AU2001273259A1 - Differentially-pumped material processing system - Google Patents

Differentially-pumped material processing system

Info

Publication number
AU2001273259A1
AU2001273259A1 AU2001273259A AU7325901A AU2001273259A1 AU 2001273259 A1 AU2001273259 A1 AU 2001273259A1 AU 2001273259 A AU2001273259 A AU 2001273259A AU 7325901 A AU7325901 A AU 7325901A AU 2001273259 A1 AU2001273259 A1 AU 2001273259A1
Authority
AU
Australia
Prior art keywords
differentially
processing system
material processing
pumped material
pumped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001273259A
Other languages
English (en)
Inventor
Piero Sferlazzo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon USA Inc
Original Assignee
Unaxis USA Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unaxis USA Inc filed Critical Unaxis USA Inc
Publication of AU2001273259A1 publication Critical patent/AU2001273259A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AU2001273259A 2000-07-10 2001-07-09 Differentially-pumped material processing system Abandoned AU2001273259A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US21704900P 2000-07-10 2000-07-10
US60217049 2000-07-10
US26611401P 2001-02-02 2001-02-02
US60266114 2001-02-02
US09840393 2001-04-23
US09/840,393 US6495010B2 (en) 2000-07-10 2001-04-23 Differentially-pumped material processing system
PCT/US2001/021516 WO2002005324A2 (fr) 2000-07-10 2001-07-09 Systeme de traitement de materiaux a pompage differentiel

Publications (1)

Publication Number Publication Date
AU2001273259A1 true AU2001273259A1 (en) 2002-01-21

Family

ID=27396362

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001273259A Abandoned AU2001273259A1 (en) 2000-07-10 2001-07-09 Differentially-pumped material processing system

Country Status (6)

Country Link
US (1) US6495010B2 (fr)
EP (1) EP1301650A2 (fr)
JP (1) JP2004524435A (fr)
CN (1) CN1208494C (fr)
AU (1) AU2001273259A1 (fr)
WO (1) WO2002005324A2 (fr)

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US9206500B2 (en) * 2003-08-11 2015-12-08 Boris Druz Method and apparatus for surface processing of a substrate using an energetic particle beam
US7879201B2 (en) * 2003-08-11 2011-02-01 Veeco Instruments Inc. Method and apparatus for surface processing of a substrate
US7695590B2 (en) 2004-03-26 2010-04-13 Applied Materials, Inc. Chemical vapor deposition plasma reactor having plural ion shower grids
US7244474B2 (en) * 2004-03-26 2007-07-17 Applied Materials, Inc. Chemical vapor deposition plasma process using an ion shower grid
US20060054494A1 (en) * 2004-09-16 2006-03-16 Veeco Instruments Inc. Physical vapor deposition apparatus for depositing thin multilayer films and methods of depositing such films
CN1891848A (zh) * 2005-07-01 2007-01-10 鸿富锦精密工业（深圳）有限公司 光学镀膜装置
US20070151842A1 (en) * 2005-12-15 2007-07-05 Fluens Corporation Apparatus for reactive sputtering
US20070209932A1 (en) * 2006-03-10 2007-09-13 Veeco Instruments Inc. Sputter deposition system and methods of use
WO2008021501A2 (fr) * 2006-08-18 2008-02-21 Piero Sferlazzo Appareil et procédé pour l'implantation très peu profonde dans un dispositive à semi-conducteurs
US8092599B2 (en) * 2007-07-10 2012-01-10 Veeco Instruments Inc. Movable injectors in rotating disc gas reactors
WO2009044473A1 (fr) * 2007-10-04 2009-04-09 Canon Anelva Corporation Dispositif de pulvérisation haute fréquence
US8347814B2 (en) * 2008-01-22 2013-01-08 Raytheon Canada Limited Method and apparatus for coating a curved surface
US20090258151A1 (en) * 2008-04-10 2009-10-15 Raytheon Company Method and Apparatus for Coating Curved Surfaces
US8398776B2 (en) * 2008-05-12 2013-03-19 Raytheon Canada Limited Method and apparatus for supporting workpieces in a coating apparatus
KR20110042051A (ko) 2008-06-11 2011-04-22 솔라 임플란트 테크놀로지스 아이엔씨. 주입을 사용하여 솔라 셀의 제작
US8246748B2 (en) * 2008-07-09 2012-08-21 Raytheon Canada Limited Method and apparatus for coating surfaces
US20100221426A1 (en) * 2009-03-02 2010-09-02 Fluens Corporation Web Substrate Deposition System
US8749053B2 (en) 2009-06-23 2014-06-10 Intevac, Inc. Plasma grid implant system for use in solar cell fabrications
US20110020623A1 (en) * 2009-07-22 2011-01-27 Raytheon Company Method and Apparatus for Repairing an Optical Component Substrate Through Coating
US9246101B2 (en) * 2010-03-09 2016-01-26 Sharp Kabushiki Kaisha Deposition mask, deposition apparatus, and deposition method
US20110229660A1 (en) * 2010-03-22 2011-09-22 Timothy Ray Reynolds Ion beam assisted deposition of ophthalmic lens coatings
US8758580B2 (en) 2010-08-23 2014-06-24 Vaeco Inc. Deposition system with a rotating drum
CN103237916B (zh) * 2010-12-03 2015-07-22 夏普株式会社 蒸镀装置和回收装置
JP6068491B2 (ja) 2011-11-08 2017-01-25 インテヴァック インコーポレイテッド 基板処理システムおよび基板処理方法
WO2014100506A1 (fr) 2012-12-19 2014-06-26 Intevac, Inc. Grille pour implantation ionique par plasma
US20140262749A1 (en) * 2013-03-14 2014-09-18 Intermolecular, Inc. Methods of Plasma Surface Treatment in a PVD Chamber
EP3100298B1 (fr) 2014-01-27 2020-07-15 Veeco Instruments Inc. Support de tranche doté de poches de rétention ayant des rayons composés pour des systèmes de dépôt chimique en phase vapeur
KR102284028B1 (ko) * 2016-09-13 2021-07-29 어플라이드 머티어리얼스, 인코포레이티드 단일 산화물 금속 증착 챔버
EP3366804B1 (fr) * 2017-02-22 2022-05-11 Satisloh AG Appareil de revêtement de boîtes pour le revêtement sous vide de substrats, en particulier de verres de lunettes
JP7039234B2 (ja) * 2017-09-29 2022-03-22 芝浦メカトロニクス株式会社 成膜装置
US20190189465A1 (en) * 2017-12-18 2019-06-20 Applied Materials, Inc. Methods and apparatus for physical vapor deposition
JP7134009B2 (ja) * 2018-07-31 2022-09-09 東京エレクトロン株式会社 成膜装置および成膜方法

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Also Published As

Publication number Publication date
EP1301650A2 (fr) 2003-04-16
CN1449455A (zh) 2003-10-15
US20020003086A1 (en) 2002-01-10
WO2002005324A3 (fr) 2002-06-20
JP2004524435A (ja) 2004-08-12
WO2002005324A2 (fr) 2002-01-17
CN1208494C (zh) 2005-06-29
US6495010B2 (en) 2002-12-17

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