ATE521614T1 - Verfahren zur herstellung von trimethylsilylazid - Google Patents

Verfahren zur herstellung von trimethylsilylazid

Info

Publication number
ATE521614T1
ATE521614T1 AT05727472T AT05727472T ATE521614T1 AT E521614 T1 ATE521614 T1 AT E521614T1 AT 05727472 T AT05727472 T AT 05727472T AT 05727472 T AT05727472 T AT 05727472T AT E521614 T1 ATE521614 T1 AT E521614T1
Authority
AT
Austria
Prior art keywords
formula
producing
represented
trimethylsilylazide
trimethylsilyl
Prior art date
Application number
AT05727472T
Other languages
English (en)
Inventor
Toru Kofukuda
Shigeto Nakazawa
Original Assignee
Toyo Boseki
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Boseki filed Critical Toyo Boseki
Application granted granted Critical
Publication of ATE521614T1 publication Critical patent/ATE521614T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
AT05727472T 2004-09-30 2005-03-25 Verfahren zur herstellung von trimethylsilylazid ATE521614T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004317169 2004-09-30
PCT/JP2005/006449 WO2006038329A1 (ja) 2004-09-30 2005-03-25 トリメチルシリルアジドの製造方法

Publications (1)

Publication Number Publication Date
ATE521614T1 true ATE521614T1 (de) 2011-09-15

Family

ID=36142417

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05727472T ATE521614T1 (de) 2004-09-30 2005-03-25 Verfahren zur herstellung von trimethylsilylazid

Country Status (8)

Country Link
US (1) US7781603B2 (de)
EP (1) EP1795533B1 (de)
JP (1) JPWO2006038329A1 (de)
KR (1) KR101152249B1 (de)
CN (1) CN101031576B (de)
AT (1) ATE521614T1 (de)
ES (1) ES2367803T3 (de)
WO (1) WO2006038329A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5233127B2 (ja) * 2007-02-06 2013-07-10 セントラル硝子株式会社 低誘電率膜の改質剤及び製造方法
CN101515737B (zh) * 2008-02-20 2010-10-06 中国科学院工程热物理研究所 应用三甲基叠氮硅烷为发电机定子蒸发冷却介质的方法
JP5870713B2 (ja) * 2011-10-31 2016-03-01 東洋紡株式会社 トリメチルシリルアジドの製造における溶媒の回収方法
CN108864169A (zh) * 2018-06-09 2018-11-23 河北晟凯新材料科技有限公司 一种提高异氰酸酯基丙基三乙氧基硅烷收率的方法
CN109305984B (zh) * 2018-10-12 2021-06-15 凯莱英医药集团（天津）股份有限公司 三甲基硅基叠氮的连续化合成方法
WO2023233371A1 (en) * 2022-06-03 2023-12-07 Indian Institute of Science Education and Research, Pune (IISER Pune) A continuous flow process for synthesis of organic azides

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6023386A (ja) * 1983-07-18 1985-02-05 Chisso Corp トリアルキルシリルメチルアジド及びその製法
JPS6323386A (ja) 1987-07-02 1988-01-30 Fujitsu Ltd 半導体レ−ザ装置の組立方法
JP2654516B2 (ja) 1987-12-01 1997-09-17 日本特殊化学工業株式会社 ケイ素アジド化合物の製造方法
JP2766135B2 (ja) * 1992-08-12 1998-06-18 信越化学工業株式会社 ナトリウムビストリメチルシリルアミド溶液の製造方法
JP3671281B2 (ja) * 1996-08-07 2005-07-13 東洋化成工業株式会社 トリメチルシリルアジドの製造方法

Also Published As

Publication number Publication date
US20080058540A1 (en) 2008-03-06
US7781603B2 (en) 2010-08-24
ES2367803T3 (es) 2011-11-08
KR20070061548A (ko) 2007-06-13
CN101031576B (zh) 2010-10-13
JPWO2006038329A1 (ja) 2008-05-15
EP1795533A4 (de) 2009-10-21
EP1795533A1 (de) 2007-06-13
CN101031576A (zh) 2007-09-05
EP1795533B1 (de) 2011-08-24
WO2006038329A1 (ja) 2006-04-13
KR101152249B1 (ko) 2012-06-08

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