ATE550915T1 - Vorrichtung und verfahren zur anpassung der kollisionszeit zwischen elektronenstrahlen und laserlicht - Google Patents

Vorrichtung und verfahren zur anpassung der kollisionszeit zwischen elektronenstrahlen und laserlicht

Info

Publication number
ATE550915T1
ATE550915T1 AT08790768T AT08790768T ATE550915T1 AT E550915 T1 ATE550915 T1 AT E550915T1 AT 08790768 T AT08790768 T AT 08790768T AT 08790768 T AT08790768 T AT 08790768T AT E550915 T1 ATE550915 T1 AT E550915T1
Authority
AT
Austria
Prior art keywords
laser light
moment
delay time
electron beam
adjusting
Prior art date
Application number
AT08790768T
Other languages
English (en)
Inventor
Hiroyuki Nose
Daisuke Ishida
Namio Kaneko
Yasuo Sakai
Mitsuru Uesaka
Fumito Sakamoto
Katsuhiro Dobashi
Original Assignee
Ihi Corp
Univ Tokyo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ihi Corp, Univ Tokyo filed Critical Ihi Corp
Application granted granted Critical
Publication of ATE550915T1 publication Critical patent/ATE550915T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Lasers (AREA)
  • Optical Radar Systems And Details Thereof (AREA)
AT08790768T 2007-07-03 2008-07-01 Vorrichtung und verfahren zur anpassung der kollisionszeit zwischen elektronenstrahlen und laserlicht ATE550915T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007175190A JP4793936B2 (ja) 2007-07-03 2007-07-03 電子ビームとレーザ光の衝突タイミング調整装置および方法
PCT/JP2008/061905 WO2009005060A1 (ja) 2007-07-03 2008-07-01 電子ビームとレーザ光の衝突タイミング調整装置および方法

Publications (1)

Publication Number Publication Date
ATE550915T1 true ATE550915T1 (de) 2012-04-15

Family

ID=40226105

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08790768T ATE550915T1 (de) 2007-07-03 2008-07-01 Vorrichtung und verfahren zur anpassung der kollisionszeit zwischen elektronenstrahlen und laserlicht

Country Status (5)

Country Link
US (1) US8000448B2 (de)
EP (1) EP2164307B1 (de)
JP (1) JP4793936B2 (de)
AT (1) ATE550915T1 (de)
WO (1) WO2009005060A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5625414B2 (ja) * 2010-03-18 2014-11-19 株式会社Ihi Ｘ線発生方法
JP5113287B2 (ja) * 2011-11-01 2013-01-09 株式会社Ｉｈｉ Ｘ線計測装置及びｘ線計測方法
US9778391B2 (en) * 2013-03-15 2017-10-03 Varex Imaging Corporation Systems and methods for multi-view imaging and tomography
CN106793433A (zh) * 2016-12-07 2017-05-31 中国科学院光电研究院 一种具有高平均束流和单脉冲束流的小型化x射线仪
CN117545157B (zh) * 2024-01-09 2024-03-12 西南交通大学 一种用于测量等离子体电势和电场的诊断方法及系统

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5990399A (ja) * 1982-09-07 1984-05-24 イメ−ジング・サイエンス・アソシエイツ・リミテツド・パ−トナ−シツプ Ｘ線発生方法及びその装置
JP2528622B2 (ja) 1993-08-19 1996-08-28 財団法人レーザー技術総合研究所 高輝度Ｘ線又はγ線の発生方法及び装置
JPH11142786A (ja) 1997-11-13 1999-05-28 Nippon Laser:Kk レーザー光路分配装置
JP3398908B2 (ja) * 1998-03-18 2003-04-21 住友重機械工業株式会社 電子／レーザ衝突型ｘ線発生装置及びｘ線発生方法
US6687333B2 (en) * 1999-01-25 2004-02-03 Vanderbilt University System and method for producing pulsed monochromatic X-rays
US6377651B1 (en) * 1999-10-11 2002-04-23 University Of Central Florida Laser plasma source for extreme ultraviolet lithography using a water droplet target
JP2001345503A (ja) 2000-05-31 2001-12-14 Toshiba Corp レーザ逆コンプトン光生成装置
JP3463281B2 (ja) 2000-06-28 2003-11-05 住友重機械工業株式会社 多軸レーザ加工装置及びレーザ加工方法
US7372056B2 (en) * 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
JP4174331B2 (ja) 2003-01-23 2008-10-29 住友重機械工業株式会社 Ｘ線発生装置及び発生方法
JP2004226271A (ja) 2003-01-23 2004-08-12 Sumitomo Heavy Ind Ltd Ｘ線発生装置及び発生方法
US7016470B2 (en) * 2004-03-29 2006-03-21 General Electric Company System and method for X-ray generation
US7277526B2 (en) * 2004-04-09 2007-10-02 Lyncean Technologies, Inc. Apparatus, system, and method for high flux, compact compton x-ray source
JP4674802B2 (ja) 2005-05-12 2011-04-20 株式会社Ｉｈｉ 多色ｘ線発生装置
JP4612466B2 (ja) * 2005-05-12 2011-01-12 株式会社Ｉｈｉ 診断・治療用ｘ線切換え発生装置
US7382861B2 (en) * 2005-06-02 2008-06-03 John M. J. Madey High efficiency monochromatic X-ray source using an optical undulator
JP2006344731A (ja) 2005-06-08 2006-12-21 Ishikawajima Harima Heavy Ind Co Ltd レーザー光周回装置及びレーザー光周回方法

Also Published As

Publication number Publication date
EP2164307A1 (de) 2010-03-17
WO2009005060A1 (ja) 2009-01-08
US8000448B2 (en) 2011-08-16
EP2164307A4 (de) 2011-08-31
JP2009016123A (ja) 2009-01-22
EP2164307B1 (de) 2012-03-21
JP4793936B2 (ja) 2011-10-12
US20110007875A1 (en) 2011-01-13

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