ATE555229T1 - Sio-abscheidungsmaterial - Google Patents

Sio-abscheidungsmaterial

Info

Publication number
ATE555229T1
ATE555229T1 AT05770381T AT05770381T ATE555229T1 AT E555229 T1 ATE555229 T1 AT E555229T1 AT 05770381 T AT05770381 T AT 05770381T AT 05770381 T AT05770381 T AT 05770381T AT E555229 T1 ATE555229 T1 AT E555229T1
Authority
AT
Austria
Prior art keywords
silicon monoxide
vapor deposition
deposition material
ppm
hydrogen gas
Prior art date
Application number
AT05770381T
Other languages
English (en)
Inventor
Kazuo Nishioka
Shingo Kizaki
Original Assignee
Osaka Titanium Technologies Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Titanium Technologies Co filed Critical Osaka Titanium Technologies Co
Application granted granted Critical
Publication of ATE555229T1 publication Critical patent/ATE555229T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Wrappers (AREA)
  • Laminated Bodies (AREA)
  • Glass Compositions (AREA)
AT05770381T 2004-09-01 2005-08-09 Sio-abscheidungsmaterial ATE555229T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004253771 2004-09-01
PCT/JP2005/014554 WO2006025195A1 (ja) 2004-09-01 2005-08-09 ＳｉＯ蒸着材、原料用Ｓｉ粉末およびＳｉＯ蒸着材の製造方法

Publications (1)

Publication Number Publication Date
ATE555229T1 true ATE555229T1 (de) 2012-05-15

Family

ID=35999855

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05770381T ATE555229T1 (de) 2004-09-01 2005-08-09 Sio-abscheidungsmaterial

Country Status (6)

Country Link
US (1) US20080025897A1 (de)
EP (1) EP1795624B1 (de)
JP (1) JP5074764B2 (de)
CN (1) CN101010444A (de)
AT (1) ATE555229T1 (de)
WO (1) WO2006025195A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7947377B2 (en) * 2007-06-20 2011-05-24 Dai Nippon Printing Co., Ltd. Powder mixture to be made into evaporation source material for use in ion plating, evaporation source material for use in ion plating and method of producing the same, and gas barrier sheet and method of producing the same
WO2010003455A1 (en) * 2008-07-09 2010-01-14 Degussa Novara Technology S.P.A. Silicon-based green bodies
JP4749502B2 (ja) 2009-10-09 2011-08-17 株式会社大阪チタニウムテクノロジーズ ＳｉＯｘならびにこれを用いたバリアフィルム用蒸着材およびリチウムイオン二次電池用負極活物質
JP6335071B2 (ja) * 2014-08-29 2018-05-30 キヤノンオプトロン株式会社 蒸着材料、蒸着材料の製造方法、光学素子の製造方法およびガスバリアフィルムの製造方法
TWI658002B (zh) * 2018-08-15 2019-05-01 國立臺灣大學 製造一氧化矽沉積物之方法及執行該方法之製造設備
JP7175456B2 (ja) * 2019-12-06 2022-11-21 松田産業株式会社 蒸着材料及びその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD233748A3 (de) * 1983-12-30 1986-03-12 Torgau Flachglas Aufdampfmaterial zur erzielung extrem hoher aufdampfraten
US5037503A (en) * 1988-05-31 1991-08-06 Osaka Titanium Co., Ltd. Method for growing silicon single crystal
US6001209A (en) * 1993-05-17 1999-12-14 Popat; Ghanshyam H. Divisible laser note sheet
US7374631B1 (en) * 1998-09-22 2008-05-20 Avery Dennison Corporation Methods of forming printable media using a laminate sheet construction
WO2001087772A1 (en) * 2000-05-16 2001-11-22 Tohoku Electric Power Company Incorporated Method and apparatus for production of high purity silicon
EP1318207A4 (de) * 2000-08-31 2006-08-16 Sumitomo Titanium Corp Siliziummonoxid-gasphasenabscheidungsmaterial, herstellungsverfahren dafür, rohmaterial zu dessen herstellung und vorrichtung zur herstellung
JP3488419B2 (ja) * 2000-08-31 2004-01-19 住友チタニウム株式会社 一酸化けい素蒸着材料の製造方法
JP2004076120A (ja) * 2002-08-21 2004-03-11 Shin Etsu Chem Co Ltd フィルム蒸着用酸化珪素及びその製造方法
US20060198979A1 (en) * 2005-03-07 2006-09-07 Mcconkie James W Adhesive printing material assemblies and methods of use

Also Published As

Publication number Publication date
US20080025897A1 (en) 2008-01-31
CN101010444A (zh) 2007-08-01
JP5074764B2 (ja) 2012-11-14
EP1795624A1 (de) 2007-06-13
JPWO2006025195A1 (ja) 2008-05-08
EP1795624B1 (de) 2012-04-25
EP1795624A4 (de) 2009-07-22
WO2006025195A1 (ja) 2006-03-09

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