ATE358194T1 - DEVICE AND METHOD FOR ELECTROCHEMICAL COATING - Google Patents

DEVICE AND METHOD FOR ELECTROCHEMICAL COATING

Info

Publication number
ATE358194T1
ATE358194T1 AT01272605T AT01272605T ATE358194T1 AT E358194 T1 ATE358194 T1 AT E358194T1 AT 01272605 T AT01272605 T AT 01272605T AT 01272605 T AT01272605 T AT 01272605T AT E358194 T1 ATE358194 T1 AT E358194T1
Authority
AT
Austria
Prior art keywords
layers
coated
substrate
thin layers
deposited
Prior art date
Application number
AT01272605T
Other languages
German (de)
Inventor
Alexander Kraft
Karl-Heinz Heckner
Original Assignee
Gesimat Gmbh Ges Fuer Intellig
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gesimat Gmbh Ges Fuer Intellig filed Critical Gesimat Gmbh Ges Fuer Intellig
Application granted granted Critical
Publication of ATE358194T1 publication Critical patent/ATE358194T1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Automation & Control Theory (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Battery Mounting, Suspending (AREA)
  • Sealing Battery Cases Or Jackets (AREA)

Abstract

The invention relates to a device and method, with which it is possible to electrochemically deposit thin layers with a nearly homogeneous layer thickness on large-surface substrates having relatively high resistances. These thin layers are, for example, metal layers, metal oxide layers or semiconductor layers as well as layers consisting of conductive polymers that, for example, are deposited on transparent electrodes or semiconductor substrates. The counter-electrode for the substrate to be coated is divided into several electrode segments and voltages that differ from one another can be applied between each individual electrode segment and the substrate to be coated. This results in achieving a good homogeneity of the deposited thin layers with respect to thickness and physical properties.
AT01272605T 2001-01-04 2001-09-24 DEVICE AND METHOD FOR ELECTROCHEMICAL COATING ATE358194T1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10100297A DE10100297A1 (en) 2001-01-04 2001-01-04 Device and method for electrochemical coating

Publications (1)

Publication Number Publication Date
ATE358194T1 true ATE358194T1 (en) 2007-04-15

Family

ID=7669816

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01272605T ATE358194T1 (en) 2001-01-04 2001-09-24 DEVICE AND METHOD FOR ELECTROCHEMICAL COATING

Country Status (5)

Country Link
EP (1) EP1534880B1 (en)
AT (1) ATE358194T1 (en)
AU (1) AU2002223435A1 (en)
DE (3) DE10100297A1 (en)
WO (1) WO2002053806A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10132408C2 (en) * 2001-07-04 2003-08-21 Fraunhofer Ges Forschung Variable shape electrode
DE10141056C2 (en) 2001-08-22 2003-12-24 Atotech Deutschland Gmbh Method and device for the electrolytic treatment of electrically conductive layers in continuous systems
DE102004056158B3 (en) * 2004-11-17 2006-03-30 Siemens Ag Method for monitoring an electrochemical treatment process and electrode arrangement suitable for this method
JP6993288B2 (en) * 2018-05-07 2022-01-13 株式会社荏原製作所 Plating equipment
DE102018004841B9 (en) 2018-06-13 2020-12-03 Hooshiar Mahdjour Method and device for the automated regulation of the currents in an electroplating bath

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61279695A (en) * 1985-06-04 1986-12-10 Central Glass Co Ltd Formation of thin film by electrolytic synthesizing method
JPH04143299A (en) * 1990-10-03 1992-05-18 Fujitsu Ltd Electroplating method
US5156730A (en) * 1991-06-25 1992-10-20 International Business Machines Electrode array and use thereof
JP3207909B2 (en) * 1992-02-07 2001-09-10 ティーディーケイ株式会社 Electroplating method and split type insoluble electrode for electroplating
DE19717489B4 (en) * 1997-04-25 2008-04-10 Sms Demag Ag Arrangement for the electrogalvanic metal coating of a strip
WO2001014618A2 (en) * 1999-08-26 2001-03-01 Cvc Products, Inc. Apparatus and method for electroplating a material layer onto a wafer
WO2001094656A2 (en) * 2000-06-05 2001-12-13 Applied Materials, Inc. Plating apparatus with individually controllable anode segments and associated method

Also Published As

Publication number Publication date
WO2002053806A2 (en) 2002-07-11
WO2002053806A3 (en) 2005-03-24
AU2002223435A1 (en) 2002-07-16
DE10100297A1 (en) 2002-07-18
EP1534880B1 (en) 2007-03-28
DE10195773D2 (en) 2004-01-22
DE50112278D1 (en) 2007-05-10
EP1534880A2 (en) 2005-06-01

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