WO2009005059A1 - 高輝度ｘ線発生装置および方法 - Google Patents

高輝度ｘ線発生装置および方法 Download PDF

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Publication number
WO2009005059A1
WO2009005059A1 PCT/JP2008/061904 JP2008061904W WO2009005059A1 WO 2009005059 A1 WO2009005059 A1 WO 2009005059A1 JP 2008061904 W JP2008061904 W JP 2008061904W WO 2009005059 A1 WO2009005059 A1 WO 2009005059A1
Authority
WO
WIPO (PCT)
Prior art keywords
pulse laser
laser light
high brightness
ray generating
generating device
Prior art date
Application number
PCT/JP2008/061904
Other languages
English (en)
French (fr)
Inventor
Hiroyuki Nose
Daisuke Ishida
Namio Kaneko
Yasuo Sakai
Mitsuru Uesaka
Fumito Sakamoto
Katsuhiro Dobashi
Original Assignee
Ihi Corporation
The University Of Tokyo
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ihi Corporation, The University Of Tokyo filed Critical Ihi Corporation
Priority to US12/667,509 priority Critical patent/US8102968B2/en
Priority to EP08790767A priority patent/EP2164306B1/en
Publication of WO2009005059A1 publication Critical patent/WO2009005059A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma

Abstract

　電子ビームとパルスレーザ光とを衝突させて逆コンプトン散乱によりＸ線を発生させる高輝度Ｘ線発生装置。それぞれパルスレーザ光３ａ，３ｂを所定の周期で出射する複数のパルスレーザ装置３２Ａ，３２Ｂと、複数のパルスレーザ光の光路を一致させる光路整合装置３４と、パルスレーザ装置と光路整合装置のタイミングを制御するタイミング制御装置４０とを備え、複数のパルスレーザ光を同一の光路からタイミングをずらして出射する。
PCT/JP2008/061904 2007-07-03 2008-07-01 高輝度ｘ線発生装置および方法 WO2009005059A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/667,509 US8102968B2 (en) 2007-07-03 2008-07-01 High brightness X-ray generating device and method
EP08790767A EP2164306B1 (en) 2007-07-03 2008-07-01 High brightness x-ray generating device and method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-175180 2007-07-03
JP2007175180A JP4863395B2 (ja) 2007-07-03 2007-07-03 高輝度ｘ線発生装置および方法

Publications (1)

Publication Number Publication Date
WO2009005059A1 true WO2009005059A1 (ja) 2009-01-08

Family

ID=40226104

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061904 WO2009005059A1 (ja) 2007-07-03 2008-07-01 高輝度ｘ線発生装置および方法

Country Status (4)

Country Link
US (1) US8102968B2 (ja)
EP (1) EP2164306B1 (ja)
JP (1) JP4863395B2 (ja)
WO (1) WO2009005059A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5578482B2 (ja) * 2009-09-01 2014-08-27 株式会社Ｉｈｉ Ｌｐｐ方式のｅｕｖ光源とその発生方法
JP2012038866A (ja) 2010-08-05 2012-02-23 High Energy Accelerator Research Organization レーザー発振装置
JP5113287B2 (ja) * 2011-11-01 2013-01-09 株式会社Ｉｈｉ Ｘ線計測装置及びｘ線計測方法
WO2014118999A1 (en) 2013-02-01 2014-08-07 Inter-University Research Institute Corporation High Energy Accelerator Research Organization Burst-laser generator using an optical resonator
JP5962699B2 (ja) * 2014-04-15 2016-08-03 ウシオ電機株式会社 エネルギービームの位置合わせ装置および位置合わせ方法
JP6252358B2 (ja) * 2014-05-27 2017-12-27 ウシオ電機株式会社 極端紫外光光源装置
KR101735213B1 (ko) 2015-12-23 2017-05-12 한국기초과학지원연구원 레이저 빔 결합 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11142786A (ja) * 1997-11-13 1999-05-28 Nippon Laser:Kk レーザー光路分配装置
JP3463281B2 (ja) * 2000-06-28 2003-11-05 住友重機械工業株式会社 多軸レーザ加工装置及びレーザ加工方法
JP2006318746A (ja) * 2005-05-12 2006-11-24 Ishikawajima Harima Heavy Ind Co Ltd 多色ｘ線発生装置
JP2006344731A (ja) * 2005-06-08 2006-12-21 Ishikawajima Harima Heavy Ind Co Ltd レーザー光周回装置及びレーザー光周回方法

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Publication number Priority date Publication date Assignee Title
JP2528622B2 (ja) 1993-08-19 1996-08-28 財団法人レーザー技術総合研究所 高輝度Ｘ線又はγ線の発生方法及び装置
US6687333B2 (en) * 1999-01-25 2004-02-03 Vanderbilt University System and method for producing pulsed monochromatic X-rays
US6377651B1 (en) * 1999-10-11 2002-04-23 University Of Central Florida Laser plasma source for extreme ultraviolet lithography using a water droplet target
JP3497447B2 (ja) 2000-05-29 2004-02-16 住友重機械工業株式会社 Ｘ線発生装置及び発生方法
JP2001345503A (ja) 2000-05-31 2001-12-14 Toshiba Corp レーザ逆コンプトン光生成装置
US7372056B2 (en) * 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
JP2004226271A (ja) 2003-01-23 2004-08-12 Sumitomo Heavy Ind Ltd Ｘ線発生装置及び発生方法
JP4174331B2 (ja) 2003-01-23 2008-10-29 住友重機械工業株式会社 Ｘ線発生装置及び発生方法
US7016470B2 (en) 2004-03-29 2006-03-21 General Electric Company System and method for X-ray generation
JP4612466B2 (ja) 2005-05-12 2011-01-12 株式会社Ｉｈｉ 診断・治療用ｘ線切換え発生装置
US7382861B2 (en) * 2005-06-02 2008-06-03 John M. J. Madey High efficiency monochromatic X-ray source using an optical undulator

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11142786A (ja) * 1997-11-13 1999-05-28 Nippon Laser:Kk レーザー光路分配装置
JP3463281B2 (ja) * 2000-06-28 2003-11-05 住友重機械工業株式会社 多軸レーザ加工装置及びレーザ加工方法
JP2006318746A (ja) * 2005-05-12 2006-11-24 Ishikawajima Harima Heavy Ind Co Ltd 多色ｘ線発生装置
JP2006344731A (ja) * 2005-06-08 2006-12-21 Ishikawajima Harima Heavy Ind Co Ltd レーザー光周回装置及びレーザー光周回方法

Also Published As

Publication number Publication date
US8102968B2 (en) 2012-01-24
JP4863395B2 (ja) 2012-01-25
EP2164306B1 (en) 2013-02-13
JP2009016488A (ja) 2009-01-22
EP2164306A4 (en) 2011-08-31
US20110013749A1 (en) 2011-01-20
EP2164306A1 (en) 2010-03-17

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