ATE226738T1 - Photo-empfindliche lithographische platte und verfahren zu ihrer herstellung - Google Patents

Photo-empfindliche lithographische platte und verfahren zu ihrer herstellung

Info

Publication number
ATE226738T1
ATE226738T1 AT98110319T AT98110319T ATE226738T1 AT E226738 T1 ATE226738 T1 AT E226738T1 AT 98110319 T AT98110319 T AT 98110319T AT 98110319 T AT98110319 T AT 98110319T AT E226738 T1 ATE226738 T1 AT E226738T1
Authority
AT
Austria
Prior art keywords
lithographic plate
photo
producing
same
photosensitive
Prior art date
Application number
AT98110319T
Other languages
English (en)
Inventor
Yasuhito Naruse
Kenji Shinoda
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of ATE226738T1 publication Critical patent/ATE226738T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/10—Bases for charge-receiving or other layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material
AT98110319T 1997-06-06 1998-06-05 Photo-empfindliche lithographische platte und verfahren zu ihrer herstellung ATE226738T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP16535697 1997-06-06
JP09672098A JP3830270B2 (ja) 1997-06-06 1998-03-25 感光性平版印刷版とその製造方法

Publications (1)

Publication Number Publication Date
ATE226738T1 true ATE226738T1 (de) 2002-11-15

Family

ID=26437895

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98110319T ATE226738T1 (de) 1997-06-06 1998-06-05 Photo-empfindliche lithographische platte und verfahren zu ihrer herstellung

Country Status (5)

Country Link
US (1) US6110642A (de)
EP (1) EP0883028B1 (de)
JP (1) JP3830270B2 (de)
AT (1) ATE226738T1 (de)
DE (1) DE69808842T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000029204A (ja) * 1998-07-14 2000-01-28 Fuji Photo Film Co Ltd 記録材料及びそのマット化方法
DE10063591A1 (de) 2000-12-20 2002-07-11 Agfa Gevaert Nv Strahlungsempfindliches Aufzeichnungsmaterial mit strukturierter Rückseite
DE10110728A1 (de) 2001-03-06 2002-10-02 Agfa Gevaert Nv Strahlungsempfindliches Aufzeichnungsmaterial mit elektrisch leitfähiger Rückseitenbeschichtung
EP1963920B1 (de) * 2005-12-21 2012-05-16 FUJIFILM Corporation Lichtempfindliche blätter und verfahren und vorrichtung zu ihrer herstellung
US20090202938A1 (en) * 2008-02-08 2009-08-13 Celin Savariar-Hauck Method of improving surface abrasion resistance of imageable elements
WO2010071956A1 (en) * 2008-12-22 2010-07-01 Canadian Bank Note Company, Limited Improved printing of tactile marks for the visually impaired
EP3011392B1 (de) * 2013-06-18 2019-03-13 Agfa Nv Verfahren zur herstellung eines lithographiedruckformvorläufers mit einer strukturierten rückschicht
CN109843596B (zh) * 2017-03-31 2020-05-05 富士胶片株式会社 平版印刷版原版及其制造方法、平版印刷版原版层叠体以及平版印刷方法
JP7098388B2 (ja) * 2017-04-28 2022-07-11 キヤノン株式会社 液状シリコーンゴム混合物、及び電子写真用部材の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51111102A (en) * 1975-03-24 1976-10-01 Fuji Photo Film Co Ltd Photosensitive printing plates
JPS5611944B2 (de) * 1975-02-19 1981-03-18
JPS53134502A (en) * 1977-04-28 1978-11-24 Okamoto Kagaku Kogyo Kk Method of producing offset lithographic aluminum support
JPS5512974A (en) * 1978-07-15 1980-01-29 Konishiroku Photo Ind Co Ltd Photosensitive printing plate
JPS58137469A (ja) * 1982-02-10 1983-08-15 Fuji Photo Film Co Ltd 記録材料のマツト化方法
JPS58182636A (ja) * 1982-04-20 1983-10-25 Fuji Photo Film Co Ltd 感光性印刷版
JP2565306B2 (ja) * 1985-03-01 1996-12-18 東京応化工業 株式会社 感光性印刷版梱包体
JPH0719054B2 (ja) * 1985-03-19 1995-03-06 富士写真フイルム株式会社 画像形成材料
JPS63253941A (ja) * 1987-04-10 1988-10-20 Fuji Photo Film Co Ltd 画像形成材料
JPH07132688A (ja) * 1993-11-09 1995-05-23 Fuji Photo Film Co Ltd 平版印刷版用アルミニウム合金基材

Also Published As

Publication number Publication date
DE69808842D1 (de) 2002-11-28
US6110642A (en) 2000-08-29
DE69808842T2 (de) 2003-02-27
EP0883028B1 (de) 2002-10-23
EP0883028A1 (de) 1998-12-09
JPH1152559A (ja) 1999-02-26
JP3830270B2 (ja) 2006-10-04

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Legal Events

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