ATE164634T1 - Verfahren zur beschichtung einer oberfläche mit einer widerstandsfähigen schicht mittels cvd - Google Patents

Verfahren zur beschichtung einer oberfläche mit einer widerstandsfähigen schicht mittels cvd

Info

Publication number
ATE164634T1
ATE164634T1 AT93902757T AT93902757T ATE164634T1 AT E164634 T1 ATE164634 T1 AT E164634T1 AT 93902757 T AT93902757 T AT 93902757T AT 93902757 T AT93902757 T AT 93902757T AT E164634 T1 ATE164634 T1 AT E164634T1
Authority
AT
Austria
Prior art keywords
substrate
coating
accelerant
precursor
cvd
Prior art date
Application number
AT93902757T
Other languages
English (en)
Inventor
Jerome Lawrence Buchanan
Ryan Richard Dirkx
Original Assignee
Atochem North America Elf
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atochem North America Elf filed Critical Atochem North America Elf
Application granted granted Critical
Publication of ATE164634T1 publication Critical patent/ATE164634T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)
  • Surface Treatment Of Glass (AREA)
AT93902757T 1991-12-26 1992-12-23 Verfahren zur beschichtung einer oberfläche mit einer widerstandsfähigen schicht mittels cvd ATE164634T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81436791A 1991-12-26 1991-12-26

Publications (1)

Publication Number Publication Date
ATE164634T1 true ATE164634T1 (de) 1998-04-15

Family

ID=25214853

Family Applications (1)

Application Number Title Priority Date Filing Date
AT93902757T ATE164634T1 (de) 1991-12-26 1992-12-23 Verfahren zur beschichtung einer oberfläche mit einer widerstandsfähigen schicht mittels cvd

Country Status (9)

Country Link
EP (1) EP0573645B1 (de)
JP (1) JPH06505774A (de)
AT (1) ATE164634T1 (de)
CA (1) CA2104589A1 (de)
DE (1) DE69224984T2 (de)
DK (1) DK0573645T3 (de)
ES (1) ES2114034T3 (de)
GR (1) GR3026493T3 (de)
WO (1) WO1993013243A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR960015375B1 (ko) * 1994-06-08 1996-11-11 현대전자산업 주식회사 강유전체 박막 제조장치 및 그를 사용한 강유전체 박막 제조방법
DE19652633A1 (de) * 1996-09-13 1998-03-19 Euromat Gmbh Verfahren und Vorrichtung zum Innenbeschichten metallischer Bauteile
DE19730119A1 (de) * 1997-07-14 1999-01-21 Siemens Ag Verfahren zur Herstellung von Dünnfilmen aus oxidischer Keramik
US6613385B2 (en) 2001-04-23 2003-09-02 The United States Of America As Represented By The Secretary Of The Navy Highly spin-polarized chromium dioxide thin films prepared by CVD using chromyl chloride precursor

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3898672A (en) * 1972-01-28 1975-08-05 Ricoh Kk Electrosensitive recording member
US4077808A (en) * 1973-08-31 1978-03-07 Kaman Sciences Corporation Chromia-bonded refractory body devoid of vitreous and sintered bonding
DE2648373C2 (de) * 1976-10-26 1986-01-02 Robert Bosch Gmbh, 7000 Stuttgart Halbleiter für Sensoren zur Bestimmung des Gehaltes an Sauerstoff und/oder oxydierbaren Bestandteilen in Abgasen
JPS5930709A (ja) * 1982-08-13 1984-02-18 Toa Nenryo Kogyo Kk 炭素膜及び／又は炭素粒子の製造方法
US4971843A (en) * 1983-07-29 1990-11-20 Ppg Industries, Inc. Non-iridescent infrared-reflecting coated glass
JPH0618074B2 (ja) * 1984-10-25 1994-03-09 住友化学工業株式会社 磁気記録媒体
US4743506A (en) * 1984-12-28 1988-05-10 M&T Chemicals Inc. Tin oxide coated article
US4668528A (en) * 1986-04-09 1987-05-26 Massachusetts Institute Of Technology Method and apparatus for photodeposition of films on surfaces
GB8619456D0 (en) * 1986-08-08 1986-09-17 Ti Group Services Ltd Vehicle exhaust systems
US5112693A (en) * 1988-10-03 1992-05-12 Ppg Industries, Inc. Low reflectance, highly saturated colored coating for monolithic glazing
US5132165A (en) * 1990-06-19 1992-07-21 Commerical Decal, Inc. Wet printing techniques

Also Published As

Publication number Publication date
DK0573645T3 (da) 1998-10-19
CA2104589A1 (en) 1993-06-27
EP0573645B1 (de) 1998-04-01
DE69224984T2 (de) 1998-07-30
WO1993013243A1 (en) 1993-07-08
DE69224984D1 (de) 1998-05-07
GR3026493T3 (en) 1998-07-31
EP0573645A1 (de) 1993-12-15
ES2114034T3 (es) 1998-05-16
EP0573645A4 (en) 1995-11-29
JPH06505774A (ja) 1994-06-30

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
EEFA Change of the company name
REN Ceased due to non-payment of the annual fee