publication Number Publication Date
AU2002223435A1 true AU2002223435A1 (en) 2002-07-16

Family

ID=7669816

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002223435A Abandoned AU2002223435A1 (en) 2001-01-04 2001-09-24 Electrochemical coating device and method

Country Status (5)

Country Link
EP (1) EP1534880B1 (en)
AT (1) ATE358194T1 (en)
AU (1) AU2002223435A1 (en)
DE (3) DE10100297A1 (en)
WO (1) WO2002053806A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10132408C2 (en) * 2001-07-04 2003-08-21 Fraunhofer Ges Forschung Variable shape electrode
DE10141056C2 (en) 2001-08-22 2003-12-24 Atotech Deutschland Gmbh Method and device for the electrolytic treatment of electrically conductive layers in continuous systems
DE102004056158B3 (en) * 2004-11-17 2006-03-30 Siemens Ag Method for monitoring an electrochemical treatment process and electrode arrangement suitable for this method
JP6993288B2 (en) * 2018-05-07 2022-01-13 株式会社荏原製作所 Plating equipment
DE102018004841B9 (en) 2018-06-13 2020-12-03 Hooshiar Mahdjour Method and device for the automated regulation of the currents in an electroplating bath

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61279695A (en) * 1985-06-04 1986-12-10 Central Glass Co Ltd Formation of thin film by electrolytic synthesizing method
JPH04143299A (en) * 1990-10-03 1992-05-18 Fujitsu Ltd Electroplating method
US5156730A (en) * 1991-06-25 1992-10-20 International Business Machines Electrode array and use thereof
JP3207909B2 (en) * 1992-02-07 2001-09-10 ティーディーケイ株式会社 Electroplating method and split type insoluble electrode for electroplating
DE19717489B4 (en) * 1997-04-25 2008-04-10 Sms Demag Ag Arrangement for the electrogalvanic metal coating of a strip
AU6773000A (en) * 1999-08-26 2001-03-19 Cvc Products, Inc. Apparatus and method for electroplating a material layer onto a wafer
JP2003535974A (en) * 2000-06-05 2003-12-02 アプライド マテリアルズ インコーポレイテッド Programmable anode device and related method

Also Published As

Publication number Publication date
ATE358194T1 (en) 2007-04-15
DE10100297A1 (en) 2002-07-18
EP1534880B1 (en) 2007-03-28
DE10195773D2 (en) 2004-01-22
EP1534880A2 (en) 2005-06-01
WO2002053806A2 (en) 2002-07-11
DE50112278D1 (en) 2007-05-10
WO2002053806A3 (en) 2005-03-24

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase