ATE548487T1 - Verfahren und system zur herstellung von ingots anhand von geringwertigem siliciummaterial - Google Patents
Verfahren und system zur herstellung von ingots anhand von geringwertigem siliciummaterialInfo
- Publication number
- ATE548487T1 ATE548487T1 AT08796655T AT08796655T ATE548487T1 AT E548487 T1 ATE548487 T1 AT E548487T1 AT 08796655 T AT08796655 T AT 08796655T AT 08796655 T AT08796655 T AT 08796655T AT E548487 T1 ATE548487 T1 AT E548487T1
- Authority
- AT
- Austria
- Prior art keywords
- silicon
- low
- generally
- molten
- grade
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
Landscapes
- Silicon Compounds (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/828,734 US7955433B2 (en) | 2007-07-26 | 2007-07-26 | Method and system for forming a silicon ingot using a low-grade silicon feedstock |
| PCT/US2008/071234 WO2009015356A1 (en) | 2007-07-26 | 2008-07-25 | Method and system for forming a silicon ingot using a low-grade silicon feedstock |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE548487T1 true ATE548487T1 (de) | 2012-03-15 |
Family
ID=40281853
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT08796655T ATE548487T1 (de) | 2007-07-26 | 2008-07-25 | Verfahren und system zur herstellung von ingots anhand von geringwertigem siliciummaterial |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US7955433B2 (de) |
| EP (1) | EP2179078B1 (de) |
| JP (1) | JP5462988B2 (de) |
| CN (1) | CN102037163B (de) |
| AT (1) | ATE548487T1 (de) |
| ES (1) | ES2383928T3 (de) |
| WO (1) | WO2009015356A1 (de) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7955433B2 (en) | 2007-07-26 | 2011-06-07 | Calisolar, Inc. | Method and system for forming a silicon ingot using a low-grade silicon feedstock |
| KR101318427B1 (ko) * | 2008-08-15 | 2013-10-16 | 가부시키가이샤 아루박 | 실리콘의 정제 방법 |
| US8679888B2 (en) * | 2008-09-24 | 2014-03-25 | The Board Of Trustees Of The University Of Illinois | Arrays of ultrathin silicon solar microcells |
| US20100213643A1 (en) * | 2009-02-26 | 2010-08-26 | Gadgil Prasad N | Rapid synthesis of polycrystalline silicon sheets for photo-voltaic solar cell manufacturing |
| TWI379430B (en) * | 2009-04-16 | 2012-12-11 | Atomic Energy Council | A method of fabricating a thin interface for internal light reflection and impurities isolation |
| CN101575733B (zh) * | 2009-05-22 | 2011-07-27 | 北京航空航天大学 | 一种工业化生产太阳能级多晶硅的方法 |
| CN101775650B (zh) * | 2010-03-12 | 2013-01-30 | 厦门大学 | 一种太阳能多晶硅铸锭的制备方法 |
| CN102021650B (zh) * | 2010-12-31 | 2012-06-06 | 常州天合光能有限公司 | 一种大型多晶锭的生产方法 |
| EP2686465A4 (de) * | 2011-03-15 | 2014-08-06 | Gtat Corp | Automatisiertes sichtsystem für eine kristallzüchtungsvorrichtung |
| JP5512647B2 (ja) * | 2011-12-22 | 2014-06-04 | シャープ株式会社 | シリコンの精製方法、吸収ユニット、およびシリコン精製装置 |
| CN103266351B (zh) * | 2013-05-31 | 2015-08-12 | 大连理工大学 | 多晶硅铸锭硅固液分离方法及设备 |
| US10402360B2 (en) * | 2016-06-10 | 2019-09-03 | Johnson Controls Technology Company | Building management system with automatic equipment discovery and equipment model distribution |
| JP6919633B2 (ja) | 2018-08-29 | 2021-08-18 | 信越半導体株式会社 | 単結晶育成方法 |
| JP7052645B2 (ja) * | 2018-08-29 | 2022-04-12 | 信越半導体株式会社 | 単結晶育成方法 |
| ES2941508T3 (es) * | 2019-04-30 | 2023-05-23 | Wacker Chemie Ag | Procedimiento para el refinado de masas fundidas de silicio en bruto por medio de un mediador particulado |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3012865A (en) | 1957-11-25 | 1961-12-12 | Du Pont | Silicon purification process |
| DE2143112A1 (de) * | 1971-08-27 | 1973-03-01 | Siemens Ag | Verfahren zur erzielung eines gleichmaessigen radialen widerstandsverlaufs beim herstellen eines halbleiter-einkristallstabes durch tiegelfreies zonenschmelzen |
| SU661966A1 (ru) * | 1976-11-23 | 1980-04-05 | Всесоюзный Научно-Исследовательский Институт Монокристаллов И Особо Чистых Химических Веществ "Вниимонокристалл" | Устройство дл выт гивани монокристаллов из расплава |
| FR2430917A1 (fr) * | 1978-07-11 | 1980-02-08 | Comp Generale Electricite | Procede et dispositif d'elaboration de silicium polycristallin |
| JPS5933554B2 (ja) * | 1982-08-19 | 1984-08-16 | 株式会社東芝 | 結晶成長装置 |
| US4565671A (en) * | 1983-08-05 | 1986-01-21 | Kabushiki Kaisha Toshiba | Single crystal manufacturing apparatus |
| DE3411955A1 (de) | 1984-03-30 | 1985-10-10 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und vorrichtung zum abtrennen fester bestandteile aus fluessigem silicium |
| EP0221051A1 (de) * | 1985-04-16 | 1987-05-13 | Energy Materials Corporation | Verfahren und vorrichtung zum wachsen von monokristallen |
| JPS62291977A (ja) | 1986-06-06 | 1987-12-18 | シ−メンス、アクチエンゲゼルシヤフト | 太陽電池用シリコン盤の切り出し方法と装置 |
| US5314667A (en) * | 1991-03-04 | 1994-05-24 | Lim John C | Method and apparatus for single crystal silicon production |
| US5580171A (en) * | 1995-07-24 | 1996-12-03 | Lim; John C. | Solids mixing, storing and conveying system for use with a furnace for single crystal silicon production |
| EP0796820B1 (de) | 1996-03-19 | 2000-07-19 | Kawasaki Steel Corporation | Verfahren und Vorrichtung zur Raffinierung von Silicium |
| JP3325900B2 (ja) | 1996-10-14 | 2002-09-17 | 川崎製鉄株式会社 | 多結晶シリコンの製造方法及び装置、並びに太陽電池用シリコン基板の製造方法 |
| CA2232777C (en) | 1997-03-24 | 2001-05-15 | Hiroyuki Baba | Method for producing silicon for use in solar cells |
| JP3520957B2 (ja) * | 1997-06-23 | 2004-04-19 | シャープ株式会社 | 多結晶半導体インゴットの製造方法および装置 |
| DE60140507D1 (de) * | 2000-03-03 | 2009-12-31 | Shinetsu Handotai Kk | Schmelzenauffangschale in einem apparat zum herausziehen von einkristallen |
| FR2808809B1 (fr) | 2000-05-11 | 2003-06-27 | Emix | Installation de fabrication en continu de barreau de silicium multicristallin |
| JP3698080B2 (ja) * | 2001-09-11 | 2005-09-21 | 三菱住友シリコン株式会社 | 単結晶引上げ方法 |
| WO2003066523A1 (fr) | 2002-02-04 | 2003-08-14 | Sharp Kabushiki Kaisha | Procede de purification du silicium, scories pour purifier le silicium et silicium purifie |
| US20060048698A1 (en) | 2002-09-27 | 2006-03-09 | Ge Energy (Usa) Llc | Methods and systems for purifying elements |
| JP2004161575A (ja) * | 2002-11-15 | 2004-06-10 | Sumitomo Titanium Corp | 多結晶シリコンインゴット及び部材の製造方法 |
| US20050066881A1 (en) * | 2003-09-25 | 2005-03-31 | Canon Kabushiki Kaisha | Continuous production method for crystalline silicon and production apparatus for the same |
| US7635414B2 (en) * | 2003-11-03 | 2009-12-22 | Solaicx, Inc. | System for continuous growing of monocrystalline silicon |
| JP4947455B2 (ja) | 2005-08-16 | 2012-06-06 | 則近 山内 | 電子ビームを用いたシリコンの精錬方法及び装置 |
| JP4817761B2 (ja) * | 2005-08-30 | 2011-11-16 | 京セラ株式会社 | 半導体インゴット及び太陽電池素子の製造方法 |
| US8262797B1 (en) * | 2007-03-13 | 2012-09-11 | Solaicx, Inc. | Weir design providing optimal purge gas flow, melt control, and temperature stabilization for improved single crystal growth in a continuous Czochralski process |
| US7955433B2 (en) * | 2007-07-26 | 2011-06-07 | Calisolar, Inc. | Method and system for forming a silicon ingot using a low-grade silicon feedstock |
| US8475591B2 (en) * | 2008-08-15 | 2013-07-02 | Varian Semiconductor Equipment Associates, Inc. | Method of controlling a thickness of a sheet formed from a melt |
| US7998224B2 (en) * | 2008-10-21 | 2011-08-16 | Varian Semiconductor Equipment Associates, Inc. | Removal of a sheet from a production apparatus |
| US8652257B2 (en) * | 2010-02-22 | 2014-02-18 | Lev George Eidelman | Controlled gravity feeding czochralski apparatus with on the way melting raw material |
-
2007
- 2007-07-26 US US11/828,734 patent/US7955433B2/en not_active Expired - Fee Related
-
2008
- 2008-07-25 JP JP2010518420A patent/JP5462988B2/ja not_active Expired - Fee Related
- 2008-07-25 CN CN2008801096076A patent/CN102037163B/zh not_active Expired - Fee Related
- 2008-07-25 ES ES08796655T patent/ES2383928T3/es active Active
- 2008-07-25 AT AT08796655T patent/ATE548487T1/de active
- 2008-07-25 EP EP08796655A patent/EP2179078B1/de not_active Not-in-force
- 2008-07-25 WO PCT/US2008/071234 patent/WO2009015356A1/en not_active Ceased
-
2011
- 2011-02-25 US US13/034,956 patent/US8882912B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP2179078A1 (de) | 2010-04-28 |
| JP2010534614A (ja) | 2010-11-11 |
| CN102037163A (zh) | 2011-04-27 |
| EP2179078A4 (de) | 2010-08-04 |
| ES2383928T3 (es) | 2012-06-27 |
| WO2009015356A1 (en) | 2009-01-29 |
| US8882912B2 (en) | 2014-11-11 |
| JP5462988B2 (ja) | 2014-04-02 |
| CN102037163B (zh) | 2013-01-30 |
| US20110211995A1 (en) | 2011-09-01 |
| EP2179078B1 (de) | 2012-03-07 |
| US20090028773A1 (en) | 2009-01-29 |
| US7955433B2 (en) | 2011-06-07 |
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