AU2001279897A1 - Plasma coating method - Google Patents

Plasma coating method

Info

Publication number
AU2001279897A1
AU2001279897A1 AU2001279897A AU7989701A AU2001279897A1 AU 2001279897 A1 AU2001279897 A1 AU 2001279897A1 AU 2001279897 A AU2001279897 A AU 2001279897A AU 7989701 A AU7989701 A AU 7989701A AU 2001279897 A1 AU2001279897 A1 AU 2001279897A1
Authority
AU
Australia
Prior art keywords
coating method
plasma coating
plasma
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001279897A
Inventor
Eric Adriansens
Jean-Tristan Outreman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sidel SA
Original Assignee
Sidel SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sidel SA filed Critical Sidel SA
Publication of AU2001279897A1 publication Critical patent/AU2001279897A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
AU2001279897A 2000-08-01 2001-07-24 Plasma coating method Abandoned AU2001279897A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0010101 2000-08-01
FR0010101A FR2812665B1 (en) 2000-08-01 2000-08-01 PLASMA COATING DEPOSITION METHOD, DEVICE FOR IMPLEMENTING THE METHOD AND COATING OBTAINED BY SUCH A PROCESS
PCT/FR2001/002406 WO2002010474A1 (en) 2000-08-01 2001-07-24 Plasma coating method

Publications (1)

Publication Number Publication Date
AU2001279897A1 true AU2001279897A1 (en) 2002-02-13

Family

ID=8853164

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001279897A Abandoned AU2001279897A1 (en) 2000-08-01 2001-07-24 Plasma coating method

Country Status (11)

Country Link
US (4) US20030150858A1 (en)
EP (1) EP1309737A1 (en)
JP (1) JP2004505177A (en)
KR (1) KR20030033003A (en)
CN (1) CN1446269A (en)
AU (1) AU2001279897A1 (en)
BR (1) BR0112873A (en)
CA (1) CA2416521A1 (en)
FR (1) FR2812665B1 (en)
MX (1) MXPA03000910A (en)
WO (1) WO2002010474A1 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1197581B1 (en) * 1999-05-19 2006-10-25 Mitsubishi Shoji Plastics Corporation Dlc film, dlc-coated plastic container, and method and apparatus for manufacturing dlc-coated plastic container
DE10224547B4 (en) * 2002-05-24 2020-06-25 Khs Corpoplast Gmbh Method and device for the plasma treatment of workpieces
US7513953B1 (en) * 2003-11-25 2009-04-07 Nano Scale Surface Systems, Inc. Continuous system for depositing films onto plastic bottles and method
EP1828433A1 (en) * 2004-12-01 2007-09-05 Sidel Participations Method for manufacturing a pecvd carbon coated polymer article and article obtained by such method
JP2006261217A (en) * 2005-03-15 2006-09-28 Canon Anelva Corp Method of forming thin film
JP2006315697A (en) * 2005-05-11 2006-11-24 Hokkai Can Co Ltd Plastic bottle for carbonated beverage
WO2007029050A1 (en) * 2005-09-09 2007-03-15 Sidel Barrier layer
US20070172612A1 (en) * 2006-01-23 2007-07-26 Plastipak Packaging, Inc. Plastic container
DE102007062977B4 (en) * 2007-12-21 2018-07-19 Schott Ag Process for the production of process gases for the vapor phase separation
US8062470B2 (en) * 2008-05-12 2011-11-22 Yuri Glukhoy Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers
DE202009017967U1 (en) * 2008-12-19 2010-11-25 Erhard & Söhne GmbH Compressed air tank for commercial vehicles
DE102014106129A1 (en) 2014-04-30 2015-11-05 Thyssenkrupp Ag Method and apparatus for continuous precursor delivery
GB201717996D0 (en) * 2017-10-31 2017-12-13 Portal Medical Ltd Medicament dispenser device
CN115366321A (en) * 2022-09-20 2022-11-22 湖南千山制药机械股份有限公司 Plastic cup injection-plating integrated machine and injection-plating encapsulation integrated machine

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US4698256A (en) * 1984-04-02 1987-10-06 American Cyanamid Company Articles coated with adherent diamondlike carbon films
US4877677A (en) * 1985-02-19 1989-10-31 Matsushita Electric Industrial Co., Ltd. Wear-protected device
US4725345A (en) * 1985-04-22 1988-02-16 Kabushiki Kaisha Kenwood Method for forming a hard carbon thin film on article and applications thereof
FR2592874B1 (en) * 1986-01-14 1990-08-03 Centre Nat Rech Scient PROCESS FOR DIPPING A GLASS OR VITREOUS OBJECT AND OBJECT THUS DIPPED
US4809876A (en) * 1987-08-27 1989-03-07 Aluminum Company Of America Container body having improved gas barrier properties
JP2679067B2 (en) * 1987-12-15 1997-11-19 株式会社日本自動車部品総合研究所 Manufacturing method of substrate with diamond film
US5190824A (en) * 1988-03-07 1993-03-02 Semiconductor Energy Laboratory Co., Ltd. Electrostatic-erasing abrasion-proof coating
DE3830249A1 (en) * 1988-09-06 1990-03-15 Schott Glaswerke PLASMA PROCESS FOR COATING LEVEL SUBSTRATES
US5266409A (en) * 1989-04-28 1993-11-30 Digital Equipment Corporation Hydrogenated carbon compositions
EP0449571B1 (en) * 1990-03-30 1995-08-30 Sumitomo Electric Industries, Ltd. Polycrystalline diamond tool and method for producing the polycrystalline diamond tool
CA2044543C (en) * 1990-08-10 1999-12-14 Louis Kimball Bigelow Multi-layer superhard film structure
CA2089288A1 (en) * 1992-03-20 1993-09-21 David E. Slutz Multilayer cvd diamond films
DE4236324C1 (en) * 1992-10-28 1993-09-02 Schott Glaswerke, 55122 Mainz, De
US5470661A (en) * 1993-01-07 1995-11-28 International Business Machines Corporation Diamond-like carbon films from a hydrocarbon helium plasma
EP0643385A3 (en) * 1993-09-12 1996-01-17 Fujitsu Ltd Magnetic recording medium, magnetic head and magnetic recording apparatus.
JPH0853116A (en) * 1994-08-11 1996-02-27 Kirin Brewery Co Ltd Plastic container coated with carbon film
JP2788412B2 (en) * 1994-08-11 1998-08-20 麒麟麦酒株式会社 Apparatus and method for producing carbon film-coated plastic container
US6063149A (en) * 1995-02-24 2000-05-16 Zimmer; Jerry W. Graded grain size diamond layer
US5824387A (en) * 1996-02-05 1998-10-20 Seagate Technology, Inc. Magnetic disc with carbon protective layer having regions differing in hardness
JP3256459B2 (en) * 1996-05-20 2002-02-12 株式会社大協精工 Sanitary goods container and method for producing the same
DE19634795C2 (en) * 1996-08-29 1999-11-04 Schott Glas Plasma CVD system with an array of microwave plasma electrodes and plasma CVD processes
US5942317A (en) * 1997-01-31 1999-08-24 International Business Machines Corporation Hydrogenated carbon thin films
JPH10217522A (en) * 1997-02-07 1998-08-18 Fuji Photo Film Co Ltd Thermal head and manufacture of thermal head
EP1010773A4 (en) * 1997-02-19 2004-08-25 Kirin Brewery Method and apparatus for producing plastic container having carbon film coating
US5879459A (en) * 1997-08-29 1999-03-09 Genus, Inc. Vertically-stacked process reactor and cluster tool system for atomic layer deposition
JPH10306377A (en) * 1997-05-02 1998-11-17 Tokyo Electron Ltd Method for supplying minute amount of gas and device therefor
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
JPH11111644A (en) * 1997-09-30 1999-04-23 Japan Pionics Co Ltd Vaporization supplying equipment
US6194038B1 (en) * 1998-03-20 2001-02-27 Applied Materials, Inc. Method for deposition of a conformal layer on a substrate
US6475579B1 (en) * 1999-08-06 2002-11-05 Plastipak Packaging, Inc. Multi-layer plastic container having a carbon-treated internal surface and method for making the same
US6461699B1 (en) * 2000-10-06 2002-10-08 Plastipak Packaging, Inc. Plastic container having a carbon-treated internal surface for non-carbonated food products

Also Published As

Publication number Publication date
KR20030033003A (en) 2003-04-26
US20050019481A1 (en) 2005-01-27
CA2416521A1 (en) 2002-02-07
BR0112873A (en) 2003-07-01
JP2004505177A (en) 2004-02-19
FR2812665B1 (en) 2003-08-08
FR2812665A1 (en) 2002-02-08
US20050016459A1 (en) 2005-01-27
US20030150858A1 (en) 2003-08-14
EP1309737A1 (en) 2003-05-14
WO2002010474A1 (en) 2002-02-07
US20050019577A1 (en) 2005-01-27
MXPA03000910A (en) 2003-10-06
CN1446269A (en) 2003-10-01

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