ATE311486T1 - Dicke einkristalline diamantschicht, verfahren zur herstellung der schicht und edelsteine hergestellt durch bearbeitung der schicht - Google Patents

Dicke einkristalline diamantschicht, verfahren zur herstellung der schicht und edelsteine hergestellt durch bearbeitung der schicht

Info

Publication number
ATE311486T1
ATE311486T1 AT01943715T AT01943715T ATE311486T1 AT E311486 T1 ATE311486 T1 AT E311486T1 AT 01943715 T AT01943715 T AT 01943715T AT 01943715 T AT01943715 T AT 01943715T AT E311486 T1 ATE311486 T1 AT E311486T1
Authority
AT
Austria
Prior art keywords
layer
producing
processing
single crystalline
crystalline diamond
Prior art date
Application number
AT01943715T
Other languages
English (en)
Inventor
Geoffrey Alan Scarsbrook
Philip Maurice Martineau
Baerbel Susanne Charlotte Dorn
Andrew Michael Cooper
John Lloyd Collins
Andrew John Whitehead
Daniel James Twitchen
Original Assignee
Element Six Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0014690A external-priority patent/GB0014690D0/en
Priority claimed from GB0106929A external-priority patent/GB0106929D0/en
Application filed by Element Six Pty Ltd filed Critical Element Six Pty Ltd
Application granted granted Critical
Publication of ATE311486T1 publication Critical patent/ATE311486T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/10Heating of the reaction chamber or the substrate
    • C30B25/105Heating of the reaction chamber or the substrate by irradiation or electric discharge
    • AHUMAN NECESSITIES
    • A44HABERDASHERY; JEWELLERY
    • A44CPERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C17/00Gems or the like
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/06Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/18Epitaxial-layer growth characterised by the substrate
    • C30B25/20Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/04Diamond
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2203/00Processes utilising sub- or super atmospheric pressure
    • B01J2203/06High pressure synthesis
    • B01J2203/0605Composition of the material to be processed
    • B01J2203/062Diamond
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2203/00Processes utilising sub- or super atmospheric pressure
    • B01J2203/06High pressure synthesis
    • B01J2203/065Composition of the material produced
    • B01J2203/0655Diamond
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/30Self-sustaining carbon mass or layer with impregnant or other layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Inorganic Insulating Materials (AREA)
AT01943715T 2000-06-15 2001-06-14 Dicke einkristalline diamantschicht, verfahren zur herstellung der schicht und edelsteine hergestellt durch bearbeitung der schicht ATE311486T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0014690A GB0014690D0 (en) 2000-06-15 2000-06-15 Diamond
GB0106929A GB0106929D0 (en) 2001-03-20 2001-03-20 Diamond
PCT/IB2001/001040 WO2001096634A1 (en) 2000-06-15 2001-06-14 Thick single crystal diamond layer method for making it and gemstones produced from the layer

Publications (1)

Publication Number Publication Date
ATE311486T1 true ATE311486T1 (de) 2005-12-15

Family

ID=26244496

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01943715T ATE311486T1 (de) 2000-06-15 2001-06-14 Dicke einkristalline diamantschicht, verfahren zur herstellung der schicht und edelsteine hergestellt durch bearbeitung der schicht

Country Status (16)

Country Link
US (3) US7128974B2 (de)
EP (2) EP1290251B8 (de)
JP (1) JP4469552B2 (de)
KR (1) KR100839707B1 (de)
CN (1) CN1210445C (de)
AT (1) ATE311486T1 (de)
AU (2) AU6624601A (de)
CA (1) CA2412855C (de)
CZ (1) CZ302229B6 (de)
DE (1) DE60115435T2 (de)
ES (1) ES2252244T3 (de)
GB (1) GB2379451B (de)
IL (2) IL153381A0 (de)
RU (1) RU2287028C2 (de)
TW (1) TWI250231B (de)
WO (1) WO2001096634A1 (de)

Families Citing this family (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8591856B2 (en) 1998-05-15 2013-11-26 SCIO Diamond Technology Corporation Single crystal diamond electrochemical electrode
US6858080B2 (en) 1998-05-15 2005-02-22 Apollo Diamond, Inc. Tunable CVD diamond structures
US6582513B1 (en) 1998-05-15 2003-06-24 Apollo Diamond, Inc. System and method for producing synthetic diamond
DE60135653D1 (de) * 2000-06-15 2008-10-16 Element Six Pty Ltd Einkristalldiamant hergestellt durch cvd
AU2001281404B2 (en) 2001-08-08 2008-07-03 Apollo Diamond, Inc. System and method for producing synthetic diamond
DE10153310A1 (de) * 2001-10-29 2003-05-22 Infineon Technologies Ag Photolithographisches Strukturierungsverfahren mit einer durch ein plasmaunterstützes Abscheideeverfahren hergestellten Kohlenstoff-Hartmaskenschicht diamantartiger Härte
GB0130004D0 (en) * 2001-12-14 2002-02-06 Diamanx Products Ltd Coloured diamond
GB0130005D0 (en) * 2001-12-14 2002-02-06 Diamanx Products Ltd Boron doped diamond
GB0220772D0 (en) * 2002-09-06 2002-10-16 Diamanx Products Ltd Coloured diamond
RU2328563C2 (ru) * 2002-09-06 2008-07-10 Элемент Сикс Лимитед Цветные алмазы
GB0220767D0 (en) * 2002-09-06 2002-10-16 Diamanx Products Ltd Diamond radiation detector
GB0221949D0 (en) * 2002-09-20 2002-10-30 Diamanx Products Ltd Single crystal diamond
GB0227261D0 (en) * 2002-11-21 2002-12-31 Element Six Ltd Optical quality diamond material
FR2849867B1 (fr) 2003-01-10 2005-03-25 Centre Nat Rech Scient Croissance diamant a grande vitesse par plasma micro-onde en regime pulse.
GB0303860D0 (en) * 2003-02-19 2003-03-26 Element Six Ltd CVD diamond in wear applications
CA2548449C (en) 2003-12-12 2014-06-03 Element Six Limited Method of incorporating a mark in cvd diamond
US7481879B2 (en) 2004-01-16 2009-01-27 Sumitomo Electric Industries, Ltd. Diamond single crystal substrate manufacturing method and diamond single crystal substrate
JP4697514B2 (ja) * 2004-01-16 2011-06-08 住友電気工業株式会社 ダイヤモンド単結晶基板の製造方法およびダイヤモンド単結晶基板
US7918293B1 (en) 2005-03-09 2011-04-05 Us Synthetic Corporation Method and system for perceiving a boundary between a first region and a second region of a superabrasive volume
JP5002982B2 (ja) * 2005-04-15 2012-08-15 住友電気工業株式会社 単結晶ダイヤモンドの製造方法
GB0508889D0 (en) * 2005-04-29 2005-06-08 Element Six Ltd Diamond transistor and method of manufacture thereof
KR101307032B1 (ko) * 2005-06-22 2013-09-11 엘리멘트 식스 리미티드 고등급의 색을 갖는 다이아몬드 층
US9133566B2 (en) 2005-12-09 2015-09-15 Element Six Technologies Limited High crystalline quality synthetic diamond
GB0622695D0 (en) 2006-11-14 2006-12-27 Element Six Ltd Robust radiation detector comprising diamond
JP5341774B2 (ja) 2007-01-22 2013-11-13 エレメント シックス リミテッド ダイヤモンド表面のプラズマエッチング
JP5514552B2 (ja) * 2007-01-29 2014-06-04 カーネギー インスチチューション オブ ワシントン 単結晶cvdダイヤモンドの新規なレーザー用途
JP5223201B2 (ja) * 2007-01-29 2013-06-26 日本電気株式会社 電界効果トランジスタ
JP5504565B2 (ja) * 2008-02-07 2014-05-28 独立行政法人物質・材料研究機構 ダイヤモンド紫外線センサー素子とその製造方法、並びに紫外線センサー装置
WO2009114130A2 (en) * 2008-03-13 2009-09-17 Michigan State University Process and apparatus for diamond synthesis
US20090260396A1 (en) * 2008-04-16 2009-10-22 Eitan Broukman Methods for processing ornamental diamonds and corresponding ornamental diamonds
US8342164B2 (en) * 2008-05-09 2013-01-01 SCIO Diamond Technology Corporation Gemstone production from CVD diamond plate
GB0813491D0 (en) * 2008-07-23 2008-08-27 Element Six Ltd Diamond Material
GB0813490D0 (en) 2008-07-23 2008-08-27 Element Six Ltd Solid state material
GB0819001D0 (en) 2008-10-16 2008-11-26 Diamond Detectors Ltd Contacts on diamond
US9017632B2 (en) 2009-06-26 2015-04-28 Element Six Technologies Limited Diamond material
JP5874932B2 (ja) * 2009-06-26 2016-03-02 エレメント シックス リミテッド ダイヤモンド材料の処理方法及び得られた製品
KR101130049B1 (ko) * 2009-09-08 2012-03-28 김일천 다이아몬드상 카본 박막 코팅 피스톤 및 그 제조방법
GB201000768D0 (en) * 2010-01-18 2010-03-03 Element Six Ltd CVD single crystal diamond material
US9017633B2 (en) 2010-01-18 2015-04-28 Element Six Technologies Limited CVD single crystal diamond material
JP2013532109A (ja) * 2010-05-17 2013-08-15 カーネギー インスチチューション オブ ワシントン 大形、高純度、単結晶のcvdダイヤモンドの生成
GB201013112D0 (en) 2010-08-04 2010-09-22 Element Six Ltd A diamond optical element
US9277792B2 (en) * 2010-08-24 2016-03-08 Board Of Trustees Of Michigan State University Multicolored single crystal diamond gemstones and methods for forming the same
GB201015260D0 (en) 2010-09-14 2010-10-27 Element Six Ltd A microfluidic cell and a spin resonance device for use therewith
GB201021985D0 (en) 2010-12-24 2011-02-02 Element Six Ltd Dislocation engineering in single crystal synthetic diamond material
GB201104579D0 (en) * 2011-03-18 2011-05-04 Element Six Ltd Diamond based electrochemical sensors
GB201107730D0 (en) 2011-05-10 2011-06-22 Element Six Ltd Diamond sensors, detectors and quantum devices
US20130026492A1 (en) * 2011-07-30 2013-01-31 Akhan Technologies Inc. Diamond Semiconductor System and Method
GB201121642D0 (en) 2011-12-16 2012-01-25 Element Six Ltd Single crtstal cvd synthetic diamond material
US8969833B1 (en) 2011-12-16 2015-03-03 Us Synthetic Corporation Method and system for perceiving a boundary between a first region and a second region of a superabrasive volume
US8933462B2 (en) * 2011-12-21 2015-01-13 Akhan Semiconductor, Inc. Method of fabricating diamond semiconductor and diamond semiconductor formed according to the method
US20130175546A1 (en) * 2012-01-06 2013-07-11 Akhan Technologies, Inc. Diamond Semiconductor System and Method
GB201216697D0 (en) * 2012-09-19 2012-10-31 Element Six Ltd Single crystal chemical vapour deposited synthetic diamond materials having uniform colour
CN103305807B (zh) * 2013-05-07 2015-06-24 大连理工大学 一种制备氮掺杂纳米金刚石的方法及其电催化应用
GB201320304D0 (en) * 2013-11-18 2014-01-01 Element Six Ltd Methods of fabricating synthetic diamond materials using microwave plasma actived chemical vapour deposition techniques and products obtained using said
CN106574393B (zh) 2014-07-22 2019-10-08 住友电气工业株式会社 单晶金刚石及其制造方法、包含单晶金刚石的工具和包含单晶金刚石的部件
CN106661758A (zh) 2014-08-08 2017-05-10 住友电气工业株式会社 制造金刚石的方法、金刚石、金刚石复合基板、金刚石接合基板和工具
SG10201505413VA (en) * 2015-01-14 2016-08-30 Iia Technologies Pte Ltd Electronic device grade single crystal diamonds and method of producing the same
DK3045570T3 (da) 2015-01-14 2019-08-26 Iia Tech Pte Ltd Enkeltkrystaldiamanter af en kvalitet til elektroniske indretninger og fremgangsmåde til fremstilling deraf
CN104911702B (zh) * 2015-04-29 2017-07-28 西安交通大学 基于自组装工艺的高质量单晶金刚石生长方法
GB201516814D0 (en) 2015-09-23 2015-11-04 Element Six Technologies Ltd Method of fabricating a plurality of single crystal CVD synthetic diamonds
SG11201805526PA (en) 2016-01-22 2018-08-30 Sumitomo Electric Industries Single-crystal diamond, method for manufacturing single-crystal diamond, and chemical vapor deposition device used in same
GB201610053D0 (en) * 2016-06-09 2016-07-27 Element Six Tech Ltd Synthetic diamond heat spreaders
US9922823B1 (en) * 2016-09-07 2018-03-20 Euclid Techlabs, Llc CVD reactor and method for nanometric delta doping of diamond
GB201620413D0 (en) 2016-12-01 2017-01-18 Element Six Tech Ltd Single crystal synthetic diamond material via chemical vapour deposition
ES2724214B2 (es) 2018-03-01 2020-01-15 Business Res And Diamonds S L Procedimiento para la obtencion de diamantes sinteticos a partir de la sacarosa y equipo para llevar a cabo dicho procedimiento
GB201904435D0 (en) 2019-03-29 2019-05-15 Element Six Tech Ltd Single crystal synthetic diamond material
CN109911894A (zh) * 2019-03-31 2019-06-21 河北地质大学 微波等离子体化学气相沉积法生长多晶金刚石片的方法
GB202003310D0 (en) * 2020-03-06 2020-04-22 Element Six Tech Ltd Method for forming diamond product
US11185139B1 (en) 2021-03-04 2021-11-30 Oujie Kevin Tong Coating compositions and method for jewelries
GB2614521A (en) 2021-10-19 2023-07-12 Element Six Tech Ltd CVD single crystal diamond
GB2614068B (en) 2021-12-21 2024-05-22 Element Six Tech Ltd Sensor device
GB2614530B (en) 2021-12-23 2024-12-11 Element Six Tech Ltd Diamond sensor
CN114941173B (zh) * 2022-05-26 2023-10-10 曲阜师范大学 一种高相干金刚石氮空穴及金刚石压砧的制备与应用
GB202219497D0 (en) 2022-12-22 2023-02-08 Element Six Tech Ltd Single crystal diamond
GB202305972D0 (en) 2023-04-24 2023-06-07 Element Six Tech Ltd Method of manufacturing single crystal diamonds
GB2630986A (en) 2023-06-16 2024-12-18 Element Six Tech Ltd Single crystal diamond product

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US246762A (en) * 1881-09-06 Preserving wood
US248810A (en) * 1881-10-25 Ttorney
US2317176A (en) * 1941-05-14 1943-04-20 Marie A Byrd Container bag and outer garment
JP2571795B2 (ja) 1987-11-17 1997-01-16 住友電気工業株式会社 紫色ダイヤモンドおよびその製造方法
JP2691219B2 (ja) 1988-10-17 1997-12-17 並木精密宝石株式会社 ダイヤモンドの合成法
JP2730144B2 (ja) * 1989-03-07 1998-03-25 住友電気工業株式会社 単結晶ダイヤモンド層形成法
JP2730145B2 (ja) * 1989-03-07 1998-03-25 住友電気工業株式会社 単結晶ダイヤモンド層の形成法
US6007916A (en) * 1989-04-06 1999-12-28 Sumitomo Electric Industries, Ltd. Synthetic single crystal diamond for wiring drawing dies and process for producing the same
US5127983A (en) * 1989-05-22 1992-07-07 Sumitomo Electric Industries, Ltd. Method of producing single crystal of high-pressure phase material
AU634601B2 (en) * 1989-12-11 1993-02-25 General Electric Company Single-crystal diamond of very high thermal conductivity
US5360479A (en) * 1990-07-02 1994-11-01 General Electric Company Isotopically pure single crystal epitaxial diamond films and their preparation
US5704976A (en) * 1990-07-06 1998-01-06 The United States Of America As Represented By The Secretary Of The Navy High temperature, high rate, epitaxial synthesis of diamond in a laminar plasma
CA2049673A1 (en) * 1990-11-26 1992-05-27 James F. Fleischer Cvd diamond by alternating chemical reactions
JPH04305096A (ja) * 1991-04-01 1992-10-28 Sumitomo Electric Ind Ltd 高品質気相合成ダイヤモンドの低温形成法
US5614019A (en) * 1992-06-08 1997-03-25 Air Products And Chemicals, Inc. Method for the growth of industrial crystals
US5443032A (en) 1992-06-08 1995-08-22 Air Products And Chemicals, Inc. Method for the manufacture of large single crystals
EP0582397A3 (de) * 1992-08-05 1995-01-25 Crystallume CVD-Diamant-Material für einen Strahlungsdetektor und Herstellungsverfahren.
US5334283A (en) * 1992-08-31 1994-08-02 The University Of North Carolina At Chapel Hill Process for selectively etching diamond
US5474021A (en) 1992-09-24 1995-12-12 Sumitomo Electric Industries, Ltd. Epitaxial growth of diamond from vapor phase
JPH06107494A (ja) 1992-09-24 1994-04-19 Sumitomo Electric Ind Ltd ダイヤモンドの気相成長法
JP3314444B2 (ja) 1993-03-15 2002-08-12 住友電気工業株式会社 赤色ダイヤモンドおよび桃色ダイヤモンド
CA2127832C (en) * 1993-07-20 2001-02-20 Grant Lu Cvd diamond radiation detector
US5390409A (en) * 1993-08-27 1995-02-21 General Electric Co. Methods of manufacturing of generator stator frames
CN1087132A (zh) * 1993-09-03 1994-05-25 国家建筑材料工业局人工晶体研究所 用于拉丝模的金刚石膜及其制法
JP3484749B2 (ja) 1994-04-04 2004-01-06 住友電気工業株式会社 ダイヤモンドの合成法
EP0688026A1 (de) 1994-06-17 1995-12-20 General Electric Company Widerstand auf einem Substrat aus Diamant
US5587210A (en) * 1994-06-28 1996-12-24 The United States Of America As Represented By The Secretary Of The Navy Growing and releasing diamonds
JP4291886B2 (ja) 1994-12-05 2009-07-08 住友電気工業株式会社 低欠陥ダイヤモンド単結晶及びその合成方法
JP3675577B2 (ja) * 1995-07-05 2005-07-27 日本特殊陶業株式会社 ダイヤモンド被覆物品の製造方法
GB9616043D0 (en) * 1996-07-31 1996-09-11 De Beers Ind Diamond Diamond
JP4032482B2 (ja) 1997-04-18 2008-01-16 住友電気工業株式会社 単結晶ダイヤモンドの製造方法
JPH11107596A (ja) 1997-10-07 1999-04-20 Osamu Ito 地震揺れを検知して作動する自動解錠装置
JP3125046B2 (ja) * 1997-11-21 2001-01-15 工業技術院長 ダイヤモンド単結晶薄膜製造方法
US6582513B1 (en) * 1998-05-15 2003-06-24 Apollo Diamond, Inc. System and method for producing synthetic diamond
DE60135653D1 (de) * 2000-06-15 2008-10-16 Element Six Pty Ltd Einkristalldiamant hergestellt durch cvd
GB0130005D0 (en) 2001-12-14 2002-02-06 Diamanx Products Ltd Boron doped diamond
GB0130004D0 (en) 2001-12-14 2002-02-06 Diamanx Products Ltd Coloured diamond
RU2328563C2 (ru) 2002-09-06 2008-07-10 Элемент Сикс Лимитед Цветные алмазы
GB0221949D0 (en) 2002-09-20 2002-10-30 Diamanx Products Ltd Single crystal diamond
GB0227261D0 (en) 2002-11-21 2002-12-31 Element Six Ltd Optical quality diamond material

Also Published As

Publication number Publication date
AU6624601A (en) 2001-12-24
EP1632590A3 (de) 2006-05-24
KR20030036226A (ko) 2003-05-09
US7887628B2 (en) 2011-02-15
GB2379451B (en) 2004-05-05
JP4469552B2 (ja) 2010-05-26
ES2252244T3 (es) 2006-05-16
EP1290251A1 (de) 2003-03-12
CN1210445C (zh) 2005-07-13
CA2412855A1 (en) 2001-12-20
GB2379451A (en) 2003-03-12
DE60115435D1 (de) 2006-01-05
CA2412855C (en) 2009-10-20
WO2001096634A1 (en) 2001-12-20
IL153381A (en) 2006-12-10
HK1057584A1 (en) 2004-04-08
EP1632590A2 (de) 2006-03-08
US20070148079A1 (en) 2007-06-28
KR100839707B1 (ko) 2008-06-19
US7128974B2 (en) 2006-10-31
JP2004503461A (ja) 2004-02-05
EP1632590B1 (de) 2017-01-11
RU2287028C2 (ru) 2006-11-10
EP1290251B8 (de) 2006-02-01
CZ302229B6 (cs) 2011-01-05
TWI250231B (en) 2006-03-01
CZ20024228A3 (cs) 2003-12-17
DE60115435T2 (de) 2006-08-31
US20080044339A1 (en) 2008-02-21
AU2001266246B2 (en) 2004-10-07
CN1441859A (zh) 2003-09-10
GB0300200D0 (en) 2003-02-05
EP1290251B1 (de) 2005-11-30
IL153381A0 (en) 2003-07-06
US20040182308A1 (en) 2004-09-23

Similar Documents

Publication Publication Date Title
ATE311486T1 (de) Dicke einkristalline diamantschicht, verfahren zur herstellung der schicht und edelsteine hergestellt durch bearbeitung der schicht
DE69432784D1 (de) Verfahren zur Herstellung eines Halbleitersubstrats
JP3875821B2 (ja) GaN膜の製造方法
ATE353108T1 (de) Bordotierte diamant und verfahren zu ihrer herstellung
MY115099A (en) Process for producing silicon semiconductor wafers with low defect density
EP0661754A3 (de) Substrat, das eine dünne Schicht aus ferroelektrische Kristall enthält, Verfahren zur Herstellung und Anordnung mit Verwendung dieses Substrates.
EP0845803A4 (de) SiC-BAUELEMENT UND VERFAHREN ZU SEINER HERSTELLUNG
EP1363322A3 (de) GaN-einkristallines Substrat, epitaktisches Nitrid-Typ-Halbleitersubstrat, Nitrid-Typ-Halbleitervorrichtung und Verfahren zu deren Herstellung
DE69432642D1 (de) Diamantbeschichtete werkzeuge und verfahren zur herstellung
KR960030319A (ko) 정확하게 사전결정된 깊이의 미세결함이 없는 층을 가지는 측정 웨이퍼 제조방법
ATE373121T1 (de) Verfahren zur herstellung einer epitaktischen schicht
ATE528421T1 (de) Verfahren zur herstellung von gruppe-iii- metallnitrid-materialien
DE69711344D1 (de) Verfahren zur Züchtung von Schichten aus III-V Nitrid Halbleiterverbindungen und Verfahren zur Herstellung von Substraten aus III-V Nitrid Halbleiterverbindungen
DE3872859D1 (de) Verfahren zur metallisierung eines kieselsaeure-, quartz-, glas- oder saphirsubstrates und so erhaltenes substrat.
DE3875515D1 (de) Substrat und verfahren zur herstellung eines substrates.
DE69833610D1 (de) Verfahren und Vorrichtung zur Herstellung von Silicium Einkristallen mit verringerten Kristalldefekten und danach hergestellte Silicium Einkristall und Siliciumwafer
ATE357740T1 (de) Verfahren zur herstellung von substraten und dadurch hergestellte substrate
ATE282011T1 (de) Verfahren zur herstellung eines substrats aus synthetischem quarzglas für eine photomaske
EP0969505A3 (de) SOI Substrat
DE69904675D1 (de) Verfahren zur Herstellung eines Stickstoff- dotierten Siliciumeinkristalles mit geringer Defektdichte
GB2372635B (en) Method of fabricating group-III nitride semiconductor crystals.
Stiegler et al. The effect of nitrogen on low temperature growth of diamond films
EP1293592A3 (de) Halbleitersubstrat aus Silizium und Verfahren zu ihrer Herstellung
ATE271100T1 (de) Zusammensetzung und verfahren zur herstellung von substraten durch pulverformverfahren und damit hergestellte substrate
DE69404347D1 (de) Polykristallines Substrat aus Diamant sowie Verfahren zur dessen Herstellung

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties