ATE458208T1 - Verfahren zur herstellung von photonischen kristallen - Google Patents
Verfahren zur herstellung von photonischen kristallenInfo
- Publication number
- ATE458208T1 ATE458208T1 AT05801690T AT05801690T ATE458208T1 AT E458208 T1 ATE458208 T1 AT E458208T1 AT 05801690 T AT05801690 T AT 05801690T AT 05801690 T AT05801690 T AT 05801690T AT E458208 T1 ATE458208 T1 AT E458208T1
- Authority
- AT
- Austria
- Prior art keywords
- photoresist
- photonic crystals
- illumination
- phase
- inorganic
- Prior art date
Links
- 239000004038 photonic crystal Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 8
- 230000004075 alteration Effects 0.000 abstract 2
- 238000005286 illumination Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 230000003287 optical effect Effects 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 1
- 230000009022 nonlinear effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Biophysics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optical Integrated Circuits (AREA)
- Surface Treatment Of Glass (AREA)
- Lasers (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Weting (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004037949A DE102004037949B4 (de) | 2004-08-05 | 2004-08-05 | Verfahren zur Herstellung von Photonischen Kristallen |
PCT/EP2005/054231 WO2006015989A1 (de) | 2004-08-05 | 2005-08-05 | Verfahren zur herstellung von photonischen kristallen |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE458208T1 true ATE458208T1 (de) | 2010-03-15 |
Family
ID=35482121
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05801690T ATE458208T1 (de) | 2004-08-05 | 2005-08-05 | Verfahren zur herstellung von photonischen kristallen |
Country Status (7)
Country | Link |
---|---|
US (1) | US7732122B2 (ja) |
EP (1) | EP1784670B1 (ja) |
JP (1) | JP5026967B2 (ja) |
AT (1) | ATE458208T1 (ja) |
CA (1) | CA2573930C (ja) |
DE (2) | DE102004037949B4 (ja) |
WO (1) | WO2006015989A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8070919B2 (en) * | 2007-07-16 | 2011-12-06 | Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) | Method for preparing one dimensional spin photonic crystal device and one dimensional spin photonic crystal device prepared by the same |
WO2012014717A1 (ja) * | 2010-07-26 | 2012-02-02 | 浜松ホトニクス株式会社 | 半導体デバイスの製造方法 |
US8986562B2 (en) | 2013-08-07 | 2015-03-24 | Ultratech, Inc. | Methods of laser processing photoresist in a gaseous environment |
US10431455B2 (en) | 2015-09-17 | 2019-10-01 | The Regents Of The University Of Michigan | Femtosecond laser-induced formation of single crystal patterned semiconductor surface |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4493886A (en) * | 1982-05-11 | 1985-01-15 | University Patents, Inc. | Composition and method for forming amorphous chalcogenide films from solution |
JP2000313629A (ja) * | 1999-04-27 | 2000-11-14 | Japan Science & Technology Corp | 微小穴開きガラス及びその製造方法 |
JP2002344280A (ja) * | 2001-05-18 | 2002-11-29 | Mitsubishi Electric Corp | 圧電薄膜素子とその製造方法 |
JP2003321252A (ja) * | 2002-04-25 | 2003-11-11 | Japan Science & Technology Corp | ガラス内部への分相領域の形成方法 |
JP3559827B2 (ja) * | 2002-05-24 | 2004-09-02 | 独立行政法人理化学研究所 | 透明材料内部の処理方法およびその装置 |
JP2004196585A (ja) * | 2002-12-18 | 2004-07-15 | Nippon Sheet Glass Co Ltd | レーザビームにより材料内部に異質相を形成する方法、構造物および光部品 |
JP2004223586A (ja) * | 2003-01-24 | 2004-08-12 | Institute Of Physical & Chemical Research | 透明材料内部の処理方法 |
AU2003304694A1 (en) * | 2003-12-05 | 2005-08-12 | 3M Innovative Properties Company | Process for producing photonic crystals and controlled defects therein |
US20050124712A1 (en) * | 2003-12-05 | 2005-06-09 | 3M Innovative Properties Company | Process for producing photonic crystals |
-
2004
- 2004-08-05 DE DE102004037949A patent/DE102004037949B4/de not_active Expired - Fee Related
-
2005
- 2005-08-05 JP JP2007524354A patent/JP5026967B2/ja not_active Expired - Fee Related
- 2005-08-05 US US11/659,432 patent/US7732122B2/en not_active Expired - Fee Related
- 2005-08-05 EP EP05801690A patent/EP1784670B1/de not_active Not-in-force
- 2005-08-05 CA CA2573930A patent/CA2573930C/en not_active Expired - Fee Related
- 2005-08-05 AT AT05801690T patent/ATE458208T1/de not_active IP Right Cessation
- 2005-08-05 DE DE502005009046T patent/DE502005009046D1/de active Active
- 2005-08-05 WO PCT/EP2005/054231 patent/WO2006015989A1/de active Application Filing
Also Published As
Publication number | Publication date |
---|---|
CA2573930C (en) | 2013-10-15 |
JP2008512695A (ja) | 2008-04-24 |
DE102004037949B4 (de) | 2009-04-02 |
US20080032237A1 (en) | 2008-02-07 |
DE502005009046D1 (de) | 2010-04-01 |
JP5026967B2 (ja) | 2012-09-19 |
DE102004037949A1 (de) | 2006-03-16 |
US7732122B2 (en) | 2010-06-08 |
CA2573930A1 (en) | 2006-02-16 |
WO2006015989A1 (de) | 2006-02-16 |
EP1784670A1 (de) | 2007-05-16 |
EP1784670B1 (de) | 2010-02-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
REN | Ceased due to non-payment of the annual fee |