ATE540136T1 - Verfahren und vorrichtung zur registrierung von diffraktiven optischen strukturen - Google Patents

Verfahren und vorrichtung zur registrierung von diffraktiven optischen strukturen

Info

Publication number
ATE540136T1
ATE540136T1 AT07704761T AT07704761T ATE540136T1 AT E540136 T1 ATE540136 T1 AT E540136T1 AT 07704761 T AT07704761 T AT 07704761T AT 07704761 T AT07704761 T AT 07704761T AT E540136 T1 ATE540136 T1 AT E540136T1
Authority
AT
Austria
Prior art keywords
diffractive optical
substrate
optical structures
deposited
registration
Prior art date
Application number
AT07704761T
Other languages
English (en)
Inventor
Leal Juan Gonzalez
Original Assignee
Univ Cadiz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Cadiz filed Critical Univ Cadiz
Application granted granted Critical
Publication of ATE540136T1 publication Critical patent/ATE540136T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
AT07704761T 2006-02-24 2007-01-31 Verfahren und vorrichtung zur registrierung von diffraktiven optischen strukturen ATE540136T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ES200600446A ES2325894B1 (es) 2006-02-24 2006-02-24 Metodo y aparato para la fabricacion de elementos opticos difractivos.
PCT/ES2007/000052 WO2007096440A1 (es) 2006-02-24 2007-01-31 Método y aparato para el registro de estructuras ópticas difractivas

Publications (1)

Publication Number Publication Date
ATE540136T1 true ATE540136T1 (de) 2012-01-15

Family

ID=38436967

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07704761T ATE540136T1 (de) 2006-02-24 2007-01-31 Verfahren und vorrichtung zur registrierung von diffraktiven optischen strukturen

Country Status (5)

Country Link
US (1) US20090087581A1 (de)
EP (1) EP1990441B1 (de)
AT (1) ATE540136T1 (de)
ES (2) ES2325894B1 (de)
WO (1) WO2007096440A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4320284A1 (de) * 2021-07-28 2024-02-14 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Vorrichtung für ein thermisches verdampfungssystem und verfahren zum beschichten eines beschichtungsbereichs auf einer vorderseite eines substrats
EP4323561A1 (de) * 2021-07-28 2024-02-21 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren zum beschichten eines beschichtungsbereichs auf einer vorderseite eines substrats und vorrichtung für ein thermisches verdampfungssystem

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4701592A (en) * 1980-11-17 1987-10-20 Rockwell International Corporation Laser assisted deposition and annealing
FR2576147B1 (fr) * 1985-01-17 1987-11-27 Flicstein Jean Procede de depot et de cristallisation d'une couche mince de materiau organique au moyen d'un faisceau d'energie
JP3080096B2 (ja) * 1990-06-13 2000-08-21 住友電気工業株式会社 大面積薄膜の作製方法
US5173441A (en) * 1991-02-08 1992-12-22 Micron Technology, Inc. Laser ablation deposition process for semiconductor manufacture
JP3255469B2 (ja) * 1992-11-30 2002-02-12 三菱電機株式会社 レーザ薄膜形成装置
GB2300001B (en) * 1992-11-30 1997-05-28 Mitsubishi Electric Corp Thin film forming apparatus using laser
JPH0870144A (ja) * 1994-08-26 1996-03-12 Sumitomo Electric Ind Ltd 超電導部品の作製方法
US6291797B1 (en) 1996-08-13 2001-09-18 Nippon Sheet Glass Co., Ltd. Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device
JP3270814B2 (ja) 1996-08-27 2002-04-02 日本板硝子株式会社 回折型光学素子の製造方法
CZ286152B6 (cs) * 1998-03-13 2000-01-12 Miroslav Ing. Csc. Vlček Transparentní a semitransparentní difrakční prvky
AU2514800A (en) * 1999-01-27 2000-08-18 United States Of America As Represented By The Secretary Of The Navy, The Matrix assisted pulsed laser evaporation direct write
US6649861B2 (en) * 2000-05-24 2003-11-18 Potomac Photonics, Inc. Method and apparatus for fabrication of miniature structures
US6869479B2 (en) * 2002-03-29 2005-03-22 Altair Center, Llc Method of laser-assisted fabrication of optoelectronic and photonic components

Also Published As

Publication number Publication date
ES2325894B1 (es) 2010-10-28
ES2380126T3 (es) 2012-05-08
EP1990441A4 (de) 2010-06-02
US20090087581A1 (en) 2009-04-02
ES2325894A1 (es) 2009-09-23
WO2007096440A1 (es) 2007-08-30
EP1990441B1 (de) 2012-01-04
EP1990441A1 (de) 2008-11-12

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