ATE325715T1 - Verfahren zur herstellung eines elektronischen bauelements und elektronisches bauelement davon hergestellt - Google Patents

Verfahren zur herstellung eines elektronischen bauelements und elektronisches bauelement davon hergestellt

Info

Publication number
ATE325715T1
ATE325715T1 AT02772699T AT02772699T ATE325715T1 AT E325715 T1 ATE325715 T1 AT E325715T1 AT 02772699 T AT02772699 T AT 02772699T AT 02772699 T AT02772699 T AT 02772699T AT E325715 T1 ATE325715 T1 AT E325715T1
Authority
AT
Austria
Prior art keywords
electronic component
foil
mark
component
components
Prior art date
Application number
AT02772699T
Other languages
English (en)
Inventor
Johan Bosman
De Water Peter W M Van
Roelf A J Groenhuis
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE325715T1 publication Critical patent/ATE325715T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54406—Marks applied to semiconductor devices or parts comprising alphanumeric information
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54473—Marks applied to semiconductor devices or parts for use after dicing
    • H01L2223/5448—Located on chip prior to dicing and remaining on chip after dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Laser Beam Processing (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Wire Bonding (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Ceramic Capacitors (AREA)
AT02772699T 2001-10-09 2002-10-08 Verfahren zur herstellung eines elektronischen bauelements und elektronisches bauelement davon hergestellt ATE325715T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01203817 2001-10-09

Publications (1)

Publication Number Publication Date
ATE325715T1 true ATE325715T1 (de) 2006-06-15

Family

ID=8181038

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02772699T ATE325715T1 (de) 2001-10-09 2002-10-08 Verfahren zur herstellung eines elektronischen bauelements und elektronisches bauelement davon hergestellt

Country Status (8)

Country Link
EP (1) EP1438198B1 (de)
JP (1) JP2005505145A (de)
KR (1) KR20040039494A (de)
CN (1) CN1302938C (de)
AT (1) ATE325715T1 (de)
DE (1) DE60211364T2 (de)
TW (1) TWI223360B (de)
WO (1) WO2003031193A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4769975B2 (ja) * 2006-03-29 2011-09-07 オンセミコンダクター・トレーディング・リミテッド 半導体装置の製造方法
DE102006019118B4 (de) 2006-04-25 2011-08-18 Epcos Ag, 81669 Bauelement mit optischer Markierung und Verfahren zur Herstellung
JP2010153607A (ja) * 2008-12-25 2010-07-08 Sanyo Electric Co Ltd 半導体装置およびその製造方法
PL3405351T3 (pl) * 2016-01-18 2023-09-18 Phoenix Contact Gmbh & Co. Kg Urządzenie znakujące do znakowania elektrycznych elementów konstrukcyjnych

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1138084A (en) * 1966-07-22 1968-12-27 Standard Telephones Cables Ltd Method of vapour depositing a material in the form of a pattern
NL8001731A (nl) * 1980-03-25 1981-10-16 Philips Nv Werkwijze voor het markeren van een kunststofoppervlak en voorwerp voorzien van een gemarkeerd kunststofoppervlak.
US4743463A (en) * 1986-02-21 1988-05-10 Eastman Kodak Company Method for forming patterns on a substrate or support
JPH0715087B2 (ja) * 1988-07-21 1995-02-22 リンテック株式会社 粘接着テープおよびその使用方法
DE19652253C2 (de) * 1996-12-16 1999-04-29 Kloeckner Moeller Gmbh Laser-Beschriftungsverfahren zur Beschriftung von Bezeichnungsschildern

Also Published As

Publication number Publication date
DE60211364D1 (de) 2006-06-14
EP1438198A1 (de) 2004-07-21
KR20040039494A (ko) 2004-05-10
EP1438198B1 (de) 2006-05-10
WO2003031193A1 (en) 2003-04-17
CN1302938C (zh) 2007-03-07
CN1564754A (zh) 2005-01-12
TWI223360B (en) 2004-11-01
DE60211364T2 (de) 2007-03-29
JP2005505145A (ja) 2005-02-17

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties