AU2002216661A1 - Method for cleaning etcher parts - Google Patents
Method for cleaning etcher partsInfo
- Publication number
- AU2002216661A1 AU2002216661A1 AU2002216661A AU1666102A AU2002216661A1 AU 2002216661 A1 AU2002216661 A1 AU 2002216661A1 AU 2002216661 A AU2002216661 A AU 2002216661A AU 1666102 A AU1666102 A AU 1666102A AU 2002216661 A1 AU2002216661 A1 AU 2002216661A1
- Authority
- AU
- Australia
- Prior art keywords
- cleaning
- etcher
- parts
- etcher parts
- cleaning etcher
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000004140 cleaning Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/835—Mixtures of non-ionic with cationic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/28—Organic compounds containing halogen
- C11D7/30—Halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5013—Organic solvents containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/20—Industrial or commercial equipment, e.g. reactors, tubes or engines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/40—Specific cleaning or washing processes
- C11D2111/46—Specific cleaning or washing processes applying energy, e.g. irradiation
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3218—Alkanolamines or alkanolimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3263—Amides or imides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/732,414 US6656894B2 (en) | 2000-12-07 | 2000-12-07 | Method for cleaning etcher parts |
US09732414 | 2000-12-07 | ||
PCT/US2001/043171 WO2002046344A1 (en) | 2000-12-07 | 2001-12-03 | Method for cleaning etcher parts |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002216661A1 true AU2002216661A1 (en) | 2002-06-18 |
Family
ID=24943433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002216661A Abandoned AU2002216661A1 (en) | 2000-12-07 | 2001-12-03 | Method for cleaning etcher parts |
Country Status (6)
Country | Link |
---|---|
US (1) | US6656894B2 (ko) |
EP (1) | EP1341883A4 (ko) |
KR (1) | KR20030070055A (ko) |
CN (1) | CN1266262C (ko) |
AU (1) | AU2002216661A1 (ko) |
WO (1) | WO2002046344A1 (ko) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030022800A1 (en) * | 2001-06-14 | 2003-01-30 | Peters Darryl W. | Aqueous buffered fluoride-containing etch residue removers and cleaners |
US7521366B2 (en) * | 2001-12-12 | 2009-04-21 | Lg Display Co., Ltd. | Manufacturing method of electro line for liquid crystal display device |
US6943142B2 (en) * | 2002-01-09 | 2005-09-13 | Air Products And Chemicals, Inc. | Aqueous stripping and cleaning composition |
KR100455503B1 (ko) * | 2002-06-17 | 2004-11-06 | 동부전자 주식회사 | 반도체 소자의 콘택홀 세정 방법 |
US6677286B1 (en) * | 2002-07-10 | 2004-01-13 | Air Products And Chemicals, Inc. | Compositions for removing etching residue and use thereof |
JP4352880B2 (ja) * | 2003-12-02 | 2009-10-28 | セイコーエプソン株式会社 | 洗浄方法および洗浄装置 |
US7148072B2 (en) * | 2004-05-28 | 2006-12-12 | Hitachi Global Storage Technologies Netherlands B.V. | Method and apparatus for oxidizing conductive redeposition in TMR sensors |
US7442114B2 (en) * | 2004-12-23 | 2008-10-28 | Lam Research Corporation | Methods for silicon electrode assembly etch rate and etch uniformity recovery |
US7247579B2 (en) | 2004-12-23 | 2007-07-24 | Lam Research Corporation | Cleaning methods for silicon electrode assembly surface contamination removal |
US7507670B2 (en) * | 2004-12-23 | 2009-03-24 | Lam Research Corporation | Silicon electrode assembly surface decontamination by acidic solution |
CA2608285A1 (en) * | 2005-05-13 | 2006-11-23 | Sachem, Inc. | Selective wet etching of oxides |
TWI339780B (en) * | 2005-07-28 | 2011-04-01 | Rohm & Haas Elect Mat | Stripper |
TW200722505A (en) * | 2005-09-30 | 2007-06-16 | Rohm & Haas Elect Mat | Stripper |
CN1966636B (zh) * | 2005-11-15 | 2011-08-03 | 安集微电子(上海)有限公司 | 清洗液组合物 |
US7534753B2 (en) * | 2006-01-12 | 2009-05-19 | Air Products And Chemicals, Inc. | pH buffered aqueous cleaning composition and method for removing photoresist residue |
KR100678482B1 (ko) | 2006-01-17 | 2007-02-02 | 삼성전자주식회사 | 실리콘 표면의 세정용액 및 이를 사용하는 반도체 소자의제조방법들 |
WO2008012231A2 (de) * | 2006-07-27 | 2008-01-31 | Basf Se | Verwendung von 1,5-dimethylpyrrolidon |
KR100823714B1 (ko) * | 2006-08-24 | 2008-04-21 | 삼성전자주식회사 | 폴리머 제거용 세정액 및 이를 이용한 폴리머 제거방법 |
US7879783B2 (en) | 2007-01-11 | 2011-02-01 | Air Products And Chemicals, Inc. | Cleaning composition for semiconductor substrates |
US20080234162A1 (en) * | 2007-03-21 | 2008-09-25 | General Chemical Performance Products Llc | Semiconductor etch residue remover and cleansing compositions |
US10391526B2 (en) | 2013-12-12 | 2019-08-27 | Lam Research Corporation | Electrostatic chuck cleaning fixture |
US10894935B2 (en) | 2015-12-04 | 2021-01-19 | Samsung Electronics Co., Ltd. | Composition for removing silicone resins and method of thinning substrate by using the same |
CN107034028B (zh) * | 2015-12-04 | 2021-05-25 | 三星电子株式会社 | 用于除去有机硅树脂的组合物、使用其薄化基材和制造半导体封装体的方法及使用其的系统 |
CN106890816A (zh) * | 2015-12-21 | 2017-06-27 | 东莞新科技术研究开发有限公司 | 真空泵的清洗方法 |
CN106289913A (zh) * | 2016-09-24 | 2017-01-04 | 中海油常州涂料化工研究院有限公司 | 一种用于无机富锌涂层表面腐蚀产物的脱膜液及其制备方法和使用方法 |
CN106833962A (zh) * | 2016-12-26 | 2017-06-13 | 上海申和热磁电子有限公司 | 用于去除半导体蚀刻腔体陶瓷涂层零件污染物的清洗剂及其制备和应用 |
CN106959590A (zh) * | 2017-04-11 | 2017-07-18 | 安徽高芯众科半导体有限公司 | 一种黄光制程光刻机零部件负光阻再生方法 |
WO2019135901A1 (en) * | 2018-01-05 | 2019-07-11 | Fujifilm Electronic Materials U.S.A., Inc. | Surface treatment compositions and methods |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5279771A (en) | 1990-11-05 | 1994-01-18 | Ekc Technology, Inc. | Stripping compositions comprising hydroxylamine and alkanolamine |
US5571447A (en) * | 1995-03-20 | 1996-11-05 | Ashland Inc. | Stripping and cleaning composition |
JPH1055993A (ja) * | 1996-08-09 | 1998-02-24 | Hitachi Ltd | 半導体素子製造用洗浄液及びそれを用いた半導体素子の製造方法 |
US5698503A (en) * | 1996-11-08 | 1997-12-16 | Ashland Inc. | Stripping and cleaning composition |
US6828289B2 (en) * | 1999-01-27 | 2004-12-07 | Air Products And Chemicals, Inc. | Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature |
US6248704B1 (en) * | 1999-05-03 | 2001-06-19 | Ekc Technology, Inc. | Compositions for cleaning organic and plasma etched residues for semiconductors devices |
US6235693B1 (en) * | 1999-07-16 | 2001-05-22 | Ekc Technology, Inc. | Lactam compositions for cleaning organic and plasma etched residues for semiconductor devices |
WO2001014510A1 (en) * | 1999-08-19 | 2001-03-01 | Ashland Inc. | Stripping and cleaning compositions |
US6194366B1 (en) * | 1999-11-16 | 2001-02-27 | Esc, Inc. | Post chemical-mechanical planarization (CMP) cleaning composition |
-
2000
- 2000-12-07 US US09/732,414 patent/US6656894B2/en not_active Expired - Fee Related
-
2001
- 2001-12-03 KR KR10-2003-7007615A patent/KR20030070055A/ko not_active Application Discontinuation
- 2001-12-03 WO PCT/US2001/043171 patent/WO2002046344A1/en not_active Application Discontinuation
- 2001-12-03 AU AU2002216661A patent/AU2002216661A1/en not_active Abandoned
- 2001-12-03 CN CNB018202985A patent/CN1266262C/zh not_active Expired - Fee Related
- 2001-12-03 EP EP01999625A patent/EP1341883A4/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
CN1266262C (zh) | 2006-07-26 |
KR20030070055A (ko) | 2003-08-27 |
WO2002046344A1 (en) | 2002-06-13 |
CN1479780A (zh) | 2004-03-03 |
US20020107158A1 (en) | 2002-08-08 |
EP1341883A4 (en) | 2004-06-02 |
EP1341883A1 (en) | 2003-09-10 |
US6656894B2 (en) | 2003-12-02 |
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