ATE169692T1 - Batchladesystem für cvd - Google Patents

Batchladesystem für cvd

Info

Publication number
ATE169692T1
ATE169692T1 AT95913951T AT95913951T ATE169692T1 AT E169692 T1 ATE169692 T1 AT E169692T1 AT 95913951 T AT95913951 T AT 95913951T AT 95913951 T AT95913951 T AT 95913951T AT E169692 T1 ATE169692 T1 AT E169692T1
Authority
AT
Austria
Prior art keywords
coating
cvd
insert
inserts
batchloading
Prior art date
Application number
AT95913951T
Other languages
English (en)
Inventor
Tor Norrgrann
Kjell Palsson
Bjoern Ljungberg
Ingemar Hessman
Original Assignee
Sandvik Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sandvik Ab filed Critical Sandvik Ab
Application granted granted Critical
Publication of ATE169692T1 publication Critical patent/ATE169692T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Turning (AREA)
AT95913951T 1994-03-18 1995-03-17 Batchladesystem für cvd ATE169692T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9400950A SE509984C2 (sv) 1994-03-18 1994-03-18 Chargeringssystem för CVD

Publications (1)

Publication Number Publication Date
ATE169692T1 true ATE169692T1 (de) 1998-08-15

Family

ID=20393359

Family Applications (1)

Application Number Title Priority Date Filing Date
AT95913951T ATE169692T1 (de) 1994-03-18 1995-03-17 Batchladesystem für cvd

Country Status (8)

Country Link
US (2) US5576058A (de)
EP (1) EP0750688B1 (de)
JP (1) JP3742831B2 (de)
AT (1) ATE169692T1 (de)
DE (1) DE69504045T2 (de)
IL (1) IL113015A (de)
SE (1) SE509984C2 (de)
WO (1) WO1995025829A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE509984C2 (sv) * 1994-03-18 1999-03-29 Sandvik Ab Chargeringssystem för CVD
EP0992605A3 (de) * 1998-10-02 2002-11-13 Sumitomo Special Metals Co., Ltd. Tragelement, Haltevorrichtung, Prozess und Apparat im Anwendungsbereich der Oberflächenbehandlung
SE514666C2 (sv) 1999-07-05 2001-04-02 Sandvik Ab Metod för fixering av skär vid PVD-beläggning
FR2819047B1 (fr) * 2000-12-28 2003-06-27 Snecma Moteurs Support approprie pour le traitement thermique d'une piece metallique et procede de traitement thermique
SE527351C2 (sv) * 2003-07-10 2006-02-14 Seco Tools Ab Metod att belägga skär
JP2007518878A (ja) * 2003-12-22 2007-07-12 セコ ツールズ アクティエボラーグ 切削工具を被覆するための支持物体とその方法
WO2006076924A1 (en) * 2005-01-24 2006-07-27 Danfoss A/S A method for coating an object
US7662437B2 (en) * 2005-03-24 2010-02-16 Honeywell International Inc. Template for arranging spacers on a preform and method of densifying a preform including the use of spacers positioned by a template
US7874770B2 (en) † 2005-03-30 2011-01-25 Sumitomo Electric Hardmetal Corp. Indexable insert
JP4931507B2 (ja) * 2005-07-26 2012-05-16 スネクマ 壁内に形成された冷却流路
CN102534565B (zh) * 2012-03-22 2013-07-03 株洲欧科亿硬质合金有限公司 一种涂层刀片生产用装载舟皿及其应用
CN103726031A (zh) * 2013-12-24 2014-04-16 成都工具研究所有限公司 化学气相沉积设备的工件装卡工具
JP6337107B2 (ja) * 2014-05-28 2018-06-06 京セラ株式会社 切削インサートの製造方法
DE102016211775A1 (de) * 2016-06-29 2018-01-04 Schunk Kohlenstofftechnik Gmbh Werkstückträger und Verfahren zur Herstellung eines Werkstückträgers
KR102040378B1 (ko) * 2016-12-20 2019-11-05 주식회사 티씨케이 지그를 이용한 반도체 제조용 부품의 제조방법 및 제조장치
WO2018117558A1 (ko) * 2016-12-20 2018-06-28 주식회사 티씨케이 지그를 이용한 반도체 제조용 부품의 제조방법 및 제조장치
WO2018117559A1 (ko) * 2016-12-20 2018-06-28 주식회사 티씨케이 Sic 증착층을 포함하는 반도체 제조용 부품 및 그 제조방법
KR102051668B1 (ko) * 2016-12-20 2019-12-04 주식회사 티씨케이 SiC 증착층을 포함하는 반도체 제조용 부품 및 그 제조방법
US20200255941A1 (en) * 2019-02-11 2020-08-13 Kennametal Inc. Supports for chemical vapor deposition coating applications
KR102642090B1 (ko) * 2021-08-24 2024-02-29 주식회사 케이엔제이 지지 소켓 및 증착층을 포함하는 부품 제조 방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3496010A (en) * 1966-10-05 1970-02-17 Texas Instruments Inc Machining silicon coating prior to vapor deposition of silicon carbide
US3964937A (en) * 1973-08-13 1976-06-22 Materials Technology Corporation Method of making a composite coating
US4558388A (en) * 1983-11-02 1985-12-10 Varian Associates, Inc. Substrate and substrate holder
JPS6333571A (ja) * 1986-07-25 1988-02-13 Nippon Telegr & Teleph Corp <Ntt> 球状物の成膜方法
DE3902532C1 (de) * 1989-01-28 1989-11-23 Krupp Widia Gmbh, 4300 Essen, De
EP0458342A1 (de) * 1990-05-25 1991-11-27 Idemitsu Petrochemical Company Limited Verfahren zur Herstellung von einem diamantfilmbeschichteten Werkstoff
US5393349A (en) * 1991-08-16 1995-02-28 Tokyo Electron Sagami Kabushiki Kaisha Semiconductor wafer processing apparatus
JP2513976B2 (ja) * 1991-12-13 1996-07-10 エイ・ティ・アンド・ティ・コーポレーション 複数の球状部品の被覆方法
SE509984C2 (sv) * 1994-03-18 1999-03-29 Sandvik Ab Chargeringssystem för CVD
US5543022A (en) * 1995-01-17 1996-08-06 Hmt Technology Corporation Disc-handling apparatus

Also Published As

Publication number Publication date
IL113015A (en) 1998-08-16
JP3742831B2 (ja) 2006-02-08
DE69504045D1 (de) 1998-09-17
IL113015A0 (en) 1995-06-29
US5576058A (en) 1996-11-19
DE69504045T2 (de) 1998-12-10
US5759621A (en) 1998-06-02
EP0750688B1 (de) 1998-08-12
WO1995025829A1 (en) 1995-09-28
JPH09510507A (ja) 1997-10-21
SE509984C2 (sv) 1999-03-29
SE9400950D0 (sv) 1994-03-18
SE9400950L (sv) 1995-09-19
EP0750688A1 (de) 1997-01-02

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Legal Events

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UEP Publication of translation of european patent specification