ATE305768T1 - Verwendung von dispergierbarer dichter fällungskieselsäure mit hoher struktur als verdickungsmittel und textursmittel in zahnpflegemitteln - Google Patents

Verwendung von dispergierbarer dichter fällungskieselsäure mit hoher struktur als verdickungsmittel und textursmittel in zahnpflegemitteln

Info

Publication number
ATE305768T1
ATE305768T1 AT01943571T AT01943571T ATE305768T1 AT E305768 T1 ATE305768 T1 AT E305768T1 AT 01943571 T AT01943571 T AT 01943571T AT 01943571 T AT01943571 T AT 01943571T AT E305768 T1 ATE305768 T1 AT E305768T1
Authority
AT
Austria
Prior art keywords
precipitated silica
texturizer
thickener
care products
dental care
Prior art date
Application number
AT01943571T
Other languages
English (en)
Inventor
Adrien Dromard
Pierre-Yves Lahary
Celine Marcandelli
Original Assignee
Rhodia Chimie Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhodia Chimie Sa filed Critical Rhodia Chimie Sa
Application granted granted Critical
Publication of ATE305768T1 publication Critical patent/ATE305768T1/de

Links

Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q11/00—Preparations for care of the teeth, of the oral cavity or of dentures; Dentifrices, e.g. toothpastes; Mouth rinses
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
    • A61K8/25—Silicon; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/11—Powder tap density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/19—Oil-absorption capacity, e.g. DBP values
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/90—Other properties not specified above

Landscapes

  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Birds (AREA)
  • Epidemiology (AREA)
  • Cosmetics (AREA)
  • Silicon Compounds (AREA)
  • Dental Preparations (AREA)
AT01943571T 2000-06-07 2001-06-06 Verwendung von dispergierbarer dichter fällungskieselsäure mit hoher struktur als verdickungsmittel und textursmittel in zahnpflegemitteln ATE305768T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0007288A FR2809955B1 (fr) 2000-06-07 2000-06-07 Utilisation d'une silice de precipitation de haute structure, dense et dispersible comme agent epaississant ou texturant dans les compositions dentifrices
PCT/FR2001/001742 WO2001093803A2 (fr) 2000-06-07 2001-06-06 Utilisation d'une silice de precipitation de haute structure et dispersible comme agent epaississant ou texturant dans les compositions dentifrices

Publications (1)

Publication Number Publication Date
ATE305768T1 true ATE305768T1 (de) 2005-10-15

Family

ID=8851043

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01943571T ATE305768T1 (de) 2000-06-07 2001-06-06 Verwendung von dispergierbarer dichter fällungskieselsäure mit hoher struktur als verdickungsmittel und textursmittel in zahnpflegemitteln

Country Status (12)

Country Link
US (1) US7033576B2 (de)
EP (1) EP1286648B1 (de)
JP (1) JP3993822B2 (de)
CN (1) CN1208042C (de)
AT (1) ATE305768T1 (de)
AU (1) AU2001266117A1 (de)
BR (1) BR0111449B1 (de)
DE (1) DE60113833T2 (de)
ES (1) ES2245987T3 (de)
FR (1) FR2809955B1 (de)
MX (1) MXPA02011784A (de)
WO (1) WO2001093803A2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2833937B1 (fr) * 2001-12-26 2004-11-12 Rhodia Chimie Sa Silices a faible reprise en eau
FR2864063B1 (fr) * 2003-12-19 2006-04-07 Rhodia Chimie Sa Silice de haute structure a faible reprise en eau
CN102530970B (zh) * 2012-03-01 2014-02-19 冷水江三A化工有限责任公司 一种牙膏摩擦剂二氧化硅的制备方法
WO2013191226A1 (ja) * 2012-06-20 2013-12-27 花王株式会社 歯磨剤用顆粒の製造方法
CN103274422B (zh) * 2013-05-31 2016-03-30 肇庆金三江硅材料有限公司 核壳型沉淀二氧化硅、制备方法及含有该二氧化硅的牙膏
JP6682872B2 (ja) * 2016-01-20 2020-04-15 日油株式会社 口腔用シリカ分散安定化剤およびこれを含有する歯磨剤組成物
CN106185956B (zh) * 2016-07-12 2017-12-12 通化双龙硅材料科技有限公司 一种牙膏用沉淀法二氧化硅增稠剂的制备方法
US10555884B2 (en) 2017-06-30 2020-02-11 The Procter & Gamble Company 2-pyridinol-N-oxide deodorant and antiperspirant compositions
US10905647B2 (en) 2017-06-30 2021-02-02 The Procter & Gamble Company Antiperspirant and deodorant compositions
US10543164B2 (en) 2017-06-30 2020-01-28 The Procter & Gamble Company Deodorant compositions
US11529299B2 (en) 2017-06-30 2022-12-20 The Procter & Gamble Company Hair care compositions comprising a 2-pyridinol-n-oxide material and an iron chelator
CN107720763B (zh) * 2017-11-21 2019-09-20 广州市飞雪材料科技有限公司 一种高分散二氧化硅的制备方法
CN109231221B (zh) * 2018-10-16 2019-06-28 肇庆金三江硅材料有限公司 一种低比表面积高分散性增稠型二氧化硅及其制备方法
CN109607555B (zh) * 2019-01-02 2019-08-09 广州市飞雪材料科技有限公司 一种高磨擦高透明牙膏用二氧化硅及其制备方法
CA3138558C (en) 2020-11-16 2024-01-30 Church & Dwight Co., Inc. Teeth cleaning composition comprising banana extract

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS601115A (ja) * 1983-06-16 1985-01-07 Central Glass Co Ltd 透明歯磨用非晶質シリカおよびその製造方法
JPS6287507A (ja) * 1985-10-11 1987-04-22 Fuji Debuison Kagaku Kk 歯磨剤
FR2631620B1 (fr) * 1988-05-19 1990-07-27 Rhone Poulenc Chimie Nouvelle silice precipitee absorbante et composition a base de cette s ilice
US5234673A (en) * 1990-02-20 1993-08-10 J. M. Huber Corporation Low temperature-very high structure silica and methods
EP0643015B1 (de) * 1993-08-07 1996-09-18 Degussa Aktiengesellschaft Verfahren zur Herstellung einer Fällungskieselsäure
US5647903A (en) * 1995-10-03 1997-07-15 Mcgill; Patrick D. Microporous high structure precipitated silicas and methods
FR2749576B1 (fr) * 1996-06-06 1998-09-04 Rhone Poulenc Chimie Procede de preparation de silice susceptible d'etre utilisee dans les compositions dentifrices
EP1049649B1 (de) * 1998-01-20 2003-05-14 Rhodia Chimie Kieselsaüremikrokugeln mit sensorischen eigenschaften im mund , verfahren zu ihrer herstellung und zahnpasten die sie enthalten
US6573032B1 (en) * 1999-04-22 2003-06-03 J. M. Huber Corporation Very high structure, highly absorptive hybrid silica and method for making same

Also Published As

Publication number Publication date
AU2001266117A1 (en) 2001-12-17
ES2245987T3 (es) 2006-02-01
US7033576B2 (en) 2006-04-25
CN1434700A (zh) 2003-08-06
EP1286648A2 (de) 2003-03-05
DE60113833T2 (de) 2006-03-30
EP1286648B1 (de) 2005-10-05
US20030147816A1 (en) 2003-08-07
DE60113833D1 (de) 2006-02-16
CN1208042C (zh) 2005-06-29
FR2809955B1 (fr) 2004-11-26
WO2001093803A2 (fr) 2001-12-13
WO2001093803A3 (fr) 2002-03-14
BR0111449B1 (pt) 2013-06-18
JP3993822B2 (ja) 2007-10-17
MXPA02011784A (es) 2003-04-10
JP2004501119A (ja) 2004-01-15
BR0111449A (pt) 2003-06-17
FR2809955A1 (fr) 2001-12-14

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