ATE545948T1 - Glühlampe und vorrichtung zur wärmebehandlung mittels lichtbestrahlung - Google Patents

Glühlampe und vorrichtung zur wärmebehandlung mittels lichtbestrahlung

Info

Publication number
ATE545948T1
ATE545948T1 AT09010678T AT09010678T ATE545948T1 AT E545948 T1 ATE545948 T1 AT E545948T1 AT 09010678 T AT09010678 T AT 09010678T AT 09010678 T AT09010678 T AT 09010678T AT E545948 T1 ATE545948 T1 AT E545948T1
Authority
AT
Austria
Prior art keywords
light emitting
hermetically sealed
metal foils
sealed portions
emitting tube
Prior art date
Application number
AT09010678T
Other languages
English (en)
Inventor
Yoichi Mizukawa
Kenji Tanino
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Application granted granted Critical
Publication of ATE545948T1 publication Critical patent/ATE545948T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01KELECTRIC INCANDESCENT LAMPS
    • H01K1/00Details
    • H01K1/38Seals for leading-in conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01KELECTRIC INCANDESCENT LAMPS
    • H01K1/00Details
    • H01K1/40Leading-in conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01KELECTRIC INCANDESCENT LAMPS
    • H01K5/00Lamps for general lighting
    • H01K5/02Lamps for general lighting with connections made at opposite ends, e.g. tubular lamp with axially arranged filament
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01KELECTRIC INCANDESCENT LAMPS
    • H01K7/00Lamps for purposes other than general lighting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01KELECTRIC INCANDESCENT LAMPS
    • H01K9/00Lamps having two or more incandescent bodies separately heated
    • H01K9/08Lamps having two or more incandescent bodies separately heated to provide selectively different light effects, e.g. for automobile headlamp
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/0033Heating devices using lamps
    • H05B3/0038Heating devices using lamps for industrial applications
    • H05B3/0047Heating devices using lamps for industrial applications for semiconductor manufacture
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Resistance Heating (AREA)
AT09010678T 2008-08-26 2009-08-19 Glühlampe und vorrichtung zur wärmebehandlung mittels lichtbestrahlung ATE545948T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008216265A JP4821819B2 (ja) 2008-08-26 2008-08-26 フィラメントランプおよび光照射式加熱処理装置

Publications (1)

Publication Number Publication Date
ATE545948T1 true ATE545948T1 (de) 2012-03-15

Family

ID=41416244

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09010678T ATE545948T1 (de) 2008-08-26 2009-08-19 Glühlampe und vorrichtung zur wärmebehandlung mittels lichtbestrahlung

Country Status (7)

Country Link
US (1) US8145045B2 (de)
EP (1) EP2159824B1 (de)
JP (1) JP4821819B2 (de)
KR (1) KR20100024892A (de)
CN (1) CN101661868A (de)
AT (1) ATE545948T1 (de)
TW (1) TW201009901A (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5282409B2 (ja) * 2008-02-25 2013-09-04 ウシオ電機株式会社 光照射式加熱方法及び光照射式加熱装置
JP2009238552A (ja) * 2008-03-27 2009-10-15 Ushio Inc フィラメントランプ
JP5338723B2 (ja) * 2010-03-16 2013-11-13 ウシオ電機株式会社 加熱装置
FR3008019B1 (fr) * 2013-07-04 2015-07-17 Sidel Participations Module de chauffage comportant une lampe et une lentille fixee par une bride sur une partie non emissive de la lampe
WO2016126381A1 (en) * 2015-02-05 2016-08-11 Applied Materials, Inc. Rapid thermal processing chamber with linear control lamps
JP6759983B2 (ja) * 2016-11-01 2020-09-23 ウシオ電機株式会社 加熱用光源ユニット
JP2020136118A (ja) * 2019-02-21 2020-08-31 東芝ライテック株式会社 ヒータ
JP7232415B2 (ja) * 2019-07-17 2023-03-03 ウシオ電機株式会社 加熱用フィラメントランプ
US11680338B2 (en) 2019-12-19 2023-06-20 Applied Materials, Inc. Linear lamp array for improved thermal uniformity and profile control
KR20210095059A (ko) * 2020-01-21 2021-07-30 에이에스엠 아이피 홀딩 비.브이. 불균일한 열 출력의 필라멘트 램프를 갖는 반도체 처리 챔버
CN114126101B (zh) * 2021-11-02 2024-01-26 Tcl华星光电技术有限公司 石英红外加热装置及其对基板加热的方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE544825A (de) * 1953-08-24
US3483609A (en) * 1967-10-31 1969-12-16 Gen Electric Incandescent lamp manufacture
GB8308103D0 (en) * 1983-03-24 1983-05-05 Emi Plc Thorn Quartz infra-red lamps
CN1005176B (zh) * 1985-04-09 1989-09-13 菲利普白炽灯有限公司 电灯
US4710676A (en) * 1985-08-15 1987-12-01 Gte Products Corporation Multi-level fuser lamp
JPS63263719A (ja) * 1987-04-21 1988-10-31 エイジー プロセッシング テクノロジーズ インコーポレーテッド 半導体ウエ−ハの熱処理用加熱装置
US5008592A (en) * 1988-11-15 1991-04-16 U.S. Philips Corporation Halogen incandescent lamp and method of manufacturing a halogen incandescent lamp
GB8926139D0 (en) * 1989-11-18 1990-01-10 Emi Plc Thorn Tungsten halogen lamp
US6399955B1 (en) * 1999-02-19 2002-06-04 Mark G. Fannon Selective electromagnetic wavelength conversion device
JP3837255B2 (ja) * 1999-04-16 2006-10-25 松下電器産業株式会社 赤外線電球
JP3873635B2 (ja) * 2001-03-02 2007-01-24 ウシオ電機株式会社 加熱ローラ用ヒータランプ装置
JP2005032552A (ja) * 2003-07-14 2005-02-03 Ushio Inc 熱源用ヒータランプ
JP2006279008A (ja) * 2005-03-02 2006-10-12 Ushio Inc ヒータ及びヒータを備えた加熱装置
JP4692249B2 (ja) * 2005-11-30 2011-06-01 ウシオ電機株式会社 フィラメントランプ
JP2008108504A (ja) * 2006-10-24 2008-05-08 Harison Toshiba Lighting Corp 管型白熱電球、管型白熱電球の製造方法、加熱装置
KR20080081250A (ko) 2005-12-22 2008-09-09 하리슨 도시바 라이팅 가부시키가이샤 히터 램프
DE102006024238A1 (de) * 2006-05-23 2007-11-29 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Hochdruckentladungslampe
JP4935417B2 (ja) * 2007-02-26 2012-05-23 ウシオ電機株式会社 光照射式加熱処理装置
JP4893474B2 (ja) * 2007-05-29 2012-03-07 ウシオ電機株式会社 フィラメントランプおよび光照射式加熱処理装置

Also Published As

Publication number Publication date
US8145045B2 (en) 2012-03-27
EP2159824B1 (de) 2012-02-15
US20100054719A1 (en) 2010-03-04
TW201009901A (en) 2010-03-01
KR20100024892A (ko) 2010-03-08
JP2010055763A (ja) 2010-03-11
CN101661868A (zh) 2010-03-03
JP4821819B2 (ja) 2011-11-24
EP2159824A3 (de) 2010-12-01
EP2159824A2 (de) 2010-03-03

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