ATE7431T1 - Verfahren zur bildung eines glaesernen abstandstuecks in der magnetspalte eines magnetkopfes. - Google Patents

Verfahren zur bildung eines glaesernen abstandstuecks in der magnetspalte eines magnetkopfes.

Info

Publication number
ATE7431T1
ATE7431T1 AT80300369T AT80300369T ATE7431T1 AT E7431 T1 ATE7431 T1 AT E7431T1 AT 80300369 T AT80300369 T AT 80300369T AT 80300369 T AT80300369 T AT 80300369T AT E7431 T1 ATE7431 T1 AT E7431T1
Authority
AT
Austria
Prior art keywords
magnetic
magnetic head
core materials
glass layer
head core
Prior art date
Application number
AT80300369T
Other languages
English (en)
Inventor
Kiyotaka Wasa
Takao Tohda
Kazuo Yokoyama
Eiichi Hirota
Shigeru Hayakawa
Original Assignee
Matsushita Electric Industrial Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co., Ltd. filed Critical Matsushita Electric Industrial Co., Ltd.
Application granted granted Critical
Publication of ATE7431T1 publication Critical patent/ATE7431T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/23—Gap features
    • G11B5/232—Manufacture of gap
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/23—Gap features
    • G11B5/235—Selection of material for gap filler
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49055—Fabricating head structure or component thereof with bond/laminating preformed parts, at least two magnetic
    • Y10T29/49057—Using glass bonding material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Heads (AREA)
AT80300369T 1980-02-07 1980-02-07 Verfahren zur bildung eines glaesernen abstandstuecks in der magnetspalte eines magnetkopfes. ATE7431T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP80300369A EP0033793B1 (de) 1980-02-07 1980-02-07 Verfahren zur Bildung eines gläsernen Abstandstücks in der Magnetspalte eines Magnetkopfes

Publications (1)

Publication Number Publication Date
ATE7431T1 true ATE7431T1 (de) 1984-05-15

Family

ID=8187097

Family Applications (1)

Application Number Title Priority Date Filing Date
AT80300369T ATE7431T1 (de) 1980-02-07 1980-02-07 Verfahren zur bildung eines glaesernen abstandstuecks in der magnetspalte eines magnetkopfes.

Country Status (4)

Country Link
US (1) US4288307A (de)
EP (1) EP0033793B1 (de)
AT (1) ATE7431T1 (de)
DE (1) DE3067724D1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3427587A1 (de) * 1984-07-26 1986-02-06 Leybold-Heraeus GmbH, 5000 Köln Zerstaeubungseinrichtung fuer katodenzerstaeubungsanlagen
US4865436A (en) * 1986-03-25 1989-09-12 Honeywell Inc. Low cost ring laser angular rate sensor
JP2911687B2 (ja) * 1992-09-25 1999-06-23 キヤノン株式会社 磁気ヘッドの製造方法
GB2331764B (en) * 1997-12-01 2002-06-26 Ca Nat Research Council Sputtering method and apparatus with optical monitoring
US7781679B1 (en) * 2005-09-09 2010-08-24 Magnecomp Corporation Disk drive suspension via formation using a tie layer and product
US8553364B1 (en) 2005-09-09 2013-10-08 Magnecomp Corporation Low impedance, high bandwidth disk drive suspension circuit
US7829793B2 (en) * 2005-09-09 2010-11-09 Magnecomp Corporation Additive disk drive suspension manufacturing using tie layers for vias and product thereof
US8845866B2 (en) * 2005-12-22 2014-09-30 General Electric Company Optoelectronic devices having electrode films and methods and system for manufacturing the same
CN101586232A (zh) * 2008-05-23 2009-11-25 鸿富锦精密工业（深圳）有限公司 补正板形变监测系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1927881U (de) * 1960-09-15 1965-11-25 Heraeus Gmbh W C Vakuum-bedampfungseinrichtung.
US3417733A (en) * 1963-12-02 1968-12-24 Fuji Photo Film Co Ltd Apparatus for vacuum coating
US3458926A (en) * 1965-10-08 1969-08-05 Ibm Method of forming a glass filled gap
US3605258A (en) * 1968-11-21 1971-09-20 Ferroxcube Corp Fabrication of recording heads
SE350537B (de) * 1970-09-18 1972-10-30 Aga Ab
JPS4726888U (de) * 1971-04-15 1972-11-27
FR2136999B1 (de) * 1971-05-11 1973-05-11 Radiotechnique Compelec
DE2624700A1 (de) * 1976-06-02 1977-12-15 Leybold Heraeus Gmbh & Co Kg Verfahren und vorrichtung zum gleichfoermigen beschichten von flaechigen substraten

Also Published As

Publication number Publication date
US4288307A (en) 1981-09-08
DE3067724D1 (en) 1984-06-14
EP0033793A1 (de) 1981-08-19
EP0033793B1 (de) 1984-05-09

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
EELA Cancelled due to lapse of time