ATE341083T1 - Optische anordnung und verfahren dazu - Google Patents

Optische anordnung und verfahren dazu

Info

Publication number
ATE341083T1
ATE341083T1 AT03760756T AT03760756T ATE341083T1 AT E341083 T1 ATE341083 T1 AT E341083T1 AT 03760756 T AT03760756 T AT 03760756T AT 03760756 T AT03760756 T AT 03760756T AT E341083 T1 ATE341083 T1 AT E341083T1
Authority
AT
Austria
Prior art keywords
rays
serves
optical unit
different
reflective surface
Prior art date
Application number
AT03760756T
Other languages
German (de)
English (en)
Inventor
Peter Hoghoj
Aurelien Dariel
Sergio Rodrigues
Original Assignee
Xenocs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR0207546A external-priority patent/FR2841371B1/fr
Priority claimed from FR0300623A external-priority patent/FR2850171B1/fr
Application filed by Xenocs filed Critical Xenocs
Application granted granted Critical
Publication of ATE341083T1 publication Critical patent/ATE341083T1/de

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Lenses (AREA)
  • Glass Compositions (AREA)
  • Prostheses (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Light Guides In General And Applications Therefor (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
AT03760756T 2002-06-19 2003-06-19 Optische anordnung und verfahren dazu ATE341083T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0207546A FR2841371B1 (fr) 2002-06-19 2002-06-19 Ensemble optique et procede associe
FR0300623A FR2850171B1 (fr) 2003-01-21 2003-01-21 Dispositif optique pour applications rayons x

Publications (1)

Publication Number Publication Date
ATE341083T1 true ATE341083T1 (de) 2006-10-15

Family

ID=30001927

Family Applications (2)

Application Number Title Priority Date Filing Date
AT03760756T ATE341083T1 (de) 2002-06-19 2003-06-19 Optische anordnung und verfahren dazu
AT03760747T ATE421152T1 (de) 2002-06-19 2003-06-19 Optische vorrichtung für röntgenstrahlungsanwendungen

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT03760747T ATE421152T1 (de) 2002-06-19 2003-06-19 Optische vorrichtung für röntgenstrahlungsanwendungen

Country Status (8)

Country Link
US (2) US7430277B2 (https=)
EP (3) EP1514279B1 (https=)
JP (2) JP2005530168A (https=)
CN (2) CN1324613C (https=)
AT (2) ATE341083T1 (https=)
AU (2) AU2003264670A1 (https=)
DE (3) DE20320792U1 (https=)
WO (2) WO2004001769A1 (https=)

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EP2075569B1 (en) * 2007-12-31 2012-02-15 Xenocs S.A. X-ray beam device
JP2010014418A (ja) * 2008-07-01 2010-01-21 Japan Atomic Energy Agency 多層膜回折格子分光装置
US7741626B2 (en) * 2008-09-12 2010-06-22 Cymer, Inc. Spectral purity filters and methods therefor
US8050380B2 (en) * 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
US8249220B2 (en) * 2009-10-14 2012-08-21 Rigaku Innovative Technologies, Inc. Multiconfiguration X-ray optical system
US8208602B2 (en) * 2010-02-22 2012-06-26 General Electric Company High flux photon beams using optic devices
US8311184B2 (en) 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
US8488740B2 (en) * 2010-11-18 2013-07-16 Panalytical B.V. Diffractometer
FR2967887B1 (fr) 2010-11-26 2018-01-19 General Electric Company Mammographe compact, et procede de mammographie associe
US8744048B2 (en) 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
KR101332502B1 (ko) * 2011-06-14 2013-11-26 전남대학교산학협력단 국부적 방사선 치료용 ｘ―선 바늘 모듈
US8761346B2 (en) 2011-07-29 2014-06-24 General Electric Company Multilayer total internal reflection optic devices and methods of making and using the same
CN102903413B (zh) * 2012-10-30 2015-06-03 同济大学 一种在小尺寸背光下工作的四通道kb显微成像系统
US20140161233A1 (en) 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
EP2762862B1 (en) * 2013-01-30 2017-03-08 Bruker AXS GmbH XRF measurement apparatus for detecting contaminations on the bevel of a wafer
CN115241731A (zh) * 2013-11-07 2022-10-25 镁可微波技术有限公司 具有光束形状和光束方向修改的激光器
EP2896960B1 (en) * 2014-01-15 2017-07-26 PANalytical B.V. X-ray apparatus for SAXS and Bragg-Brentano measurements
JP6202684B2 (ja) * 2014-06-05 2017-09-27 株式会社リガク Ｘ線回折装置
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
CN105092618A (zh) * 2015-09-18 2015-11-25 北京师范大学 一种微束能量色散的x射线衍射仪及其使用方法
CN105873344A (zh) * 2016-03-22 2016-08-17 中国工程物理研究院流体物理研究所 一种基于横向梯度多层膜反射元件的x射线单能成像方法
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
FR3059434B1 (fr) * 2016-11-29 2019-05-17 Centre National De La Recherche Scientifique - Cnrs Composant de selection spectrale pour radiations xuv
CN106706157B (zh) * 2017-01-11 2023-06-13 中国工程物理研究院激光聚变研究中心 一种基于准同视轴的icf热斑电子温度探测设备
KR102621750B1 (ko) * 2019-06-24 2024-01-05 에스엠에스 그룹 게엠베하 다결정 제품의 소재 특성 측정 장치 및 방법
JP7637878B2 (ja) * 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7564522B2 (ja) 2021-01-12 2024-10-09 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
JP7637879B2 (ja) * 2021-01-12 2025-03-03 国立大学法人 東京大学 ミラーの設計方法、および該設計方法における設計式が成り立つ反射面を備えた非点収差制御ミラー
CN115389537A (zh) * 2022-08-26 2022-11-25 同济大学 一种具有高通量的小焦斑中子聚焦系统
CN119688594B (zh) * 2025-02-24 2025-06-20 泸州市镀膜科技有限公司 一种用于电容器金属化薄膜加工的缺陷检测系统

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Also Published As

Publication number Publication date
DE60308645T2 (de) 2007-10-18
JP2005530170A (ja) 2005-10-06
AU2003260613A1 (en) 2004-01-06
CN1332399C (zh) 2007-08-15
WO2004001770A1 (fr) 2003-12-31
CN1675720A (zh) 2005-09-28
EP1732087A2 (fr) 2006-12-13
EP1514279A1 (fr) 2005-03-16
US20060018429A1 (en) 2006-01-26
ATE421152T1 (de) 2009-01-15
DE60325853D1 (de) 2009-03-05
EP1732087A3 (fr) 2007-03-28
JP2005530168A (ja) 2005-10-06
EP1468428B1 (fr) 2006-09-27
AU2003264670A1 (en) 2004-01-06
WO2004001769A1 (fr) 2003-12-31
DE60308645D1 (de) 2006-11-09
CN1662999A (zh) 2005-08-31
DE20320792U1 (de) 2005-05-04
EP1468428A1 (fr) 2004-10-20
US7248670B2 (en) 2007-07-24
US20050117239A1 (en) 2005-06-02
CN1324613C (zh) 2007-07-04
US7430277B2 (en) 2008-09-30
EP1514279B1 (fr) 2009-01-14
WO2004001769A8 (fr) 2005-01-06

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