ATE497930T1 - Pyrogene kieselsäure - Google Patents
Pyrogene kieselsäureInfo
- Publication number
- ATE497930T1 ATE497930T1 AT03767810T AT03767810T ATE497930T1 AT E497930 T1 ATE497930 T1 AT E497930T1 AT 03767810 T AT03767810 T AT 03767810T AT 03767810 T AT03767810 T AT 03767810T AT E497930 T1 ATE497930 T1 AT E497930T1
- Authority
- AT
- Austria
- Prior art keywords
- containing free
- burner
- silicic acid
- gas
- gas containing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/19—Oil-absorption capacity, e.g. DBP values
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/90—Other properties not specified above
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Percussion Or Vibration Massage (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10258858A DE10258858A1 (de) | 2002-12-17 | 2002-12-17 | Pyrogen hergestelltes Siliciumdioxid |
PCT/EP2003/014326 WO2004054928A1 (en) | 2002-12-17 | 2003-12-16 | Pyrogenically produced silica |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE497930T1 true ATE497930T1 (de) | 2011-02-15 |
Family
ID=32518993
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT03767810T ATE497930T1 (de) | 2002-12-17 | 2003-12-16 | Pyrogene kieselsäure |
Country Status (9)
Country | Link |
---|---|
US (1) | US7541014B2 (de) |
EP (1) | EP1572586B1 (de) |
JP (1) | JP4511941B2 (de) |
KR (1) | KR101080562B1 (de) |
CN (1) | CN100506693C (de) |
AT (1) | ATE497930T1 (de) |
AU (1) | AU2003292247A1 (de) |
DE (2) | DE10258858A1 (de) |
WO (1) | WO2004054928A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6223165B1 (en) * | 1999-03-22 | 2001-04-24 | Keen.Com, Incorporated | Method and apparatus to connect consumer to expert |
DE10258858A1 (de) * | 2002-12-17 | 2004-08-05 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxid |
DE102005001408A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver |
DE102005001409A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver und dieses Pulver enthaltene Silikondichtmasse |
DE102005001410A1 (de) | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver und Dispersion hiervon |
CN101626854B (zh) | 2007-01-29 | 2012-07-04 | 赢创德固赛有限责任公司 | 用于熔模铸造的热解金属氧化物 |
ATE497483T1 (de) * | 2007-05-21 | 2011-02-15 | Evonik Degussa Gmbh | Pyrogen hergestelltes siliciumdioxid mit niedriger verdickungswirkung |
DE102007024096A1 (de) * | 2007-05-22 | 2008-11-27 | Evonik Degussa Gmbh | Klebstoffe |
EP2014622B1 (de) * | 2007-07-06 | 2017-01-18 | Evonik Degussa GmbH | Verfahren zur Herstellung eines Kieselglasgranulats |
DE102010031585A1 (de) | 2010-07-21 | 2012-01-26 | Evonik Degussa Gmbh | Siliciumdioxidpulver mit speziellen Oberflächeneigenschaften und dieses Pulver enthaltende Tonerzusammensetzung |
CN102513031B (zh) * | 2011-11-30 | 2014-04-16 | 广州吉必盛科技实业有限公司 | 一种脱酸工艺及其设备 |
JP7479849B2 (ja) * | 2017-07-13 | 2024-05-09 | ワッカー ケミー アクチエンゲゼルシャフト | 高分散二酸化ケイ素を製造する方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE790704A (fr) * | 1971-10-28 | 1973-02-15 | Degussa | Procede pour la fabrication d'oxydes finement |
US6193795B1 (en) * | 1993-08-02 | 2001-02-27 | Degussa Corporation | Low structure pyrogenic hydrophilic and hydrophobic metallic oxides, production and use |
DE19530339A1 (de) * | 1995-08-18 | 1997-02-20 | Degussa | Pyrogene Kieselsäure, Verfahren zu ihrer Herstellung und Verwendung |
US5959005A (en) * | 1996-04-26 | 1999-09-28 | Degussa-Huls Aktiengesellschaft | Silanized silica |
DE19616781A1 (de) * | 1996-04-26 | 1997-11-06 | Degussa | Silanisierte Kieselsäure |
DE19847161A1 (de) * | 1998-10-14 | 2000-04-20 | Degussa | Mittels Aerosol dotiertes pyrogen hergestelltes Siliciumdioxid |
EP1148026B1 (de) * | 2000-04-12 | 2016-08-10 | Evonik Degussa GmbH | Dispersionen |
EP1182168B1 (de) * | 2000-08-21 | 2004-05-12 | Degussa AG | Pyrogen hergestelltes Siliciumdioxid |
DE10239423A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Kieselsäure |
DE10258858A1 (de) * | 2002-12-17 | 2004-08-05 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxid |
DE10326049A1 (de) | 2003-06-10 | 2004-12-30 | Degussa Ag | Flammenhydrolytisch hergestelltes Siliciumdioxid, Verfahren zu seiner Herstellung und Verwendung |
DE102005001410A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver und Dispersion hiervon |
-
2002
- 2002-12-17 DE DE10258858A patent/DE10258858A1/de not_active Withdrawn
-
2003
- 2003-12-16 US US10/530,284 patent/US7541014B2/en active Active
- 2003-12-16 AU AU2003292247A patent/AU2003292247A1/en not_active Abandoned
- 2003-12-16 EP EP03767810A patent/EP1572586B1/de not_active Revoked
- 2003-12-16 CN CNB2003801065855A patent/CN100506693C/zh not_active Expired - Lifetime
- 2003-12-16 AT AT03767810T patent/ATE497930T1/de not_active IP Right Cessation
- 2003-12-16 WO PCT/EP2003/014326 patent/WO2004054928A1/en active Application Filing
- 2003-12-16 DE DE60336010T patent/DE60336010D1/de not_active Expired - Lifetime
- 2003-12-16 JP JP2004560437A patent/JP4511941B2/ja not_active Expired - Lifetime
- 2003-12-16 KR KR1020057011134A patent/KR101080562B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
DE10258858A1 (de) | 2004-08-05 |
US7541014B2 (en) | 2009-06-02 |
EP1572586B1 (de) | 2011-02-09 |
AU2003292247A1 (en) | 2004-07-09 |
WO2004054928A1 (en) | 2004-07-01 |
KR20050091729A (ko) | 2005-09-15 |
KR101080562B1 (ko) | 2011-11-04 |
EP1572586A1 (de) | 2005-09-14 |
DE60336010D1 (de) | 2011-03-24 |
JP4511941B2 (ja) | 2010-07-28 |
US20060093543A1 (en) | 2006-05-04 |
JP2006509713A (ja) | 2006-03-23 |
CN100506693C (zh) | 2009-07-01 |
CN1726169A (zh) | 2006-01-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |