DE60211364D1 - Verfahren zur herstellung eines elektronischen bauelements und elektronisches bauelement davon hergestellt - Google Patents

Verfahren zur herstellung eines elektronischen bauelements und elektronisches bauelement davon hergestellt

Info

Publication number
DE60211364D1
DE60211364D1 DE60211364T DE60211364T DE60211364D1 DE 60211364 D1 DE60211364 D1 DE 60211364D1 DE 60211364 T DE60211364 T DE 60211364T DE 60211364 T DE60211364 T DE 60211364T DE 60211364 D1 DE60211364 D1 DE 60211364D1
Authority
DE
Germany
Prior art keywords
electronic component
foil
mark
component
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60211364T
Other languages
English (en)
Other versions
DE60211364T2 (de
Inventor
Johan Bosman
De Water W Van
A Groenhuis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of DE60211364D1 publication Critical patent/DE60211364D1/de
Application granted granted Critical
Publication of DE60211364T2 publication Critical patent/DE60211364T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/24Ablative recording, e.g. by burning marks; Spark recording
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54406Marks applied to semiconductor devices or parts comprising alphanumeric information
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54473Marks applied to semiconductor devices or parts for use after dicing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54473Marks applied to semiconductor devices or parts for use after dicing
    • H01L2223/5448Located on chip prior to dicing and remaining on chip after dicing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Laser Beam Processing (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Ceramic Capacitors (AREA)
  • Wire Bonding (AREA)
DE60211364T 2001-10-09 2002-10-08 Verfahren zur herstellung eines elektronischen bauelements und elektronisches bauelement davon hergestellt Expired - Lifetime DE60211364T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP01203817 2001-10-09
EP01203817 2001-10-09
PCT/IB2002/004112 WO2003031193A1 (en) 2001-10-09 2002-10-08 Method of manufacturing an electronic component and electronic component obtained by means of said method

Publications (2)

Publication Number Publication Date
DE60211364D1 true DE60211364D1 (de) 2006-06-14
DE60211364T2 DE60211364T2 (de) 2007-03-29

Family

ID=8181038

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60211364T Expired - Lifetime DE60211364T2 (de) 2001-10-09 2002-10-08 Verfahren zur herstellung eines elektronischen bauelements und elektronisches bauelement davon hergestellt

Country Status (8)

Country Link
EP (1) EP1438198B1 (de)
JP (1) JP2005505145A (de)
KR (1) KR20040039494A (de)
CN (1) CN1302938C (de)
AT (1) ATE325715T1 (de)
DE (1) DE60211364T2 (de)
TW (1) TWI223360B (de)
WO (1) WO2003031193A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4769975B2 (ja) * 2006-03-29 2011-09-07 オンセミコンダクター・トレーディング・リミテッド 半導体装置の製造方法
DE102006019118B4 (de) * 2006-04-25 2011-08-18 Epcos Ag, 81669 Bauelement mit optischer Markierung und Verfahren zur Herstellung
JP2010153607A (ja) * 2008-12-25 2010-07-08 Sanyo Electric Co Ltd 半導体装置およびその製造方法
KR102152513B1 (ko) * 2016-01-18 2020-10-26 피닉스 컨택트 게엠베하 & 컴퍼니 카게 전기 구성요소의 마킹 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1138084A (en) * 1966-07-22 1968-12-27 Standard Telephones Cables Ltd Method of vapour depositing a material in the form of a pattern
NL8001731A (nl) * 1980-03-25 1981-10-16 Philips Nv Werkwijze voor het markeren van een kunststofoppervlak en voorwerp voorzien van een gemarkeerd kunststofoppervlak.
US4743463A (en) * 1986-02-21 1988-05-10 Eastman Kodak Company Method for forming patterns on a substrate or support
JPH0715087B2 (ja) * 1988-07-21 1995-02-22 リンテック株式会社 粘接着テープおよびその使用方法
DE19652253C2 (de) * 1996-12-16 1999-04-29 Kloeckner Moeller Gmbh Laser-Beschriftungsverfahren zur Beschriftung von Bezeichnungsschildern

Also Published As

Publication number Publication date
JP2005505145A (ja) 2005-02-17
CN1564754A (zh) 2005-01-12
KR20040039494A (ko) 2004-05-10
CN1302938C (zh) 2007-03-07
EP1438198A1 (de) 2004-07-21
WO2003031193A1 (en) 2003-04-17
DE60211364T2 (de) 2007-03-29
EP1438198B1 (de) 2006-05-10
TWI223360B (en) 2004-11-01
ATE325715T1 (de) 2006-06-15

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Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: EISENFUEHR, SPEISER & PARTNER, 10178 BERLIN

8327 Change in the person/name/address of the patent owner

Owner name: NXP B.V., EINDHOVEN, NL