ATE429425T1 - Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel - Google Patents
Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikelInfo
- Publication number
- ATE429425T1 ATE429425T1 AT03792778T AT03792778T ATE429425T1 AT E429425 T1 ATE429425 T1 AT E429425T1 AT 03792778 T AT03792778 T AT 03792778T AT 03792778 T AT03792778 T AT 03792778T AT E429425 T1 ATE429425 T1 AT E429425T1
- Authority
- AT
- Austria
- Prior art keywords
- group
- pellicle
- atom
- contain
- fluorpolymers
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/04—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D307/10—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/16—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/04—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D307/18—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/26—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D307/30—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F34/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring
- C08F34/02—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain and having one or more carbon-to-carbon double bonds in a heterocyclic ring in a ring containing oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002240759 | 2002-08-21 | ||
| PCT/JP2003/010588 WO2004018443A1 (ja) | 2002-08-21 | 2003-08-21 | 紫外光透過性含フッ素重合体および該重合体からなるペリクル |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE429425T1 true ATE429425T1 (de) | 2009-05-15 |
Family
ID=31943944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03792778T ATE429425T1 (de) | 2002-08-21 | 2003-08-21 | Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7442815B2 (de) |
| EP (1) | EP1548014B1 (de) |
| CN (1) | CN1315817C (de) |
| AT (1) | ATE429425T1 (de) |
| AU (1) | AU2003257654A1 (de) |
| DE (1) | DE60327333D1 (de) |
| RU (1) | RU2005107716A (de) |
| TW (1) | TW200408665A (de) |
| WO (1) | WO2004018443A1 (de) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60327333D1 (de) | 2002-08-21 | 2009-06-04 | Asahi Glass Co Ltd | Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel |
| CN1886442B (zh) * | 2003-12-03 | 2010-09-08 | 旭硝子株式会社 | 表膜及新的含氟聚合物 |
| JP2008108890A (ja) * | 2006-10-25 | 2008-05-08 | Three M Innovative Properties Co | 回路基板の接続方法及び接続構造体 |
| EP2738603B1 (de) * | 2011-07-29 | 2016-07-13 | Asahi Glass Company, Limited | Lithographiemembran, fotomaske mit der membran und belichtungsverfahren dafür |
| CN106471026B (zh) * | 2014-07-04 | 2020-08-25 | Agc株式会社 | 电解质材料、液态组合物、固体高分子型燃料电池用膜电极接合体及含氟支链聚合物 |
| WO2016010043A1 (ja) | 2014-07-15 | 2016-01-21 | 旭硝子株式会社 | 紫外線発光装置用接着剤および紫外線発光装置 |
| JP6669464B2 (ja) * | 2015-10-19 | 2020-03-18 | 信越化学工業株式会社 | Euv用ペリクル |
| JP7139133B2 (ja) * | 2018-04-03 | 2022-09-20 | 信越化学工業株式会社 | ペリクルフレーム、ペリクル、及びペリクルフレームの製造方法 |
| US20230047767A1 (en) * | 2019-12-12 | 2023-02-16 | Solvay Specialty Polymers Italy S.P.A. | Method for removing fluoropolymer lift-off layer |
| JP7196208B2 (ja) * | 2020-01-08 | 2022-12-26 | ダイキン工業株式会社 | 絶縁膜又は誘電膜 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3865845A (en) | 1971-02-24 | 1975-02-11 | Paul Raphael Resnick | Fluorinated dioxoles |
| JP2951337B2 (ja) * | 1989-04-17 | 1999-09-20 | 古河電気工業株式会社 | ペリクル |
| JP2952962B2 (ja) | 1989-05-31 | 1999-09-27 | 旭硝子株式会社 | 汚染防止保護器具 |
| JPH1031119A (ja) * | 1996-07-18 | 1998-02-03 | Asahi Glass Co Ltd | コア/クラッド型の光学樹脂材料 |
| KR20020053083A (ko) | 1999-11-17 | 2002-07-04 | 메리 이. 보울러 | 자외선 및 진공자외선 투명 폴리머 조성물 및 그의 용도 |
| US6548129B2 (en) | 2000-03-15 | 2003-04-15 | Asahi Glass Company, Limited | Pellicle |
| JP2001330943A (ja) * | 2000-03-15 | 2001-11-30 | Asahi Glass Co Ltd | ペリクル |
| WO2002066452A1 (en) * | 2001-02-21 | 2002-08-29 | Asahi Glass Company, Limited | Processes for producing fluorinated cyclic ethers and use thereof |
| EP1401923A2 (de) * | 2001-05-14 | 2004-03-31 | E.I. du Pont de Nemours and Company | Fluorharzzusammensetzungen mit fluor-enthaltender flüssigkeit |
| DE60327333D1 (de) | 2002-08-21 | 2009-06-04 | Asahi Glass Co Ltd | Uv-durchlässige fluorpolymere und durch deren verwendung hergestellte pellikel |
| JP2004085713A (ja) | 2002-08-23 | 2004-03-18 | Asahi Glass Co Ltd | ペリクル |
-
2003
- 2003-08-21 DE DE60327333T patent/DE60327333D1/de not_active Expired - Lifetime
- 2003-08-21 RU RU2005107716/04A patent/RU2005107716A/ru not_active Application Discontinuation
- 2003-08-21 EP EP03792778A patent/EP1548014B1/de not_active Expired - Lifetime
- 2003-08-21 AT AT03792778T patent/ATE429425T1/de not_active IP Right Cessation
- 2003-08-21 AU AU2003257654A patent/AU2003257654A1/en not_active Abandoned
- 2003-08-21 CN CNB038196808A patent/CN1315817C/zh not_active Expired - Fee Related
- 2003-08-21 WO PCT/JP2003/010588 patent/WO2004018443A1/ja not_active Ceased
- 2003-08-21 TW TW092123054A patent/TW200408665A/zh not_active IP Right Cessation
-
2005
- 2005-02-22 US US11/061,689 patent/US7442815B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1548014B1 (de) | 2009-04-22 |
| TW200408665A (en) | 2004-06-01 |
| RU2005107716A (ru) | 2006-07-27 |
| WO2004018443A1 (ja) | 2004-03-04 |
| US20050147897A1 (en) | 2005-07-07 |
| US7442815B2 (en) | 2008-10-28 |
| EP1548014A4 (de) | 2008-04-02 |
| DE60327333D1 (de) | 2009-06-04 |
| TWI320048B (de) | 2010-02-01 |
| CN1675191A (zh) | 2005-09-28 |
| EP1548014A1 (de) | 2005-06-29 |
| AU2003257654A1 (en) | 2004-03-11 |
| CN1315817C (zh) | 2007-05-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |