ATE512186T1 - Fluorhaltiges acrylat - Google Patents

Fluorhaltiges acrylat

Info

Publication number
ATE512186T1
ATE512186T1 AT09178350T AT09178350T ATE512186T1 AT E512186 T1 ATE512186 T1 AT E512186T1 AT 09178350 T AT09178350 T AT 09178350T AT 09178350 T AT09178350 T AT 09178350T AT E512186 T1 ATE512186 T1 AT E512186T1
Authority
AT
Austria
Prior art keywords
group
integer
following formula
represented
fluorine
Prior art date
Application number
AT09178350T
Other languages
English (en)
Inventor
Yasunori Sakano
Noriyuki Koike
Hirofumi Kishita
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Application granted granted Critical
Publication of ATE512186T1 publication Critical patent/ATE512186T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/045—Polysiloxanes containing less than 25 silicon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/61—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/388—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)
  • Polyethers (AREA)
AT09178350T 2008-12-11 2009-12-08 Fluorhaltiges acrylat ATE512186T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008316050A JP4709272B2 (ja) 2008-12-11 2008-12-11 含フッ素アクリレート

Publications (1)

Publication Number Publication Date
ATE512186T1 true ATE512186T1 (de) 2011-06-15

Family

ID=41664710

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09178350T ATE512186T1 (de) 2008-12-11 2009-12-08 Fluorhaltiges acrylat

Country Status (4)

Country Link
US (1) US7781604B2 (de)
EP (1) EP2196488B1 (de)
JP (1) JP4709272B2 (de)
AT (1) ATE512186T1 (de)

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JP4709271B2 (ja) * 2008-07-29 2011-06-22 信越化学工業株式会社 含フッ素アクリレート
JP5477160B2 (ja) * 2010-05-20 2014-04-23 信越化学工業株式会社 含フッ素（メタ）アクリル変性有機ケイ素化合物及びこれを含む硬化性組成物
JP5234057B2 (ja) * 2010-06-28 2013-07-10 信越化学工業株式会社 パーフルオロポリエーテル基含有ポリエーテル変性ポリシロキサン及びその製造方法
JP2012047861A (ja) * 2010-08-25 2012-03-08 Konica Minolta Opto Inc フィルムミラー、その製造方法、及び太陽光集光用フィルムミラー
JP5234065B2 (ja) * 2010-08-25 2013-07-10 信越化学工業株式会社 機能性添加剤並びに消泡剤及びレベリング剤
JP5691713B2 (ja) * 2011-03-23 2015-04-01 信越化学工業株式会社 防汚性付与剤及び防汚性が付与されたハードコート材料
JP2013006819A (ja) * 2011-05-26 2013-01-10 Shin-Etsu Chemical Co Ltd 含フッ素有機ケイ素化合物及びその製造方法並びに防汚性付与剤及びハードコート材料
JP6206188B2 (ja) * 2012-01-31 2017-10-04 旭硝子株式会社 指紋付着防止剤組成物、指紋付着防止剤の製造方法、ハードコート用組成物、ハードコート層を有する基材およびタッチパネル
JP5835069B2 (ja) * 2012-04-05 2015-12-24 信越化学工業株式会社 防汚性付与ハードコート組成物
WO2013168589A1 (ja) * 2012-05-11 2013-11-14 ダイキン工業株式会社 光学部材用表面処理剤および光学部材
JP6111843B2 (ja) 2013-05-14 2017-04-12 信越化学工業株式会社 硬化性組成物及びその硬化皮膜を有する物品
JP6402643B2 (ja) * 2014-03-31 2018-10-10 信越化学工業株式会社 含フッ素アクリル化合物及びその製造方法並びに硬化性組成物、基材
JP6276211B2 (ja) * 2014-05-30 2018-02-07 リケンテクノス株式会社 透明樹脂積層体
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JP6153977B2 (ja) 2014-10-02 2017-06-28 リケンテクノス株式会社 粘着フィルム
US20180009959A1 (en) * 2014-12-05 2018-01-11 Riken Technos Corporation Hard coat laminate film
WO2016147776A1 (ja) 2015-03-18 2016-09-22 リケンテクノス株式会社 ハードコート積層フィルム
KR101970093B1 (ko) 2015-03-18 2019-04-17 리껭테크노스 가부시키가이샤 방현성 하드 코트 적층 필름
US11433651B2 (en) 2015-03-18 2022-09-06 Riken Technos Corporation Hard coat laminated film
CN107428143B (zh) 2015-03-18 2019-09-20 理研科技株式会社 硬涂层层叠膜
CN107405897B (zh) * 2015-03-18 2020-08-07 理研科技株式会社 粘合膜
CN106232344B (zh) 2015-03-18 2018-09-18 理研科技株式会社 硬涂层层合膜及其生产方法
JP6435975B2 (ja) * 2015-04-17 2018-12-12 ダイキン工業株式会社 表面処理剤
JP6402697B2 (ja) 2015-09-17 2018-10-10 信越化学工業株式会社 含フッ素硬化性組成物及び物品
TWI745316B (zh) 2015-11-25 2021-11-11 日商理研科技股份有限公司 門體
US11774166B2 (en) 2015-11-25 2023-10-03 Riken Technos Corporation Door body
JP6644534B2 (ja) 2015-12-08 2020-02-12 リケンテクノス株式会社 ハードコート積層フィルム
EP3184560A1 (de) * 2015-12-22 2017-06-28 Solvay SA Lichthärtbares copolymer, lichthärtbare harzzusammensetzung damit und daraus hergestellter fingerabdruckfester film
JP6497350B2 (ja) 2016-04-15 2019-04-10 信越化学工業株式会社 含フッ素アクリル組成物及びその製造方法、含フッ素活性エネルギー線硬化性組成物並びに物品
EP3808800B1 (de) 2016-09-14 2022-01-05 Riken Technos Corporation Mit hartbeschichtung laminierte folie
JP6658449B2 (ja) 2016-10-25 2020-03-04 信越化学工業株式会社 含フッ素アクリル化合物及びその製造方法並びに硬化性組成物及び物品
JP7064313B2 (ja) 2016-11-25 2022-05-10 リケンテクノス株式会社 ハードコート積層フィルム
JP6891952B2 (ja) * 2017-05-23 2021-06-18 信越化学工業株式会社 含フッ素コーティング剤組成物及び該組成物を含有する表面処理剤並びに物品
US10544260B2 (en) 2017-08-30 2020-01-28 Ppg Industries Ohio, Inc. Fluoropolymers, methods of preparing fluoropolymers, and coating compositions containing fluoropolymers
JP6954380B2 (ja) 2018-01-19 2021-10-27 信越化学工業株式会社 含フッ素活性エネルギー線硬化性組成物及び物品
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KR20240008919A (ko) 2021-05-18 2024-01-19 신에쓰 가가꾸 고교 가부시끼가이샤 함불소 아크릴 조성물, 함불소 활성 에너지선 경화성 조성물 및 물품
WO2023063037A1 (ja) * 2021-10-15 2023-04-20 信越化学工業株式会社 パーフルオロポリエーテルブロックと（メタ）アクリロイル基とを有するオルガノポリシロキサン、及びその製造方法
CN115109464B (zh) * 2022-07-06 2023-07-14 杭州福斯特应用材料股份有限公司 墨水组合物、封装结构和半导体器件
JP7786325B2 (ja) 2022-09-12 2025-12-16 信越化学工業株式会社 光硬化性コーティング組成物および被覆物品
CN119948081A (zh) 2022-10-07 2025-05-06 信越化学工业株式会社 含有氟聚醚基的丙烯酸系化合物、活性能量射线固化性组合物、该固化性组合物的固化覆膜以及物品

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JP4709271B2 (ja) * 2008-07-29 2011-06-22 信越化学工業株式会社 含フッ素アクリレート

Also Published As

Publication number Publication date
JP2010138112A (ja) 2010-06-24
US20100147191A1 (en) 2010-06-17
JP4709272B2 (ja) 2011-06-22
EP2196488B1 (de) 2011-06-08
US7781604B2 (en) 2010-08-24
EP2196488A1 (de) 2010-06-16

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