ATE70914T1 - Verfahren zum praezisionsmessen mittels eines abtastelelektronenmikroskops. - Google Patents

Verfahren zum praezisionsmessen mittels eines abtastelelektronenmikroskops.

Info

Publication number
ATE70914T1
ATE70914T1 AT85901788T AT85901788T ATE70914T1 AT E70914 T1 ATE70914 T1 AT E70914T1 AT 85901788 T AT85901788 T AT 85901788T AT 85901788 T AT85901788 T AT 85901788T AT E70914 T1 ATE70914 T1 AT E70914T1
Authority
AT
Austria
Prior art keywords
electron microscope
scanning electron
microprocessor
scans
stage
Prior art date
Application number
AT85901788T
Other languages
English (en)
Inventor
Dieter Georg Seiler
David Vernon Sulway
Original Assignee
Vickers Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vickers Plc filed Critical Vickers Plc
Application granted granted Critical
Publication of ATE70914T1 publication Critical patent/ATE70914T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
AT85901788T 1984-03-20 1985-03-20 Verfahren zum praezisionsmessen mittels eines abtastelelektronenmikroskops. ATE70914T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US59161684A 1984-03-20 1984-03-20
EP85901788A EP0177566B1 (de) 1984-03-20 1985-03-20 Verfahren zum präzisionsmessen mittels eines abtastelelektronenmikroskops
PCT/US1985/000461 WO1985004250A1 (en) 1984-03-20 1985-03-20 Method and apparatus for precision sem measurements

Publications (1)

Publication Number Publication Date
ATE70914T1 true ATE70914T1 (de) 1992-01-15

Family

ID=24367175

Family Applications (1)

Application Number Title Priority Date Filing Date
AT85901788T ATE70914T1 (de) 1984-03-20 1985-03-20 Verfahren zum praezisionsmessen mittels eines abtastelelektronenmikroskops.

Country Status (7)

Country Link
US (1) US4766311A (de)
EP (1) EP0177566B1 (de)
JP (1) JPS61502486A (de)
KR (1) KR850700273A (de)
AT (1) ATE70914T1 (de)
DE (1) DE3585013D1 (de)
WO (1) WO1985004250A1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4733074A (en) * 1985-04-17 1988-03-22 Hitachi, Ltd. Sample surface structure measuring method
US4870352A (en) * 1988-07-05 1989-09-26 Fibertek, Inc. Contactless current probe based on electron tunneling
US5124927A (en) * 1990-03-02 1992-06-23 International Business Machines Corp. Latent-image control of lithography tools
US5155359A (en) * 1991-04-05 1992-10-13 Metrologix, Inc. Atomic scale calibration system
JP3345060B2 (ja) * 1992-11-09 2002-11-18 日本テキサス・インスツルメンツ株式会社 走査形電子顕微鏡における画像信号処理方法およびその装置
JP2823450B2 (ja) * 1992-11-19 1998-11-11 株式会社東芝 回路パターンの寸法測定方法
US5308974B1 (en) * 1992-11-30 1998-01-06 Digital Instr Inc Scanning probe microscope using stored data for vertical probe positioning
JP2802571B2 (ja) * 1993-03-23 1998-09-24 株式会社日立製作所 電子線測長装置
US7095885B1 (en) 2000-03-01 2006-08-22 Micron Technology, Inc. Method for measuring registration of overlapping material layers of an integrated circuit
US6570157B1 (en) 2000-06-09 2003-05-27 Advanced Micro Devices, Inc. Multi-pitch and line calibration for mask and wafer CD-SEM system
US6573498B1 (en) 2000-06-30 2003-06-03 Advanced Micro Devices, Inc. Electric measurement of reference sample in a CD-SEM and method for calibration
US6573497B1 (en) 2000-06-30 2003-06-03 Advanced Micro Devices, Inc. Calibration of CD-SEM by e-beam induced current measurement
US6635874B1 (en) * 2000-10-24 2003-10-21 Advanced Micro Devices, Inc. Self-cleaning technique for contamination on calibration sample in SEM
US6852974B2 (en) * 2001-03-06 2005-02-08 Topcon Corporation Electron beam device and method for stereoscopic measurements
US6878935B2 (en) * 2002-04-03 2005-04-12 General Phosphorix Method of measuring sizes in scan microscopes
US6862545B1 (en) * 2003-04-03 2005-03-01 Taiwan Semiconductor Manufacturing Co., Ltd Linewidth measurement tool calibration method employing linewidth standard
FR2877102A1 (fr) * 2004-10-27 2006-04-28 Tribvn Sa Procede d'etalonnage mecanique par recalage de signal
US8143763B2 (en) * 2009-05-29 2012-03-27 Rhk Technology, Inc. Linear piezoelectric nano-positioner
KR101281649B1 (ko) * 2011-03-31 2013-07-03 경북대학교 산학협력단 이광자현미경 장치
US8912488B2 (en) * 2012-11-15 2014-12-16 Fei Company Automated sample orientation
JP6080565B2 (ja) * 2013-01-24 2017-02-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6548542B2 (ja) * 2015-09-29 2019-07-24 株式会社ホロン Ｓｅｍ画像取得装置およびｓｅｍ画像取得方法
US10838191B2 (en) * 2016-12-21 2020-11-17 Carl Zeiss Microscopy Gmbh Method of operating a microscope
JP6855271B2 (ja) * 2017-02-18 2021-04-07 株式会社ホロン 長寸法測定方法
DE102018204683B3 (de) * 2018-03-27 2019-08-08 Carl Zeiss Microscopy Gmbh Elektronenstrahlmikroskop

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4834347B1 (de) * 1969-08-11 1973-10-20
US4052603A (en) * 1974-12-23 1977-10-04 International Business Machines Corporation Object positioning process and apparatus
JPS51134558A (en) * 1975-05-19 1976-11-22 Hitachi Ltd Measuring unit
DD124091A1 (de) * 1975-09-24 1977-02-02
JPS5434673A (en) * 1977-08-23 1979-03-14 Hitachi Ltd Micro-distance measuring device for scan-type electronic microscope
JPS5851664B2 (ja) * 1979-03-28 1983-11-17 株式会社日立製作所 試料像表示装置
JPS58186009A (ja) * 1982-04-23 1983-10-29 Jeol Ltd 測長方法

Also Published As

Publication number Publication date
KR850700273A (ko) 1985-12-26
US4766311A (en) 1988-08-23
WO1985004250A1 (en) 1985-09-26
EP0177566A4 (de) 1987-03-26
DE3585013D1 (de) 1992-02-06
EP0177566B1 (de) 1991-12-27
JPS61502486A (ja) 1986-10-30
EP0177566A1 (de) 1986-04-16

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Legal Events

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