ATE399366T1 - Abgabevorrichtungs-kathode - Google Patents

Abgabevorrichtungs-kathode

Info

Publication number
ATE399366T1
ATE399366T1 AT04711065T AT04711065T ATE399366T1 AT E399366 T1 ATE399366 T1 AT E399366T1 AT 04711065 T AT04711065 T AT 04711065T AT 04711065 T AT04711065 T AT 04711065T AT E399366 T1 ATE399366 T1 AT E399366T1
Authority
AT
Austria
Prior art keywords
emission
emission area
reservoir
work
function
Prior art date
Application number
AT04711065T
Other languages
English (en)
Inventor
Pieter Kruit
Stijn Willem Herman Steenbrink
Original Assignee
Mapper Lithography Ip Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mapper Lithography Ip Bv filed Critical Mapper Lithography Ip Bv
Application granted granted Critical
Publication of ATE399366T1 publication Critical patent/ATE399366T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • H01J1/28—Dispenser-type cathodes, e.g. L-cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/04—Cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31752—Lithography using particular beams or near-field effects, e.g. STM-like techniques
    • H01J2237/31754—Lithography using particular beams or near-field effects, e.g. STM-like techniques using electron beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31774—Multi-beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
  • Solid Thermionic Cathode (AREA)
  • Nozzles (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Particle Accelerators (AREA)
  • Electron Sources, Ion Sources (AREA)
AT04711065T 2003-02-14 2004-02-13 Abgabevorrichtungs-kathode ATE399366T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US44797503P 2003-02-14 2003-02-14

Publications (1)

Publication Number Publication Date
ATE399366T1 true ATE399366T1 (de) 2008-07-15

Family

ID=32869649

Family Applications (2)

Application Number Title Priority Date Filing Date
AT10181079T ATE552607T1 (de) 2003-02-14 2004-02-13 Vorratskathode
AT04711065T ATE399366T1 (de) 2003-02-14 2004-02-13 Abgabevorrichtungs-kathode

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT10181079T ATE552607T1 (de) 2003-02-14 2004-02-13 Vorratskathode

Country Status (8)

Country Link
US (4) US7215070B2 (de)
EP (4) EP2267747B1 (de)
JP (2) JP4624980B2 (de)
KR (1) KR101072948B1 (de)
CN (1) CN1830051B (de)
AT (2) ATE552607T1 (de)
DE (1) DE602004014590D1 (de)
WO (1) WO2004072732A2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2267747B1 (de) * 2003-02-14 2014-05-14 Mapper Lithography Ip B.V. Lithographiesystem mit Vorratskathode
US20100060136A1 (en) * 2004-12-09 2010-03-11 Koninklijke Philips Electronics, N.V. Cathode for electron emission
US7545089B1 (en) * 2005-03-21 2009-06-09 Calabazas Creek Research, Inc. Sintered wire cathode
US7317785B1 (en) 2006-12-11 2008-01-08 General Electric Company System and method for X-ray spot control
WO2007102947A1 (en) * 2006-03-06 2007-09-13 General Electric Company System and method for x-ray spot control
EP2148354B1 (de) * 2007-05-16 2014-09-24 Denki Kagaku Kogyo Kabushiki Kaisha Elektronenquelle
US9220501B2 (en) 2010-09-30 2015-12-29 Ethicon Endo-Surgery, Inc. Tissue thickness compensators
US9165737B2 (en) * 2012-10-04 2015-10-20 Nuflare Technology, Inc. High-brightness, long life thermionic cathode and methods of its fabrication
NL2014029B1 (en) * 2013-12-30 2016-01-08 Mapper Lithography Ip Bv Cathode arrangement, electron gun, and lithography system comprising such electron gun.
US10269530B1 (en) * 2017-11-29 2019-04-23 Taiwan Semiconductor Manufacturing Co., Ltd. Ion beam source for semiconductor ion implantation

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FR2390825A1 (fr) * 1977-05-13 1978-12-08 Thomson Csf Cathode thermo-ionique a grille incorporee, son procede de fabrication et tube electronique comportant une telle cathode
US4101800A (en) * 1977-07-06 1978-07-18 The United States Of America As Represented By The Secretary Of The Navy Controlled-porosity dispenser cathode
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US4379979A (en) * 1981-02-06 1983-04-12 The United States Of America As Represented By The Secretary Of The Navy Controlled porosity sheet for thermionic dispenser cathode and method of manufacture
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NL8600675A (nl) * 1986-03-17 1987-10-16 Philips Nv Halfgeleiderinrichting voor het opwekken van een elektronenstroom.
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US5072148A (en) * 1990-10-15 1991-12-10 Itt Corporation Dispenser cathode with emitting surface parallel to ion flow and use in thyratrons
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JP4647820B2 (ja) * 2001-04-23 2011-03-09 キヤノン株式会社 荷電粒子線描画装置、および、デバイスの製造方法
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EP2267747B1 (de) * 2003-02-14 2014-05-14 Mapper Lithography Ip B.V. Lithographiesystem mit Vorratskathode
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Also Published As

Publication number Publication date
CN1830051B (zh) 2010-04-28
WO2004072732A3 (en) 2005-02-24
US8263942B2 (en) 2012-09-11
CN1830051A (zh) 2006-09-06
EP2293316A1 (de) 2011-03-09
EP2267747B1 (de) 2014-05-14
US20060028114A1 (en) 2006-02-09
US7215070B2 (en) 2007-05-08
EP1959473A3 (de) 2008-09-03
EP2293316B1 (de) 2012-04-04
US20100219357A1 (en) 2010-09-02
KR20050109492A (ko) 2005-11-21
JP4624980B2 (ja) 2011-02-02
KR101072948B1 (ko) 2011-10-17
US20070182303A1 (en) 2007-08-09
DE602004014590D1 (de) 2008-08-07
EP1593140A2 (de) 2005-11-09
US20110180721A1 (en) 2011-07-28
JP2006518109A (ja) 2006-08-03
EP1593140B1 (de) 2008-06-25
US7710009B2 (en) 2010-05-04
WO2004072732A2 (en) 2004-08-26
ATE552607T1 (de) 2012-04-15
JP2011040398A (ja) 2011-02-24
EP2267747A1 (de) 2010-12-29
EP1959473A2 (de) 2008-08-20
US8247958B2 (en) 2012-08-21

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