ATE539179T1 - Gerät zur schutzgasabschirmung - Google Patents

Gerät zur schutzgasabschirmung

Info

Publication number
ATE539179T1
ATE539179T1 AT00936074T AT00936074T ATE539179T1 AT E539179 T1 ATE539179 T1 AT E539179T1 AT 00936074 T AT00936074 T AT 00936074T AT 00936074 T AT00936074 T AT 00936074T AT E539179 T1 ATE539179 T1 AT E539179T1
Authority
AT
Austria
Prior art keywords
plenum
back wall
gas
protective gas
conduit
Prior art date
Application number
AT00936074T
Other languages
English (en)
Inventor
D Stoddard
Soon Yuh
Original Assignee
Aviza Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aviza Tech Inc filed Critical Aviza Tech Inc
Application granted granted Critical
Publication of ATE539179T1 publication Critical patent/ATE539179T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519—Inert gas curtains
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
AT00936074T 1999-05-21 2000-05-19 Gerät zur schutzgasabschirmung ATE539179T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13536299P 1999-05-21 1999-05-21
PCT/US2000/013754 WO2000071778A1 (en) 1999-05-21 2000-05-19 Protective gas shield apparatus

Publications (1)

Publication Number Publication Date
ATE539179T1 true ATE539179T1 (de) 2012-01-15

Family

ID=22467764

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00936074T ATE539179T1 (de) 1999-05-21 2000-05-19 Gerät zur schutzgasabschirmung

Country Status (9)

Country Link
US (1) US6576060B1 (de)
EP (1) EP1212475B1 (de)
JP (1) JP4913947B2 (de)
KR (1) KR20020008193A (de)
CN (1) CN1175125C (de)
AT (1) ATE539179T1 (de)
AU (1) AU5144100A (de)
TW (1) TW530097B (de)
WO (1) WO2000071778A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002024985A1 (de) * 2000-09-22 2002-03-28 Aixtron Ag Gaseinlassorgan für cvd-verfahren und vorrichtung
KR20030038396A (ko) * 2001-11-01 2003-05-16 에이에스엠엘 유에스, 인코포레이티드 우선적인 화학 기상 증착 장치 및 방법
US9150986B2 (en) 2011-05-04 2015-10-06 Nike, Inc. Knit component bonding

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4834020A (en) 1987-12-04 1989-05-30 Watkins-Johnson Company Atmospheric pressure chemical vapor deposition apparatus
DE3918256A1 (de) 1989-06-05 1990-12-06 Standard Elektrik Lorenz Ag Vorrichtung zur abscheidung von dielektrischen schichten
US5393563A (en) 1991-10-29 1995-02-28 Ellis, Jr.; Frank B. Formation of tin oxide films on glass substrates
TW359943B (en) 1994-07-18 1999-06-01 Silicon Valley Group Thermal Single body injector and method for delivering gases to a surface
US6022414A (en) 1994-07-18 2000-02-08 Semiconductor Equipment Group, Llc Single body injector and method for delivering gases to a surface
US5944900A (en) 1997-02-13 1999-08-31 Watkins Johnson Company Protective gas shield for chemical vapor deposition apparatus
US6056824A (en) 1998-01-16 2000-05-02 Silicon Valley Group Thermal Systems Free floating shield and semiconductor processing system
US5849088A (en) * 1998-01-16 1998-12-15 Watkins-Johnson Company Free floating shield
US6352592B1 (en) * 1998-01-16 2002-03-05 Silicon Valley Group, Thermal Systems Llc Free floating shield and semiconductor processing system
US6220286B1 (en) * 1999-01-29 2001-04-24 Michael L. Davenport Gas blanket distributor

Also Published As

Publication number Publication date
JP2003500535A (ja) 2003-01-07
EP1212475A4 (de) 2007-12-26
EP1212475B1 (de) 2011-12-28
CN1351675A (zh) 2002-05-29
WO2000071778A1 (en) 2000-11-30
JP4913947B2 (ja) 2012-04-11
KR20020008193A (ko) 2002-01-29
EP1212475A1 (de) 2002-06-12
AU5144100A (en) 2000-12-12
CN1175125C (zh) 2004-11-10
TW530097B (en) 2003-05-01
US6576060B1 (en) 2003-06-10

Similar Documents

Publication Publication Date Title
DE69630484D1 (de) Reaktivgasinjektor für Vorrichtung zur chemischen Gasphasenabscheidung
DE69925043D1 (de) Verbesserungen zur verlegung von unterwasserrohren
ID18522A (id) Susunan pipa pengiriman gas
DE69531935D1 (de) Gaserzeugender treibstoff
DE50005528D1 (de) Vorrichtung für gasbrenner
ATE284798T1 (de) Einrichtung zur durchführung von elektrischen leitungen durch die wandung eines kraftstoffbehälters
IT1310113B1 (it) Condotto di fluido per combustibili e vapori di combustibili.
ATE539179T1 (de) Gerät zur schutzgasabschirmung
DE69839773D1 (de) Vorrichtung zur anregung eines gases durch oberflächenwellenplasma
ITTO990757A0 (it) Serbatoio del carburante per un motoveicolo a dure ruote
DE59603087D1 (de) Vorrichtung zur abdichtung zwischen beweglichen anlagenteilen
RU95101574A (ru) Глушитель, в частности, глушитель шума отработавших газов для независимого от двигателя устройства отопления транспортного средства и способ изготовления глушителя
KR950023949U (ko) 가스 노즐 일체형 수직 저압 화학 기상 증착장치
KR950028276U (ko) 화학기상증착용 가스 인젝터
KR950028275U (ko) 화학기상증착용 가스 인젝터
DE59400257D1 (de) Vorrichtung zum Aufhängen einer liegenden Rohrleitung an einer Wand
DE29501327U1 (de) Vogelschutzhauben für Edelstahl-Schornsteinrohre
KR960032095U (ko) 가스오븐렌지의 수증기제거장치
DE29612467U1 (de) Vorrichtung zum Schutz des Mantels eines Kabels
KR940022676U (ko) 저압화학 기상증착 반응로 배기계의 가스부산물 트랩장치
KR950025412U (ko) 가스계량기 설치용 분배관
DE29707622U1 (de) Vorrichtung zum Schutz des Mantels eines Kabels
DE29601598U1 (de) Vorrichtung für den Schutz einer Rohrabzweigung
IT238746Y1 (it) Cassa di contenimento per serbatoi di gas combustibile
IDP000029660A (id) SISTEM REAKTOR TUNGGAL PECVD (PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION) UNTUK PENUMBUHAN LAPISAN TIPIS MATERIAL SILIKON AMORF (a-Si)