AU2001283725A1 - Method and device for continuous cold plasma deposition of metal coatings - Google Patents

Method and device for continuous cold plasma deposition of metal coatings

Info

Publication number
AU2001283725A1
AU2001283725A1 AU2001283725A AU8372501A AU2001283725A1 AU 2001283725 A1 AU2001283725 A1 AU 2001283725A1 AU 2001283725 A AU2001283725 A AU 2001283725A AU 8372501 A AU8372501 A AU 8372501A AU 2001283725 A1 AU2001283725 A1 AU 2001283725A1
Authority
AU
Australia
Prior art keywords
plasma deposition
cold plasma
metal coatings
continuous cold
continuous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001283725A
Other languages
English (en)
Inventor
Pierre Vanden Brande
Alain Weymeersch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cold Plasma Applications CPA Sprl
Original Assignee
CPA SPRL COLD PLASMA APPLIC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=8171943&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=AU2001283725(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by CPA SPRL COLD PLASMA APPLIC filed Critical CPA SPRL COLD PLASMA APPLIC
Publication of AU2001283725A1 publication Critical patent/AU2001283725A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3432—Target-material dispenser
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)
AU2001283725A 2000-08-23 2001-08-23 Method and device for continuous cold plasma deposition of metal coatings Abandoned AU2001283725A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00202942A EP1182272A1 (fr) 2000-08-23 2000-08-23 Procédé et dispositif permettant le dépôt de couches métalliques en continu par plasma froid
EP00202942 2000-08-23
PCT/BE2001/000142 WO2002016664A1 (fr) 2000-08-23 2001-08-23 Procede et dispositif permettant le depot de couches metalliques en continu par plasma froid

Publications (1)

Publication Number Publication Date
AU2001283725A1 true AU2001283725A1 (en) 2002-03-04

Family

ID=8171943

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001283725A Abandoned AU2001283725A1 (en) 2000-08-23 2001-08-23 Method and device for continuous cold plasma deposition of metal coatings

Country Status (8)

Country Link
US (1) US7156960B2 (fr)
EP (2) EP1182272A1 (fr)
JP (1) JP2004507617A (fr)
AU (1) AU2001283725A1 (fr)
BR (1) BR0113560A (fr)
CA (1) CA2420243A1 (fr)
WO (1) WO2002016664A1 (fr)
ZA (1) ZA200301531B (fr)

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4359131B2 (ja) * 2003-12-08 2009-11-04 株式会社日立ハイテクノロジーズ 液体金属イオン銃、及びイオンビーム装置
BRPI0418685B1 (pt) * 2004-03-31 2014-04-08 Pirelli Processo para produzir um fio de metal
US20050229856A1 (en) * 2004-04-20 2005-10-20 Malik Roger J Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
WO2008040329A1 (fr) * 2006-09-29 2008-04-10 Von Ardenne Anlagentechnik Gmbh Procédé d'application de revêtement sous vide et dispositif permettant la mise en oeuvre dudit procédé
US8951632B2 (en) * 2007-01-03 2015-02-10 Applied Nanostructured Solutions, Llc CNT-infused carbon fiber materials and process therefor
US8951631B2 (en) * 2007-01-03 2015-02-10 Applied Nanostructured Solutions, Llc CNT-infused metal fiber materials and process therefor
US20100279569A1 (en) * 2007-01-03 2010-11-04 Lockheed Martin Corporation Cnt-infused glass fiber materials and process therefor
US8158217B2 (en) * 2007-01-03 2012-04-17 Applied Nanostructured Solutions, Llc CNT-infused fiber and method therefor
US20120189846A1 (en) * 2007-01-03 2012-07-26 Lockheed Martin Corporation Cnt-infused ceramic fiber materials and process therefor
US9005755B2 (en) 2007-01-03 2015-04-14 Applied Nanostructured Solutions, Llc CNS-infused carbon nanomaterials and process therefor
EP1972699A1 (fr) * 2007-03-20 2008-09-24 ArcelorMittal France Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
US10039927B2 (en) 2007-04-23 2018-08-07 Plasmology4, Inc. Cold plasma treatment devices and associated methods
US20090081441A1 (en) * 2007-09-20 2009-03-26 Lockheed Martin Corporation Fiber Tow Comprising Carbon-Nanotube-Infused Fibers
US20090081383A1 (en) * 2007-09-20 2009-03-26 Lockheed Martin Corporation Carbon Nanotube Infused Composites via Plasma Processing
EP2048261A1 (fr) * 2007-10-12 2009-04-15 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique
BE1017852A3 (fr) * 2007-11-19 2009-09-01 Ind Plasma Services & Technologies Ipst Gmbh Procede et installation de galvanisation par evaporation plasma.
US8323408B2 (en) * 2007-12-10 2012-12-04 Solopower, Inc. Methods and apparatus to provide group VIA materials to reactors for group IBIIIAVIA film formation
JP5740552B2 (ja) * 2007-12-21 2015-06-24 アドヴァンスト ガルヴァニゼイション アーゲー 真空蒸発法における蒸気流を制御するための方法及び装置
BE1017912A3 (fr) * 2007-12-21 2009-11-03 Ind Plasma Services & Technolo Procede et dispositifs de controle d'un flux de vapeur en evaporation sous vide.
CN102264942B (zh) * 2008-12-26 2014-03-19 佳能安内华股份有限公司 成膜装置和使用该成膜装置的基板的制造方法
BRPI1007300A2 (pt) * 2009-02-17 2019-09-24 Applied Nanostructured Sols compósitos compreendendo nanotubos de carbono sobre fibra
BRPI1008131A2 (pt) * 2009-02-27 2016-03-08 Applied Nanostructured Sols "crescimento de nanotubo de carbono de baixa temperatura usando método de preaquecimento de gás".
US20100224129A1 (en) * 2009-03-03 2010-09-09 Lockheed Martin Corporation System and method for surface treatment and barrier coating of fibers for in situ cnt growth
CN102388172B (zh) * 2009-04-10 2015-02-11 应用纳米结构方案公司 使用立式加热炉将碳纳米管并入纤维的方法和设备
US20100272891A1 (en) * 2009-04-10 2010-10-28 Lockheed Martin Corporation Apparatus and method for the production of carbon nanotubes on a continuously moving substrate
DK2417286T3 (en) * 2009-04-10 2015-08-17 Applied Nanostructured Solutions Inc Device and method for producing carbon nanotubes on a substrate that moves continuously
US20100260998A1 (en) * 2009-04-10 2010-10-14 Lockheed Martin Corporation Fiber sizing comprising nanoparticles
US9111658B2 (en) 2009-04-24 2015-08-18 Applied Nanostructured Solutions, Llc CNS-shielded wires
WO2010124260A1 (fr) * 2009-04-24 2010-10-28 Lockheed Martin Corporation Composite et revêtement de blindage contre les emi à base de cnt
KR101696207B1 (ko) * 2009-04-27 2017-01-13 어플라이드 나노스트럭처드 솔루션스, 엘엘씨. 복합 구조물 제빙을 위한 ｃｎｔ계 저항 가열
BRPI1014624A2 (pt) * 2009-04-30 2016-04-05 Applied Nanostructured Sols método e sistema para catálise bem próxima para síntese de nanotubos de carbono
CN102470546B (zh) * 2009-08-03 2014-08-13 应用纳米结构方案公司 纳米颗粒在复合材料纤维中的结合
WO2011054008A2 (fr) * 2009-11-02 2011-05-05 Applied Nanostructured Solutions, Llc Matériaux en fibre d'aramide imprégnée de nanotubes de carbone (cnt) et procédé à cet effet
JP5643835B2 (ja) * 2009-11-23 2014-12-17 アプライド ナノストラクチャード ソリューションズ リミテッド ライアビリティー カンパニーＡｐｐｌｉｅｄ Ｎａｎｏｓｔｒｕｃｔｕｒｅｄｓｏｌｕｔｉｏｎｓ， Ｌｌｃ Ｃｎｔを適合された海ベース複合材料構造体
BR112012010907A2 (pt) * 2009-11-23 2019-09-24 Applied Nanostructured Sols "materiais compósitos de cerâmica contendo materiais de fibra infundidos em nanotubo de carbono e métodos para a produção dos mesmos"
US20110123735A1 (en) * 2009-11-23 2011-05-26 Applied Nanostructured Solutions, Llc Cnt-infused fibers in thermoset matrices
CA2780354A1 (fr) * 2009-12-14 2011-11-17 Applied Nanostructured Solutions, Llc Materiaux composites resistant aux flammes et articles contenant des materiaux en fibres a infusion de nanotubes de carbone
US9167736B2 (en) * 2010-01-15 2015-10-20 Applied Nanostructured Solutions, Llc CNT-infused fiber as a self shielding wire for enhanced power transmission line
EP2531558B1 (fr) * 2010-02-02 2018-08-22 Applied NanoStructured Solutions, LLC Matières fibreuses à infusion de nanotubes de carbone contenant des nanotubes de carbone à alignement parallèle, leurs procédés de production, et matériaux composites dérivés
WO2011109485A1 (fr) * 2010-03-02 2011-09-09 Applied Nanostructured Solutions,Llc Dispositifs électriques contenant des fibres infusées aux nanotubes de carbone et procédés de production associés
US8665581B2 (en) 2010-03-02 2014-03-04 Applied Nanostructured Solutions, Llc Spiral wound electrical devices containing carbon nanotube-infused electrode materials and methods and apparatuses for production thereof
US8361229B2 (en) * 2010-04-22 2013-01-29 Primestar Solar, Inc. Seal configuration for a system for continuous deposition of a thin film layer on a substrate
US8780526B2 (en) 2010-06-15 2014-07-15 Applied Nanostructured Solutions, Llc Electrical devices containing carbon nanotube-infused fibers and methods for production thereof
US9017854B2 (en) 2010-08-30 2015-04-28 Applied Nanostructured Solutions, Llc Structural energy storage assemblies and methods for production thereof
WO2012037042A1 (fr) 2010-09-14 2012-03-22 Applied Nanostructured Solutions, Llc Substrats en verre présentant des nanotubes de carbone qui ont grandi sur ceux-ci et procédés pour la production de ceux-ci
AU2011305809A1 (en) 2010-09-22 2013-02-28 Applied Nanostructured Solutions, Llc Carbon fiber substrates having carbon nanotubes grown thereon and processes for production thereof
AU2011305751A1 (en) 2010-09-23 2012-06-21 Applied Nanostructured Solutions, Llc CNT-infused fiber as a self shielding wire for enhanced power transmission line
JP5797275B2 (ja) * 2010-12-13 2015-10-21 ポスコ 連続コーティング装置
US9027609B2 (en) 2011-05-03 2015-05-12 United Technologies Corporation Argon gas level controller
EP2756740B1 (fr) * 2011-09-15 2018-04-11 Cold Plasma Medical Technologies, Inc. Dispositifs de traitement par plasma froid et méthodes associées
US9085464B2 (en) 2012-03-07 2015-07-21 Applied Nanostructured Solutions, Llc Resistance measurement system and method of using the same
KR20130119107A (ko) * 2012-04-23 2013-10-31 삼성에스디아이 주식회사 증착장치
DE102013109663A1 (de) * 2013-09-04 2015-03-05 Fhr Anlagenbau Gmbh Bedampfungseinrichtung zum Beschichten flächenförmiger Substrate
US10654953B2 (en) 2016-12-29 2020-05-19 Chevron Phillips Chemical Company Lp Methods of preparing a catalyst
US11267914B2 (en) 2016-12-29 2022-03-08 Chevron Phillips Chemical Company Lp Methods of preparing a catalyst
US20200369803A1 (en) 2016-12-29 2020-11-26 Chevron Phillips Chemical Company Lp Methods of Preparing a Catalyst
WO2018217914A1 (fr) * 2017-05-23 2018-11-29 Starfire Industries, Llc Revêtement par jet de plasma froid atmosphérique et traitement de surface
CN107938369B (zh) * 2017-11-06 2019-01-01 北京梦之墨科技有限公司 一种导电织物及其制备方法
DE102018215102A1 (de) * 2018-05-28 2019-11-28 Sms Group Gmbh Vakuumbeschichtungsanlage, und Verfahren zum Beschichten eines bandförmigen Materials
DE102021109537A1 (de) 2021-04-15 2022-10-20 Leibniz-Institut für Oberflächenmodifizierung e.V. Lichtbogenplasmaquelle mit flüssiger Kathode

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3799862A (en) * 1971-11-19 1974-03-26 United Aircraft Corp Apparatus for sputtering
US4188467A (en) * 1975-10-31 1980-02-12 A. H. Robins Company, Incorporated Process for tempering tissue for heparin production
US4480585A (en) * 1983-06-23 1984-11-06 Energy Conversion Devices, Inc. External isolation module
JPS63199868A (ja) * 1987-02-13 1988-08-18 Mitsubishi Heavy Ind Ltd 真空蒸発装置内の溶融金属レベル制御装置
US5178743A (en) * 1989-06-15 1993-01-12 Microelectronics And Computer Technology Corporation Cylindrical magnetron sputtering system
JPH03274264A (ja) * 1990-03-22 1991-12-05 Matsushita Electric Ind Co Ltd 溶融材料あるいは昇華性材料の重量監視装置及びその重量制御装置
US5415757A (en) * 1991-11-26 1995-05-16 Leybold Aktiengesellschaft Apparatus for coating a substrate with electrically nonconductive coatings
BE1008303A3 (fr) * 1994-06-02 1996-04-02 Cockerill Rech & Dev Procede et dispositif pour la formation d'un revetement sur un substrat par pulverisation cathodique.
US6432281B2 (en) * 1995-12-20 2002-08-13 Recherche Et Developpement Due Groupe Cockerill Sambre Process for formation of a coating on a substrate
BE1009838A3 (fr) * 1995-12-20 1997-10-07 Cockerill Rech & Dev Procede et dispositif pour la formation d'un revetement sur un substrat.
PT908924E (pt) * 1997-10-08 2003-09-30 Cockerill Rech & Dev Dispositivo para a formacao de um revestimento sobre um substrato por condensacao

Also Published As

Publication number Publication date
US7156960B2 (en) 2007-01-02
EP1182272A1 (fr) 2002-02-27
EP1313889A1 (fr) 2003-05-28
WO2002016664A1 (fr) 2002-02-28
CA2420243A1 (fr) 2002-02-28
JP2004507617A (ja) 2004-03-11
US20040026234A1 (en) 2004-02-12
BR0113560A (pt) 2003-07-08
ZA200301531B (en) 2004-02-25

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