ATE318270T1 - Verwendung von wasser und angesäuertem wasser zur reinigung flüssiger mocvd vorläuferverbindungen - Google Patents
Verwendung von wasser und angesäuertem wasser zur reinigung flüssiger mocvd vorläuferverbindungenInfo
- Publication number
- ATE318270T1 ATE318270T1 AT02028800T AT02028800T ATE318270T1 AT E318270 T1 ATE318270 T1 AT E318270T1 AT 02028800 T AT02028800 T AT 02028800T AT 02028800 T AT02028800 T AT 02028800T AT E318270 T1 ATE318270 T1 AT E318270T1
- Authority
- AT
- Austria
- Prior art keywords
- water
- source
- diketones
- precursor compounds
- copper
- Prior art date
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title abstract 4
- 239000007788 liquid Substances 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 title 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 title 1
- 239000002243 precursor Substances 0.000 title 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 2
- 229910052802 copper Inorganic materials 0.000 abstract 2
- 239000010949 copper Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 abstract 2
- 238000000746 purification Methods 0.000 abstract 2
- 239000005749 Copper compound Substances 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000006227 byproduct Substances 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
- 150000001879 copper Chemical class 0.000 abstract 1
- 150000001880 copper compounds Chemical class 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 125000000962 organic group Chemical group 0.000 abstract 1
- 239000012044 organic layer Substances 0.000 abstract 1
- 239000012074 organic phase Substances 0.000 abstract 1
- 239000000047 product Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F1/00—Compounds containing elements of Groups 1 or 11 of the Periodic Table
- C07F1/08—Copper compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Extraction Or Liquid Replacement (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/037,739 US6534666B1 (en) | 2001-12-27 | 2001-12-27 | Use of water and acidic water to purify liquid MOCVD precursors |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE318270T1 true ATE318270T1 (de) | 2006-03-15 |
Family
ID=21896029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02028800T ATE318270T1 (de) | 2001-12-27 | 2002-12-27 | Verwendung von wasser und angesäuertem wasser zur reinigung flüssiger mocvd vorläuferverbindungen |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6534666B1 (de) |
| EP (1) | EP1323720B1 (de) |
| JP (1) | JP3825404B2 (de) |
| KR (1) | KR100517429B1 (de) |
| AT (1) | ATE318270T1 (de) |
| DE (1) | DE60209294T2 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6642401B2 (en) * | 2000-03-14 | 2003-11-04 | Nissan Chemical Industries, Ltd. | β-diketonatocopper(I) complex containing allene compounds as ligand and process for producing the same |
| US6596344B2 (en) * | 2001-03-27 | 2003-07-22 | Sharp Laboratories Of America, Inc. | Method of depositing a high-adhesive copper thin film on a metal nitride substrate |
| US6620956B2 (en) | 2001-11-16 | 2003-09-16 | Applied Materials, Inc. | Nitrogen analogs of copper II β-diketonates as source reagents for semiconductor processing |
| US6838573B1 (en) * | 2004-01-30 | 2005-01-04 | Air Products And Chemicals, Inc. | Copper CVD precursors with enhanced adhesion properties |
| EP1629902A1 (de) * | 2004-08-30 | 2006-03-01 | E.I. Dupont De Nemours And Company | Verfahren zur Auftragung von Kupfer aus einer überkritischen Lösung, die Kupfer-(1)-Komplexe mit einem neutralen Liganten enthält |
| JP5701655B2 (ja) * | 2011-03-29 | 2015-04-15 | 奈良県 | 植物精油中のトロポロン類及び／又はフェノール類の金属錯体化方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT956493B (it) | 1972-06-13 | 1973-10-10 | Sir Soc Italiana Resine Spa | Procedimento per il recupero del fenolo contenuto in acque di sca rico e per la trasformazione di detto fenolo in prodotti resinosi |
| IL40253A (en) | 1972-08-30 | 1975-04-25 | Imi Inst For Res & Dev | Removal of dissolved organic matter from acidic aqueous solution |
| US4124504A (en) | 1977-05-25 | 1978-11-07 | George Munden | Process for treating caustic wash solutions |
| US4442303A (en) | 1980-12-09 | 1984-04-10 | El Paso Products Company | Recovery of water miscible organic acids from aqueous solution as alkyl esters |
| US4594131A (en) | 1984-08-13 | 1986-06-10 | United States Steel Corporation | Process for removing ammonia and acid gases from process streams |
| US5098516A (en) | 1990-12-31 | 1992-03-24 | Air Products And Chemicals, Inc. | Processes for the chemical vapor deposition of copper and etching of copper |
| US5085731A (en) | 1991-02-04 | 1992-02-04 | Air Products And Chemicals, Inc. | Volatile liquid precursors for the chemical vapor deposition of copper |
| US5187300A (en) | 1991-02-04 | 1993-02-16 | Air Products And Chemicals, Inc. | Volatile precursors for copper CVD |
| US5158686A (en) | 1991-02-25 | 1992-10-27 | Envar Services, Inc. | Impurity removal process and apparatus |
| US5352825A (en) | 1993-07-06 | 1994-10-04 | Hoarmann & Reimer Corp. | Recovery of organic acid salts from impure process streams by addition of bases |
| JP2622671B2 (ja) * | 1995-03-07 | 1997-06-18 | 株式会社トリケミカル研究所 | 銅のβ−ジケトネート錯体の製造方法 |
| US5681446A (en) | 1995-08-30 | 1997-10-28 | Sterling Pulp Chemicals, Ltd. | Impurity removal for sodium chlorate |
| US5767301A (en) * | 1997-01-21 | 1998-06-16 | Sharp Microelectronics Technology, Inc. | Precursor with (alkyloxy)(alkyl)-silylolefin ligand to deposit copper |
| FR2760743B1 (fr) * | 1997-03-13 | 1999-07-23 | Centre Nat Rech Scient | Nouveaux precurseurs de cuivre(i) pour depot chimique en phase gazeuse de cuivre metallique |
| US6096913A (en) * | 1999-06-10 | 2000-08-01 | Air Products And Chemicals, Inc. | Production of metal-ligand complexes |
-
2001
- 2001-12-27 US US10/037,739 patent/US6534666B1/en not_active Expired - Fee Related
-
2002
- 2002-12-23 KR KR10-2002-0082349A patent/KR100517429B1/ko not_active IP Right Cessation
- 2002-12-27 JP JP2002380469A patent/JP3825404B2/ja not_active Expired - Fee Related
- 2002-12-27 AT AT02028800T patent/ATE318270T1/de not_active IP Right Cessation
- 2002-12-27 DE DE60209294T patent/DE60209294T2/de not_active Expired - Fee Related
- 2002-12-27 EP EP02028800A patent/EP1323720B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US6534666B1 (en) | 2003-03-18 |
| DE60209294T2 (de) | 2006-11-02 |
| EP1323720B1 (de) | 2006-02-22 |
| EP1323720A1 (de) | 2003-07-02 |
| JP2003261496A (ja) | 2003-09-16 |
| KR100517429B1 (ko) | 2005-09-29 |
| KR20030057329A (ko) | 2003-07-04 |
| JP3825404B2 (ja) | 2006-09-27 |
| DE60209294D1 (de) | 2006-04-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |