ATE540136T1 - Verfahren und vorrichtung zur registrierung von diffraktiven optischen strukturen - Google Patents
Verfahren und vorrichtung zur registrierung von diffraktiven optischen strukturenInfo
- Publication number
- ATE540136T1 ATE540136T1 AT07704761T AT07704761T ATE540136T1 AT E540136 T1 ATE540136 T1 AT E540136T1 AT 07704761 T AT07704761 T AT 07704761T AT 07704761 T AT07704761 T AT 07704761T AT E540136 T1 ATE540136 T1 AT E540136T1
- Authority
- AT
- Austria
- Prior art keywords
- diffractive optical
- substrate
- optical structures
- deposited
- registration
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Toxicology (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES200600446A ES2325894B1 (es) | 2006-02-24 | 2006-02-24 | Metodo y aparato para la fabricacion de elementos opticos difractivos. |
PCT/ES2007/000052 WO2007096440A1 (es) | 2006-02-24 | 2007-01-31 | Método y aparato para el registro de estructuras ópticas difractivas |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE540136T1 true ATE540136T1 (de) | 2012-01-15 |
Family
ID=38436967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT07704761T ATE540136T1 (de) | 2006-02-24 | 2007-01-31 | Verfahren und vorrichtung zur registrierung von diffraktiven optischen strukturen |
Country Status (5)
Country | Link |
---|---|
US (1) | US20090087581A1 (de) |
EP (1) | EP1990441B1 (de) |
AT (1) | ATE540136T1 (de) |
ES (2) | ES2325894B1 (de) |
WO (1) | WO2007096440A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023006197A1 (en) * | 2021-07-28 | 2023-02-02 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Method of coating a coating region on a front surface of a substrate and apparatus for a thermal evaporation system |
WO2023006198A1 (en) * | 2021-07-28 | 2023-02-02 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Apparatus for a thermal evaporation system and method of coating a coating region on a front surface of a substrate |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4701592A (en) * | 1980-11-17 | 1987-10-20 | Rockwell International Corporation | Laser assisted deposition and annealing |
FR2576147B1 (fr) * | 1985-01-17 | 1987-11-27 | Flicstein Jean | Procede de depot et de cristallisation d'une couche mince de materiau organique au moyen d'un faisceau d'energie |
JP3080096B2 (ja) * | 1990-06-13 | 2000-08-21 | 住友電気工業株式会社 | 大面積薄膜の作製方法 |
US5173441A (en) * | 1991-02-08 | 1992-12-22 | Micron Technology, Inc. | Laser ablation deposition process for semiconductor manufacture |
GB2300000A (en) * | 1992-11-30 | 1996-10-23 | Mitsubishi Electric Corp | Thin film forming using laser and activated oxidising gas |
JP3255469B2 (ja) * | 1992-11-30 | 2002-02-12 | 三菱電機株式会社 | レーザ薄膜形成装置 |
JPH0870144A (ja) * | 1994-08-26 | 1996-03-12 | Sumitomo Electric Ind Ltd | 超電導部品の作製方法 |
EP0959051A4 (en) * | 1996-08-13 | 1999-12-15 | Nippon Sheet Glass Co Ltd | Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device |
JP3270814B2 (ja) * | 1996-08-27 | 2002-04-02 | 日本板硝子株式会社 | 回折型光学素子の製造方法 |
CZ286152B6 (cs) * | 1998-03-13 | 2000-01-12 | Miroslav Ing. Csc. Vlček | Transparentní a semitransparentní difrakční prvky |
AU2514800A (en) * | 1999-01-27 | 2000-08-18 | United States Of America As Represented By The Secretary Of The Navy, The | Matrix assisted pulsed laser evaporation direct write |
US6649861B2 (en) | 2000-05-24 | 2003-11-18 | Potomac Photonics, Inc. | Method and apparatus for fabrication of miniature structures |
US6869479B2 (en) * | 2002-03-29 | 2005-03-22 | Altair Center, Llc | Method of laser-assisted fabrication of optoelectronic and photonic components |
-
2006
- 2006-02-24 ES ES200600446A patent/ES2325894B1/es active Active
-
2007
- 2007-01-31 US US12/280,319 patent/US20090087581A1/en not_active Abandoned
- 2007-01-31 WO PCT/ES2007/000052 patent/WO2007096440A1/es active Application Filing
- 2007-01-31 ES ES07704761T patent/ES2380126T3/es active Active
- 2007-01-31 EP EP07704761A patent/EP1990441B1/de not_active Not-in-force
- 2007-01-31 AT AT07704761T patent/ATE540136T1/de active
Also Published As
Publication number | Publication date |
---|---|
ES2380126T3 (es) | 2012-05-08 |
ES2325894B1 (es) | 2010-10-28 |
EP1990441B1 (de) | 2012-01-04 |
WO2007096440A1 (es) | 2007-08-30 |
EP1990441A1 (de) | 2008-11-12 |
US20090087581A1 (en) | 2009-04-02 |
EP1990441A4 (de) | 2010-06-02 |
ES2325894A1 (es) | 2009-09-23 |
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