JPS54105972A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS54105972A
JPS54105972A JP1281178A JP1281178A JPS54105972A JP S54105972 A JPS54105972 A JP S54105972A JP 1281178 A JP1281178 A JP 1281178A JP 1281178 A JP1281178 A JP 1281178A JP S54105972 A JPS54105972 A JP S54105972A
Authority
JP
Japan
Prior art keywords
electron beam
scanning
mark
deflecting
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1281178A
Other languages
Japanese (ja)
Other versions
JPS6253940B2 (en
Inventor
Nobuo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP1281178A priority Critical patent/JPS54105972A/en
Publication of JPS54105972A publication Critical patent/JPS54105972A/en
Publication of JPS6253940B2 publication Critical patent/JPS6253940B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To minimize the deflecting aberration in a short time by providing plural number of marks at the periphery of the test sample, giving the linear scanning via the electron beam in both X and Y directions, giving detection and differentiation to the caused electron beam signals which are displayed on the display unit for observation and adjustment of the deflecting unit position. CONSTITUTION:Electron beam 2 given from electronic gun 1 is condensed through condenser lens 3, and at the same time X and Y deflecting units 5X and 5Y scan on test sample 4. In this case, grid mark 6 is provided on sample 4 such as the Si wafer or the like via Au, and the coordinates of point (a) at the centerpart and points (b)-(e) at the peripheral four corners are memorized in electronic computer 7. And either mark is used for the starting point of the scanning. Then the scanning signals from 1st scanning signal generator 8 are supplied to unit 5X and 5Y based on the command given from computer 7, and the electron beam generated from mark 6 is detected through detector 10 and then supplied to differential circuit 13. At the same time, 2nd scanning signal generator 14 is actuated to produce the differential waveform at oscillograph 16. And the waveform is observed to control unit 5X and 5Y.
JP1281178A 1978-02-07 1978-02-07 Electron beam exposure device Granted JPS54105972A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1281178A JPS54105972A (en) 1978-02-07 1978-02-07 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1281178A JPS54105972A (en) 1978-02-07 1978-02-07 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS54105972A true JPS54105972A (en) 1979-08-20
JPS6253940B2 JPS6253940B2 (en) 1987-11-12

Family

ID=11815760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1281178A Granted JPS54105972A (en) 1978-02-07 1978-02-07 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS54105972A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04313214A (en) * 1990-10-25 1992-11-05 Internatl Business Mach Corp <Ibm> Calibration grid and manufacture and cleaning thereof, grid and manufacture thereof, operation of electronbeam lithography machine and product manufactured by processincluding electron beam lithograpy step
US6830370B1 (en) 2000-11-28 2004-12-14 Ohr Co., Ltd. Cavitation generating device and fluid mixing device using the device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5130357A (en) * 1974-09-09 1976-03-15 Nippon Telegraph & Telephone DENSHIBIIMUROKONIOKERU DENSHIBIIMUSHU SOKUHOHO

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5130357A (en) * 1974-09-09 1976-03-15 Nippon Telegraph & Telephone DENSHIBIIMUROKONIOKERU DENSHIBIIMUSHU SOKUHOHO

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04313214A (en) * 1990-10-25 1992-11-05 Internatl Business Mach Corp <Ibm> Calibration grid and manufacture and cleaning thereof, grid and manufacture thereof, operation of electronbeam lithography machine and product manufactured by processincluding electron beam lithograpy step
US6830370B1 (en) 2000-11-28 2004-12-14 Ohr Co., Ltd. Cavitation generating device and fluid mixing device using the device

Also Published As

Publication number Publication date
JPS6253940B2 (en) 1987-11-12

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