TW200505794A - Fibrous titanium oxide particles, production method thereof and uses of particles - Google Patents

Fibrous titanium oxide particles, production method thereof and uses of particles

Info

Publication number
TW200505794A
TW200505794A TW093122862A TW93122862A TW200505794A TW 200505794 A TW200505794 A TW 200505794A TW 093122862 A TW093122862 A TW 093122862A TW 93122862 A TW93122862 A TW 93122862A TW 200505794 A TW200505794 A TW 200505794A
Authority
TW
Taiwan
Prior art keywords
titanium oxide
particles
oxide particles
fibrous
fibrous titanium
Prior art date
Application number
TW093122862A
Other languages
Chinese (zh)
Other versions
TWI344448B (en
Inventor
Tsuguo Koyanagi
Katsuhiro Shirono
Atsushi Tanaka
Original Assignee
Catalysts & Chem Ind Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Catalysts & Chem Ind Co filed Critical Catalysts & Chem Ind Co
Publication of TW200505794A publication Critical patent/TW200505794A/en
Application granted granted Critical
Publication of TWI344448B publication Critical patent/TWI344448B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/063—Titanium; Oxides or hydroxides thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/50—Catalysts, in general, characterised by their form or physical properties characterised by their shape or configuration
    • B01J35/58—Fabrics or filaments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J6/00—Heat treatments such as Calcining; Fusing ; Pyrolysis
    • B01J6/001—Calcining
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264—Inorganic materials
    • H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Geology (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Catalysts (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)

Abstract

A method is provided whereby fibrous titanium oxide particles are efficiently produced which have excellent film-forming properties, adhesion, film hardness, mechanical strength and abrasion resistance as well as high transparency and refractive index. Fibrous titanium oxide particles of the invention have an average minor axis width (W) from 5 to 40 nm, an average major axis length (L) from 25 to 1000 nm, and an average aspect ratio (L/W) from 5 to 200. The method for producing fibrous titanium oxide particles comprises hydrothermal treatment of a sol of water-dispersed titanium oxide-based particles comprising titanium oxide or a complex of titanium oxide and another kind of oxide in the presence of an alkali to prepare tubular titanium oxide particles; washing the tubular titanium oxide particles, followed by drying; and calcining the particles at temperatures of 350 to 900 DEG C.
TW093122862A 2003-08-01 2004-07-30 Fibrous titanium oxide particles, production method thereof and uses of particles TWI344448B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003285092 2003-08-01

Publications (2)

Publication Number Publication Date
TW200505794A true TW200505794A (en) 2005-02-16
TWI344448B TWI344448B (en) 2011-07-01

Family

ID=34402650

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093122862A TWI344448B (en) 2003-08-01 2004-07-30 Fibrous titanium oxide particles, production method thereof and uses of particles

Country Status (3)

Country Link
KR (1) KR101144676B1 (en)
AU (1) AU2004203522B2 (en)
TW (1) TWI344448B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI382961B (en) * 2005-06-29 2013-01-21 Nissan Chemical Ind Ltd Production process of alkaline zirconia sol

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9463436B2 (en) 2011-05-24 2016-10-11 Shin-Etsu Chemical Co., Ltd. Method for manufacturing microparticulate anatase or rutile titanium oxide dispersion and component having photocatalytic thin film on surface
WO2020138431A1 (en) * 2018-12-27 2020-07-02 花王株式会社 External preparation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6027775A (en) * 1996-09-30 2000-02-22 Chubu Electric Power Co., Inc. Crystalline titania and process for producing the same
JP3513738B2 (en) * 1996-09-30 2004-03-31 中部電力株式会社 Method for producing titania from nanotubes
US6538194B1 (en) * 1998-05-29 2003-03-25 Catalysts & Chemicals Industries Co., Ltd. Photoelectric cell and process for producing metal oxide semiconductor film for use in photoelectric cell
JP2003055841A (en) * 2001-08-10 2003-02-26 Sumitomo Chem Co Ltd Titanium oxide fiber and photocatalyst body using the same
AU2002344596B2 (en) * 2001-10-30 2006-07-27 Catalysts & Chemicals Industries Co., Ltd. Tubular titanium oxide particles, method for preparing the same, and use of the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI382961B (en) * 2005-06-29 2013-01-21 Nissan Chemical Ind Ltd Production process of alkaline zirconia sol

Also Published As

Publication number Publication date
AU2004203522A1 (en) 2005-02-17
KR101144676B1 (en) 2012-05-24
AU2004203522B2 (en) 2009-01-08
TWI344448B (en) 2011-07-01
KR20040077593A (en) 2004-09-04

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees