DE69839773D1 - Vorrichtung zur anregung eines gases durch oberflächenwellenplasma - Google Patents

Vorrichtung zur anregung eines gases durch oberflächenwellenplasma

Info

Publication number
DE69839773D1
DE69839773D1 DE69839773T DE69839773T DE69839773D1 DE 69839773 D1 DE69839773 D1 DE 69839773D1 DE 69839773 T DE69839773 T DE 69839773T DE 69839773 T DE69839773 T DE 69839773T DE 69839773 D1 DE69839773 D1 DE 69839773D1
Authority
DE
Germany
Prior art keywords
holding
gas
surface wave
wave plasma
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69839773T
Other languages
English (en)
Inventor
Michel Moisan
Zenon Zakrzewski
Roxane Etemadi
Jean-Christophe Rostaing
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Application granted granted Critical
Publication of DE69839773D1 publication Critical patent/DE69839773D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69839773T 1997-07-16 1998-07-07 Vorrichtung zur anregung eines gases durch oberflächenwellenplasma Expired - Lifetime DE69839773D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9709025A FR2766321B1 (fr) 1997-07-16 1997-07-16 Dispositif d'excitation d'un gaz par plasma d'onde de surface
PCT/FR1998/001453 WO1999004608A1 (fr) 1997-07-16 1998-07-07 Dispositif d'excitation d'un gaz par plasma d'onde de surface

Publications (1)

Publication Number Publication Date
DE69839773D1 true DE69839773D1 (de) 2008-09-04

Family

ID=9509278

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69839773T Expired - Lifetime DE69839773D1 (de) 1997-07-16 1998-07-07 Vorrichtung zur anregung eines gases durch oberflächenwellenplasma

Country Status (9)

Country Link
US (1) US6298806B1 (de)
EP (1) EP0995345B1 (de)
JP (1) JP4619530B2 (de)
KR (1) KR20010021935A (de)
AU (1) AU8544798A (de)
DE (1) DE69839773D1 (de)
FR (1) FR2766321B1 (de)
TW (1) TW384628B (de)
WO (1) WO1999004608A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7696404B2 (en) 1996-08-19 2010-04-13 Advanced Cell Technology, Inc. Embryonic or stem-like cell lines produced by cross species nuclear transplantation and methods for enhancing embryonic development by genetic alteration of donor cells or by tissue culture conditions
FR2815888B1 (fr) * 2000-10-27 2003-05-30 Air Liquide Dispositif de traitement de gaz par plasma
US20060027539A1 (en) * 2003-05-02 2006-02-09 Czeslaw Golkowski Non-thermal plasma generator device
US20040216845A1 (en) * 2003-05-02 2004-11-04 Czeslaw Golkowski Non-thermal plasma generator device
GB0516695D0 (en) * 2005-08-15 2005-09-21 Boc Group Plc Microwave plasma reactor
WO2010129901A2 (en) 2009-05-08 2010-11-11 Vandermeulen Peter F Methods and systems for plasma deposition and treatment
DE102010043940B4 (de) * 2010-11-15 2012-08-30 Forschungsverbund Berlin E.V. Mikrowellen-ICP-Resonator
US9397380B2 (en) * 2011-01-28 2016-07-19 Applied Materials, Inc. Guided wave applicator with non-gaseous dielectric for plasma chamber
RU2468544C1 (ru) * 2011-03-21 2012-11-27 Общество с ограниченной ответственностью "Фиберус" Устройство для возбуждения и поддержания свч-разрядов в плазмохимических реакторах
WO2012158443A2 (en) 2011-05-13 2012-11-22 Sheperak Thomas J Plasma directed electron beam wound care system apparatus and method
RU2474094C1 (ru) * 2011-06-23 2013-01-27 Государственное образовательное учреждение высшего профессионального образования "Казанский государственный технологический университет" Устройство для получения высокочастотного емкостного газового разряда
JP6635575B2 (ja) * 2014-04-25 2020-01-29 日鉄ケミカル＆マテリアル株式会社 安定性の良いフェノール化合物及びその製造方法
US10861667B2 (en) 2017-06-27 2020-12-08 Peter F. Vandermeulen Methods and systems for plasma deposition and treatment
US10490386B2 (en) 2017-06-27 2019-11-26 Peter F. Vandermeulen Methods and systems for plasma deposition and treatment

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50146551A (de) * 1974-05-16 1975-11-25
JPS5939178B2 (ja) * 1977-04-25 1984-09-21 株式会社東芝 活性化ガス発生装置
JPS54118081U (de) * 1978-02-07 1979-08-18
FR2533397A2 (fr) * 1982-09-16 1984-03-23 Anvar Perfectionnements aux torches a plasma
JPS6161029U (de) * 1984-09-26 1986-04-24
US4988644A (en) * 1989-05-23 1991-01-29 Texas Instruments Incorporated Method for etching semiconductor materials using a remote plasma generator
JPH03193880A (ja) * 1989-08-03 1991-08-23 Mikakutou Seimitsu Kogaku Kenkyusho:Kk 高圧力下でのマイクロ波プラズマｃｖｄによる高速成膜方法及びその装置
JPH0441675A (ja) * 1990-06-07 1992-02-12 Matsushita Electric Ind Co Ltd マイクロ波プラズマ装置
US5262610A (en) * 1991-03-29 1993-11-16 The United States Of America As Represented By The Air Force Low particulate reliability enhanced remote microwave plasma discharge device
FR2677841B1 (fr) * 1991-06-12 1997-01-10 Air Liquide Reacteur pour depot plasma en phase gazeuse de composes inorganiques sur un substrat polymere.
JP3212172B2 (ja) * 1993-01-29 2001-09-25 アネルバ株式会社 プラズマ処理装置
JPH0722500U (ja) * 1993-09-28 1995-04-21 新日本無線株式会社 マイクロ波プラズマｃｖｄ装置
JP2942138B2 (ja) * 1994-03-22 1999-08-30 三菱電機株式会社 プラズマ処理装置及びプラズマ処理方法
FR2733384B1 (fr) * 1995-04-21 1997-07-04 Univ Lille Sciences Tech Dispositif pour creer deux ou plusieurs decharges plasma dans un meme tube guide d'onde
JPH08315998A (ja) * 1995-05-23 1996-11-29 Hitachi Ltd マイクロ波プラズマ処理装置
US5702530A (en) * 1995-06-23 1997-12-30 Applied Materials, Inc. Distributed microwave plasma reactor for semiconductor processing
JPH09270421A (ja) * 1996-04-01 1997-10-14 Mitsubishi Electric Corp 表面処理装置および表面処理方法
JPH09134797A (ja) * 1996-09-13 1997-05-20 Hitachi Ltd マイクロ波プラズマ処理装置

Also Published As

Publication number Publication date
EP0995345B1 (de) 2008-07-23
US6298806B1 (en) 2001-10-09
TW384628B (en) 2000-03-11
AU8544798A (en) 1999-02-10
JP2001510939A (ja) 2001-08-07
FR2766321A1 (fr) 1999-01-22
JP4619530B2 (ja) 2011-01-26
EP0995345A1 (de) 2000-04-26
KR20010021935A (ko) 2001-03-15
WO1999004608A1 (fr) 1999-01-28
FR2766321B1 (fr) 1999-09-03

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