ATE453232T1 - Gütegeschalteter co2 laser für materialbearbeitung - Google Patents

Gütegeschalteter co2 laser für materialbearbeitung

Info

Publication number
ATE453232T1
ATE453232T1 AT02721681T AT02721681T ATE453232T1 AT E453232 T1 ATE453232 T1 AT E453232T1 AT 02721681 T AT02721681 T AT 02721681T AT 02721681 T AT02721681 T AT 02721681T AT E453232 T1 ATE453232 T1 AT E453232T1
Authority
AT
Austria
Prior art keywords
laser
cavity
signal generation
generation system
pulsed
Prior art date
Application number
AT02721681T
Other languages
English (en)
Inventor
John Kennedy
Richard Hart
Lanny Laughman
Joel Fontanella
Anthony Demaria
Leon Newman
Robert Henschke
Original Assignee
Coherent Deos
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coherent Deos filed Critical Coherent Deos
Application granted granted Critical
Publication of ATE453232T1 publication Critical patent/ATE453232T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B23K26/382—Removing material by boring or cutting by boring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B23K26/382—Removing material by boring or cutting by boring
    • B23K26/389—Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/40—Removing material taking account of the properties of the material involved
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1123—Q-switching
    • H01S3/115—Q-switching using intracavity electro-optic devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1123—Q-switching
    • H01S3/117—Q-switching using intracavity acousto-optic devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/30—Organic material
    • B23K2103/40—Paper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/30—Organic material
    • B23K2103/42—Plastics
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/52—Ceramics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08095—Zig-zag travelling beam through the active medium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813—Configuration of resonator
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2366—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Lasers (AREA)
  • Laser Beam Processing (AREA)
  • Glass Compositions (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
AT02721681T 2001-04-04 2002-04-04 Gütegeschalteter co2 laser für materialbearbeitung ATE453232T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US28151601P 2001-04-04 2001-04-04
PCT/US2002/010765 WO2002082596A2 (en) 2001-04-04 2002-04-04 Q-switched co2 laser for material processing

Publications (1)

Publication Number Publication Date
ATE453232T1 true ATE453232T1 (de) 2010-01-15

Family

ID=23077629

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02721681T ATE453232T1 (de) 2001-04-04 2002-04-04 Gütegeschalteter co2 laser für materialbearbeitung

Country Status (6)

Country Link
US (2) US6826204B2 (de)
EP (1) EP1384293B1 (de)
JP (1) JP2004535663A (de)
AT (1) ATE453232T1 (de)
DE (1) DE60234823D1 (de)
WO (1) WO2002082596A2 (de)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1384293B1 (de) * 2001-04-04 2009-12-23 Coherent Deos Gütegeschalteter co2 laser für materialbearbeitung
US6697408B2 (en) * 2001-04-04 2004-02-24 Coherent, Inc. Q-switched cavity dumped CO2 laser for material processing
US6784399B2 (en) 2001-05-09 2004-08-31 Electro Scientific Industries, Inc. Micromachining with high-energy, intra-cavity Q-switched CO2 laser pulses
US20040208602A1 (en) * 2001-12-01 2004-10-21 James Plante Free space optical communications link tolerant of atmospheric interference
US8148989B2 (en) * 2002-03-11 2012-04-03 Keith Kopp Ferromagnetic detection enhancer compatible with magnetic resonance
US7113529B2 (en) * 2003-03-14 2006-09-26 Coherent, Inc. Pulsed CO2 laser including an optical damage resistant electro-optical switching arrangement
US7039079B2 (en) * 2003-03-14 2006-05-02 Coherent, Inc. Pulsed CO2 laser including an optical damage resistant electro-optical switching arrangement
JP4151476B2 (ja) * 2003-05-14 2008-09-17 ソニー株式会社 レーザ光安定化方法、レーザ光発生装置
US7046709B2 (en) * 2003-11-18 2006-05-16 Coherent, Inc. CO2 waveguide laser with beryllium oxide waveguides
DE10357303A1 (de) * 2003-12-05 2005-07-07 Focke & Co.(Gmbh & Co. Kg) Verfahren und Vorrichtung zum Herstellen von Zigaretten
DE10358927B4 (de) * 2003-12-16 2021-09-09 Carl Zeiss Meditec Ag Laservorrichtung und Verfahren zur Materialbearbeitung mittels Laserstrahlung
US20050255406A1 (en) * 2004-05-11 2005-11-17 Shlomo Assa Marking on a thin film
US7280569B2 (en) * 2004-07-08 2007-10-09 Coherent, Inc. Electro-optical modulator module for CO2 laser Q-switching, mode-locking, and cavity dumping
JP2006196638A (ja) * 2005-01-13 2006-07-27 Institute Of Physical & Chemical Research パルスレーザーのレーザー発振制御方法およびパルスレーザーシステム
US7394479B2 (en) * 2005-03-02 2008-07-01 Marken Corporation Pulsed laser printing
US20080002751A1 (en) * 2005-08-10 2008-01-03 Gongxue Hua High damage threshold Q-switched CO2 laser
WO2008045019A2 (en) * 2005-08-11 2008-04-17 Coherent, Inc. Pulsed rf high pressure co2 lasers
US7327769B2 (en) * 2005-10-18 2008-02-05 Coherent, Inc. Injection locking Q-switched and Q-switched cavity dumped CO2 lasers for extreme UV generation
US20070238046A1 (en) * 2006-04-07 2007-10-11 The Domino Corporation Laser marking
CN100389526C (zh) * 2006-04-12 2008-05-21 李力钧 桁架式折叠准封离型千瓦级co2激光器
US20070272666A1 (en) * 2006-05-25 2007-11-29 O'brien James N Infrared laser wafer scribing using short pulses
JP5173153B2 (ja) * 2006-06-14 2013-03-27 日本電信電話株式会社 電気光学素子
US7630147B1 (en) * 2007-02-16 2009-12-08 University Of Central Florida Research Foundation, Inc. Laser beam shaping for pitchfork profile
US7959694B2 (en) * 2007-03-05 2011-06-14 3M Innovative Properties Company Laser cut abrasive article, and methods
US8080072B2 (en) * 2007-03-05 2011-12-20 3M Innovative Properties Company Abrasive article with supersize coating, and methods
US7903699B2 (en) * 2007-05-24 2011-03-08 Coherent, Inc. Acousto-optically Q-switched CO2 laser
US20090045178A1 (en) * 2007-08-15 2009-02-19 Che-Kang Hsu Laser engraver
KR200447896Y1 (ko) * 2009-09-16 2010-03-03 주식회사 호수산업 수납식 관람석의 가동 안내장치
RU2589274C2 (ru) * 2010-03-26 2016-07-10 ЛОРЕНС ЛИВЕРМОР НЭШНЛ СЕКЬЮРИТИ, ЭлЭлСи Архитектура многопроходного усилителя для лазерных систем большой мощности
WO2011162776A1 (en) * 2010-06-25 2011-12-29 Markem-Imaje Corporation Ingress protected laser
US8611391B2 (en) 2011-05-03 2013-12-17 Coherent, Inc. Waveguide CO2 laser with mutiply folded resonator
DE102012002470A1 (de) 2012-02-03 2013-08-08 Iai Industrial Systems B.V. CO2-Laser mit schneller Leistungssteuerung
US8767291B2 (en) * 2012-03-16 2014-07-01 Kla-Tencor Corporation Suppression of parasitic optical feedback in pulse laser systems
US8731015B2 (en) 2012-03-30 2014-05-20 Coherent, Inc. Compact CO2 slab-laser
LT6021B (lt) * 2012-08-16 2014-04-25 Integrated Optics, Uab Lazeris, veikiantis aktyvios modų sinchronizacijos ir rezonatoriaus iškrovos režimu
JP6207289B2 (ja) * 2013-08-06 2017-10-04 キヤノン株式会社 被検体情報取得装置、レーザー装置および医療装置
US9414498B2 (en) 2013-09-20 2016-08-09 Coherent, Inc. Via-hole drilling in a printed circuit board using a carbon monoxide laser
DE102014111774A1 (de) * 2014-08-18 2016-02-18 AMOtronics UG Anordnung und Verfahren zum Modulieren von Laserpulsen
US9925620B2 (en) 2015-08-19 2018-03-27 Coherent, Inc. Carbon monoxide laser machining system
US10274806B2 (en) 2015-11-06 2019-04-30 Coherent, Inc. Pulse-dividing method and apparatus for a pulsed carbon monoxide laser
US11123822B2 (en) * 2016-03-31 2021-09-21 AGC Inc. Manufacturing method for glass substrate, method for forming hole in glass substrate, and apparatus for forming hole in glass substrate
WO2017042688A1 (en) * 2016-07-27 2017-03-16 Universidad Tecnológica De Panamá Laser cutting device
US10423047B2 (en) 2016-07-27 2019-09-24 Coherent, Inc. Laser machining method and apparatus
US11754688B2 (en) 2017-03-16 2023-09-12 Fastree3D Sa Method and device for optimizing the use of multiple emitters and a detector in an active remote sensing application
EP3596490A1 (de) 2017-03-16 2020-01-22 Fastree3D SA Verfahren und vorrichtung zur optimierung der verwendung eines emitters und detektors in einer aktiven fernmessanwendung
US10583668B2 (en) 2018-08-07 2020-03-10 Markem-Imaje Corporation Symbol grouping and striping for wide field matrix laser marking
DE102018221189A1 (de) 2018-12-07 2020-06-10 Carl Zeiss Smt Gmbh Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und optisches Element
JP2021165814A (ja) * 2020-04-08 2021-10-14 三菱重工業株式会社 レーザ加工装置
CN118648204A (zh) * 2021-11-18 2024-09-13 相干公司 Q开关式气体激光器中的脉冲均衡
CN115361506B (zh) * 2022-08-17 2024-05-24 中科微机电技术（北京）有限公司 有源像素传感器的控制方法、有源像素传感器及电子设备
CN117060206A (zh) * 2023-08-23 2023-11-14 广东镭奔激光科技有限公司 一种脉冲锻造激光振荡系统
DE102023136334A1 (de) * 2023-12-21 2025-06-26 TRUMPF Lasersystems for Semiconductor Manufacturing SE Verfahren zur Verstärkung eines vorwärtslaufenden Laserpulses und geringerer Verstärkung eines rückwärtslaufenden Laserpulses

Family Cites Families (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3577097A (en) * 1967-11-28 1971-05-04 Trw Inc Laser with combined q-switch and synchronized cavity dump circuit
US3581230A (en) * 1969-01-27 1971-05-25 United Aircraft Corp Passive q-switch and modulator for co{hd 2 {l lasers
US3711791A (en) * 1971-05-03 1973-01-16 A Erickson Frustrated total internal reflection laser q-switch
US3772611A (en) 1971-12-27 1973-11-13 Bell Telephone Labor Inc Waveguide gas laser devices
US4030839A (en) 1972-04-20 1977-06-21 Glenn Edward Rickert Frequency selective reflex sight
US3790278A (en) * 1972-04-26 1974-02-05 United Aircraft Corp Peaked power coherent pulsed laser transmitter/receiver system
US3820038A (en) * 1973-02-09 1974-06-25 Atomic Energy Commission Method and apparatus for producing isolated laser pulses having a fast rise time
US3824717A (en) * 1973-07-30 1974-07-23 Hughes Aircraft Co Enhanced field of view parametric image converter
US4169251A (en) 1978-01-16 1979-09-25 Hughes Aircraft Company Waveguide gas laser with high frequency transverse discharge excitation
US4174504A (en) * 1978-01-25 1979-11-13 United Technologies Corporation Apparatus and method for cavity dumping a Q-switched laser
US4176327A (en) * 1978-01-25 1979-11-27 United Technologies Corporation Method for cavity dumping a Q-switched laser
US4221463A (en) * 1979-05-11 1980-09-09 Raytheon Company Optical modulator with ringing suppression
EP0048716B1 (de) * 1980-04-05 1983-12-21 ELTRO GmbH Gesellschaft für Strahlungstechnik Laseranordnung
US4393517A (en) * 1980-09-30 1983-07-12 The United States Of America As Represented By The Secretary Of The Army Pulse code modulation of laser pulse tail
US4363126A (en) 1980-12-10 1982-12-07 United Technologies Corporation Tuned-circuit RF-excited laser
US4498179A (en) * 1982-07-30 1985-02-05 The Unites States Of America As Represented By The Secretary Of The Army Modulated infrared laser with two coupled cavities
US4660204A (en) * 1984-08-02 1987-04-21 Hughes Aircraft Company CO2 TEA laser utilizing an intra-cavity prism Q-switch
US4675872A (en) * 1985-09-30 1987-06-23 Harris Corporation Driver unit for a laser Q-switch
DD256439A3 (de) * 1986-01-09 1988-05-11 Halle Feinmech Werke Veb Verfahren zur steuerung der inneren und unterdrueckung der aeusseren strahlungsrueckkopplung eines co tief 2-hochleistungslasers
US4719639B1 (en) 1987-01-08 1994-06-28 Boreal Laser Inc Carbon dioxide slab laser
US4815094A (en) 1987-05-22 1989-03-21 California Laboratories, Inc. Multiply folded laser systems
US4787090A (en) 1988-03-28 1988-11-22 United Technologies Corporation Compact distributed inductance RF-excited waveguide gas laser arrangement
US4891819A (en) 1989-01-17 1990-01-02 Sutter Jr Leroy V RF excited laser with internally folded resonator
JPH02211684A (ja) * 1989-02-13 1990-08-22 Toshiba Corp Ｑスイッチレーザ装置
US5220576A (en) 1990-09-26 1993-06-15 Seimans Aktiengesellschaft Slab or stripline laser
US5204867A (en) * 1991-06-10 1993-04-20 Laser Photonics, Inc. Method and apparatus to dynamically control the resonator gain of a laser
DE4125443C2 (de) 1991-08-01 1998-01-15 Man Technologie Gmbh Optisch gepumpter Ferninfrarot-Laser
US5177748A (en) 1991-08-06 1993-01-05 California Institute Of Technology In phase coupled strip waveguide CO2 laser
US5255277A (en) * 1991-09-30 1993-10-19 Whittaker Ordnance, Inc. Electronic pulse width controller for flashlamp pumped lasers
US5195104A (en) * 1991-10-15 1993-03-16 Lasen, Inc. Internally stimulated optical parametric oscillator/laser
US5329539A (en) * 1991-10-28 1994-07-12 Lightwave Electronics Efficient laser configuration
WO1993010583A1 (en) * 1991-11-22 1993-05-27 Omnichrome Corporation Liquid stabilized internal mirror lasers
US5327442A (en) * 1992-02-19 1994-07-05 Coherent, Inc. Solid state laser with dual cooling loops
US5365532A (en) * 1992-10-09 1994-11-15 Hughes Aircraft Company Cavity dump laser amplitude stabilization
DE9217640U1 (de) 1992-12-23 1994-09-29 Rofin-Sinar Laser Gmbh, 22113 Hamburg Slab- oder Bandleiterlaser
EP0608458B1 (de) 1993-01-29 2002-01-02 Citizen Watch Co. Ltd. Verfahren zur Steuerung einer optischen Modulationsvorrichtung
US5353297A (en) 1993-07-12 1994-10-04 Coherent, Inc. Gas slab laser with folded resonator structure
US5491579A (en) 1994-05-31 1996-02-13 The United States Of America As Represented By The Secretary Of The Navy Broadband thermal optical limiter for the protection of eyes and sensors
US5748663A (en) 1994-06-08 1998-05-05 Qsource, Inc. Retangular discharge gas laser
US5610936A (en) 1995-09-28 1997-03-11 Technology Development Corporation Extended multiply folded optical paths
FR2756672B1 (fr) * 1996-12-04 1999-03-12 Thomson Csf Dispositif amplificateur de lumiere a deux faisceaux incidents
US5982790A (en) 1997-01-16 1999-11-09 Lightwave Electronics Corporation System for reducing pulse-to-pulse energy variation in a pulsed laser
AU6939198A (en) 1997-03-14 1998-09-29 Demaria Electrooptics Systems Inc. Rf excited waveguide laser
US5854805A (en) * 1997-03-21 1998-12-29 Lumonics Inc. Laser machining of a workpiece
US6078598A (en) * 1997-04-25 2000-06-20 Nikon Corporation Laser apparatus, pulsed laser oscillation method and projection exposure apparatus using the same
US5881087A (en) 1997-04-30 1999-03-09 Universal Laser Systems, Inc. Gas laser tube design
US6072815A (en) * 1998-02-27 2000-06-06 Litton Systems, Inc. Microlaser submount assembly and associates packaging method
US6252726B1 (en) * 1999-09-02 2001-06-26 Lightlogic, Inc. Dual-enclosure optoelectronic packages
KR100346836B1 (ko) * 2000-06-07 2002-08-03 삼성전자 주식회사 듀티 사이클 보정 기능을 갖는 지연 동기 루프 회로 및지연 동기 방법
US6709169B2 (en) * 2000-09-28 2004-03-23 Powernetix, Inc. Thermally and mechanically stable low-cost high thermal conductivity structure for single-mode fiber coupling to laser diode
US6806440B2 (en) * 2001-03-12 2004-10-19 Electro Scientific Industries, Inc. Quasi-CW diode pumped, solid-state UV laser system and method employing same
US6654391B2 (en) * 2001-03-30 2003-11-25 Lightwave Electronics Method for operating Q-switched lasers with intracavity frequency conversion
US6697408B2 (en) * 2001-04-04 2004-02-24 Coherent, Inc. Q-switched cavity dumped CO2 laser for material processing
EP1384293B1 (de) * 2001-04-04 2009-12-23 Coherent Deos Gütegeschalteter co2 laser für materialbearbeitung
US6784399B2 (en) * 2001-05-09 2004-08-31 Electro Scientific Industries, Inc. Micromachining with high-energy, intra-cavity Q-switched CO2 laser pulses
US6683893B2 (en) * 2001-10-25 2004-01-27 Coherent, Inc. Q-switching method for pulse train generation

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US20050069007A1 (en) 2005-03-31
EP1384293B1 (de) 2009-12-23
WO2002082596A2 (en) 2002-10-17
EP1384293A2 (de) 2004-01-28
DE60234823D1 (de) 2010-02-04
US20030156615A1 (en) 2003-08-21
WO2002082596A3 (en) 2003-11-06
US6826204B2 (en) 2004-11-30
JP2004535663A (ja) 2004-11-25

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