ATE445156T1 - Beschichtung für raue umgebungen und sensoren unter verwendung derselben - Google Patents

Beschichtung für raue umgebungen und sensoren unter verwendung derselben

Info

Publication number
ATE445156T1
ATE445156T1 AT06751299T AT06751299T ATE445156T1 AT E445156 T1 ATE445156 T1 AT E445156T1 AT 06751299 T AT06751299 T AT 06751299T AT 06751299 T AT06751299 T AT 06751299T AT E445156 T1 ATE445156 T1 AT E445156T1
Authority
AT
Austria
Prior art keywords
coating
harsh environments
sensors
awd
same
Prior art date
Application number
AT06751299T
Other languages
English (en)
Inventor
Jeffrey C Dr Andle
Reichl B Haskell
John H Bradshaw
Original Assignee
Capital Formation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Capital Formation Inc filed Critical Capital Formation Inc
Application granted granted Critical
Publication of ATE445156T1 publication Critical patent/ATE445156T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/88—Mounts; Supports; Enclosures; Casings
    • H10N30/883—Additional insulation means preventing electrical, physical or chemical damage, e.g. protective coatings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/22—Details, e.g. general constructional or apparatus details
    • G01N29/32—Arrangements for suppressing undesired influences, e.g. temperature or pressure variations, compensating for signal noise
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/87—Electrodes or interconnections, e.g. leads or terminals
    • H10N30/877—Conductive materials

Landscapes

  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Pinball Game Machines (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
AT06751299T 2006-04-20 2006-04-20 Beschichtung für raue umgebungen und sensoren unter verwendung derselben ATE445156T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2006/015537 WO2007123539A1 (en) 2006-04-20 2006-04-20 Coating for harsh environments and sensors using same

Publications (1)

Publication Number Publication Date
ATE445156T1 true ATE445156T1 (de) 2009-10-15

Family

ID=37640271

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06751299T ATE445156T1 (de) 2006-04-20 2006-04-20 Beschichtung für raue umgebungen und sensoren unter verwendung derselben

Country Status (8)

Country Link
US (2) US7800285B2 (de)
EP (1) EP1891429B1 (de)
JP (1) JP4913863B2 (de)
CN (1) CN101180532A (de)
AT (1) ATE445156T1 (de)
CH (1) CH698809B1 (de)
DE (1) DE602006009646D1 (de)
WO (1) WO2007123539A1 (de)

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DE102007036473A1 (de) * 2007-08-01 2009-02-05 Testo Ag Vorrichtung zum Messen des Zustands eines Messguts, insbesondere von Ölen oder Fetten
JP5314963B2 (ja) * 2008-08-12 2013-10-16 富士フイルム株式会社 積層体、圧電素子、および液体吐出装置
US7936110B2 (en) 2009-03-14 2011-05-03 Delaware Capital Formation, Inc. Lateral excitation of pure shear modes
US8664836B1 (en) * 2009-09-18 2014-03-04 Sand 9, Inc. Passivated micromechanical resonators and related methods
WO2011035147A2 (en) 2009-09-18 2011-03-24 Delaware Capital Formation, Inc. Controlled compressional wave components of thickness shear mode multi-measurand sensors
JP2011103327A (ja) * 2009-11-10 2011-05-26 Seiko Epson Corp 圧電素子、圧電アクチュエーター、液体噴射ヘッドおよび液体噴射装置
BR112012026079B1 (pt) * 2010-04-15 2021-04-27 Synthes Gmbh Revestimento para um substrato de cocrmo
US9169551B2 (en) 2010-04-15 2015-10-27 DePuy Synthes Products, Inc. Coating for a CoCrMo substrate
JP5713615B2 (ja) * 2010-09-17 2015-05-07 大和製衡株式会社 ロードセル
CN103712872A (zh) * 2012-09-28 2014-04-09 中国石油化工股份有限公司 一种评价油品的低温腐蚀性能的方法
US9308090B2 (en) 2013-03-11 2016-04-12 DePuy Synthes Products, Inc. Coating for a titanium alloy substrate
CN105203252A (zh) * 2014-06-30 2015-12-30 罗斯蒙特公司 具有带类金刚石碳涂层的密封件的过程压力变送器
JP2015096868A (ja) * 2015-01-20 2015-05-21 大和製衡株式会社 ロードセル
US10352904B2 (en) 2015-10-26 2019-07-16 Qorvo Us, Inc. Acoustic resonator devices and methods providing patterned functionalization areas
WO2017075344A1 (en) 2015-10-28 2017-05-04 Qorvo Us, Inc. Sensor device with baw resonator and through-substrate fluidic vias
US10458982B2 (en) 2015-10-30 2019-10-29 Qorvo Us, Inc. Fluidic device including BAW resonators along opposing channel surfaces
US10393704B2 (en) 2015-10-30 2019-08-27 Qorvo Us, Inc. Multi-frequency BAW mixing and sensing system and method
US10302595B2 (en) 2015-11-06 2019-05-28 Qorvo Us, Inc. Acoustic resonator devices and fabrication methods providing hermeticity and surface functionalization
WO2017083131A1 (en) * 2015-11-09 2017-05-18 Qorvo Us, Inc. Baw sensor with enhanced surface area active region
US10267770B2 (en) 2016-07-27 2019-04-23 Qorvo Us, Inc. Acoustic resonator devices and methods with noble metal layer for functionalization
US11444595B2 (en) 2016-08-11 2022-09-13 Qorvo Biotechnologies, Llc Acoustic resonator device with controlled placement of functionalization material
CN107068847A (zh) * 2017-04-27 2017-08-18 苏州国科昂卓医疗科技有限公司 一种压电器件及其制作方法
KR102393445B1 (ko) * 2017-10-04 2022-05-03 생-고뱅 어브레이시브즈, 인코포레이티드 연마 물품 및 이의 형성 방법
DE102017222624A1 (de) * 2017-12-13 2019-06-13 SKF Aerospace France S.A.S Beschichtete Lagerkomponente und Lager mit einer solchen Komponente
DE102018110189A1 (de) * 2018-04-27 2019-10-31 Endress+Hauser Conducta Gmbh+Co. Kg Sensor der Prozessautomatisierungstechnik und Herstellung desselben
US11921427B2 (en) 2018-11-14 2024-03-05 Lam Research Corporation Methods for making hard masks useful in next-generation lithography
CN109930120B (zh) * 2018-12-20 2020-12-25 兰州空间技术物理研究所 一种空间活动零部件表面智能复合润滑薄膜及其制备方法
CN110265544A (zh) * 2019-06-24 2019-09-20 京东方科技集团股份有限公司 压电传感器及制备方法、进行指纹识别的方法及电子设备
CN114651173A (zh) * 2019-11-06 2022-06-21 联邦科学及工业研究组织 用于感测pH的多层电极
EP3908882A4 (de) 2020-01-15 2022-03-16 Lam Research Corporation Unterschicht für die haftung und dosisreduzierung von fotolack
CN111536909A (zh) * 2020-04-20 2020-08-14 中物院成都科学技术发展中心 一种薄膜镀层质量及超声波紧固件的质量检测方法

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JP3953921B2 (ja) * 2002-09-10 2007-08-08 日本プレーテック株式会社 ダイヤモンドｑｃｍの作製方法及びそのダイヤモンドｑｃｍ
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Also Published As

Publication number Publication date
DE602006009646D1 (de) 2009-11-19
JP2009534652A (ja) 2009-09-24
EP1891429B1 (de) 2009-10-07
US20100304012A1 (en) 2010-12-02
WO2007123539A1 (en) 2007-11-01
CH698809B1 (de) 2009-10-30
US20100038997A1 (en) 2010-02-18
JP4913863B2 (ja) 2012-04-11
CN101180532A (zh) 2008-05-14
US7800285B2 (en) 2010-09-21
EP1891429A1 (de) 2008-02-27

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