ATE441192T1 - Magnetische mehrschichtstruktur mit verbessertem magnetfeldbereich - Google Patents

Magnetische mehrschichtstruktur mit verbessertem magnetfeldbereich

Info

Publication number
ATE441192T1
ATE441192T1 AT01960306T AT01960306T ATE441192T1 AT E441192 T1 ATE441192 T1 AT E441192T1 AT 01960306 T AT01960306 T AT 01960306T AT 01960306 T AT01960306 T AT 01960306T AT E441192 T1 ATE441192 T1 AT E441192T1
Authority
AT
Austria
Prior art keywords
layer
magnetic field
field area
improved
exchange
Prior art date
Application number
AT01960306T
Other languages
English (en)
Inventor
Kars-Michiel Lenssen
Antonius Kuiper
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE441192T1 publication Critical patent/ATE441192T1/de

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
    • G11C11/15—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3909—Arrangements using a magnetic tunnel junction
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Hall/Mr Elements (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Heads (AREA)
  • Semiconductor Memories (AREA)
  • Mram Or Spin Memory Techniques (AREA)
AT01960306T 2000-06-21 2001-06-12 Magnetische mehrschichtstruktur mit verbessertem magnetfeldbereich ATE441192T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00202153 2000-06-21
PCT/EP2001/006648 WO2001099099A2 (en) 2000-06-21 2001-06-12 Magnetic multilayer structure with improved magnetic field range

Publications (1)

Publication Number Publication Date
ATE441192T1 true ATE441192T1 (de) 2009-09-15

Family

ID=8171663

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01960306T ATE441192T1 (de) 2000-06-21 2001-06-12 Magnetische mehrschichtstruktur mit verbessertem magnetfeldbereich

Country Status (9)

Country Link
US (1) US6891366B2 (de)
EP (1) EP1282902B1 (de)
JP (1) JP2003536267A (de)
KR (1) KR20030009286A (de)
CN (1) CN1319083C (de)
AT (1) ATE441192T1 (de)
DE (1) DE60139682D1 (de)
TW (1) TW579502B (de)
WO (1) WO2001099099A2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
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US6677631B1 (en) * 2002-08-27 2004-01-13 Micron Technology, Inc. MRAM memory elements and method for manufacture of MRAM memory elements
US7042032B2 (en) * 2003-03-27 2006-05-09 Taiwan Semiconductor Manufacturing Co., Ltd. Magnetoresistive (MR) magnetic data storage device with sidewall spacer layer isolation
US6900489B2 (en) 2003-04-29 2005-05-31 Micron Technology, Inc. Reducing the effects of néel coupling in MRAM structures
JP5166736B2 (ja) * 2003-12-23 2013-03-21 エリポスキ リモート リミテッド エルエルシー 高感度磁気内蔵電流センサ
US7268980B2 (en) 2004-02-11 2007-09-11 Hitachi Global Storage Technologies Netherlands, B.V. Magnetic head having self-pinned CPP sensor with multilayer pinned layer
JP4877506B2 (ja) * 2004-03-31 2012-02-15 日本電気株式会社 磁化方向制御方法、及びそれを応用したｍｒａｍ
JP2007081280A (ja) * 2005-09-16 2007-03-29 Fujitsu Ltd 磁気抵抗効果素子及び磁気メモリ装置
US8310866B2 (en) * 2008-07-07 2012-11-13 Qimonda Ag MRAM device structure employing thermally-assisted write operations and thermally-unassisted self-referencing operations
EP2539896B1 (de) * 2010-02-22 2016-10-19 Integrated Magnetoelectronics Corporation Struktur mit hohem gmr und wenigen steuerfeldern
JP5686635B2 (ja) * 2011-03-07 2015-03-18 アルプス電気株式会社 磁気センサ及びその製造方法
EP2538235B1 (de) * 2011-06-24 2013-07-31 Christian-Albrechts-Universität zu Kiel Magnetostriktives Schichtsystem
CN103235274B (zh) * 2013-04-19 2015-12-23 中国科学院物理研究所 一种基于反铁磁自旋转向现象的传感器
WO2015146593A1 (ja) * 2014-03-28 2015-10-01 アルプス電気株式会社 磁気センサおよび磁気センサの製造方法ならびに電流センサ
US20170059669A1 (en) * 2015-08-26 2017-03-02 Qualcomm Incorporated Magnetic field enhancing backing plate for mram wafer testing
US11022661B2 (en) 2017-05-19 2021-06-01 Allegro Microsystems, Llc Magnetoresistance element with increased operational range
US10620279B2 (en) * 2017-05-19 2020-04-14 Allegro Microsystems, Llc Magnetoresistance element with increased operational range
US11193989B2 (en) 2018-07-27 2021-12-07 Allegro Microsystems, Llc Magnetoresistance assembly having a TMR element disposed over or under a GMR element

Family Cites Families (19)

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JPH08511873A (ja) 1994-04-15 1996-12-10 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ 磁界センサ、そんなセンサを具えた装置及びそんなセンサを製造する方法
JP3264600B2 (ja) * 1995-03-31 2002-03-11 アルプス電気株式会社 磁気抵抗効果素子用多層膜および磁性層の磁化の調整方法
SG46731A1 (en) * 1995-06-30 1998-02-20 Ibm Spin valve magnetoresistive sensor with antiparallel pinned layer and improved exchange bias layer and magnetic recording system using the senor
US6166891A (en) * 1997-06-30 2000-12-26 Read-Rite Corporation Magnetoresistive sensor for high temperature environment using iridium manganese
JP2925542B1 (ja) * 1998-03-12 1999-07-28 ティーディーケイ株式会社 磁気抵抗効果膜および磁気抵抗効果型ヘッド
US6191926B1 (en) * 1998-05-07 2001-02-20 Seagate Technology Llc Spin valve magnetoresistive sensor using permanent magnet biased artificial antiferromagnet layer
JP3560821B2 (ja) * 1998-07-17 2004-09-02 アルプス電気株式会社 巨大磁気抵抗効果素子を備えたエンコーダ
JP2000057535A (ja) * 1998-08-12 2000-02-25 Read Rite Smi Kk スピンバルブ型磁気ヘッド
JP3703348B2 (ja) * 1999-01-27 2005-10-05 アルプス電気株式会社 スピンバルブ型薄膜素子とそのスピンバルブ型薄膜素子を備えた薄膜磁気ヘッド
JP3766565B2 (ja) * 1999-05-31 2006-04-12 Ｔｄｋ株式会社 磁気抵抗効果膜および磁気抵抗効果型ヘッド
US6275363B1 (en) * 1999-07-23 2001-08-14 International Business Machines Corporation Read head with dual tunnel junction sensor
US6219209B1 (en) * 1999-07-29 2001-04-17 International Business Machines Corporation Spin valve head with multiple antiparallel coupling layers
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JP2001156357A (ja) * 1999-09-16 2001-06-08 Toshiba Corp 磁気抵抗効果素子および磁気記録素子
US6271997B1 (en) * 1999-11-22 2001-08-07 International Business Machines Corporation Read head spin valve sensor with triple antiparallel coupled free layer structure
JP3490367B2 (ja) * 2000-01-31 2004-01-26 アルプス電気株式会社 スピンバルブ型薄膜磁気素子及び薄膜磁気ヘッド及び浮上式磁気ヘッド並びにスピンバルブ型薄膜磁気素子の製造方法
US6639762B2 (en) * 2000-01-24 2003-10-28 Alps Electric Co., Ltd. Spin valve thin-film magnetic device having free magnetic layer in ferrimagnetic state and manufacturing method therefor
US6211090B1 (en) * 2000-03-21 2001-04-03 Motorola, Inc. Method of fabricating flux concentrating layer for use with magnetoresistive random access memories

Also Published As

Publication number Publication date
WO2001099099A3 (en) 2002-11-07
WO2001099099A2 (en) 2001-12-27
JP2003536267A (ja) 2003-12-02
DE60139682D1 (de) 2009-10-08
TW579502B (en) 2004-03-11
CN1460272A (zh) 2003-12-03
CN1319083C (zh) 2007-05-30
US6891366B2 (en) 2005-05-10
EP1282902B1 (de) 2009-08-26
US20020030489A1 (en) 2002-03-14
EP1282902A2 (de) 2003-02-12
KR20030009286A (ko) 2003-01-29

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