ATE139810T1 - Herstellung von mikrostrukturen unterschiedlicher strukturhöhe mittels röntgentiefenlithographie mit opfermetallschicht - Google Patents

Herstellung von mikrostrukturen unterschiedlicher strukturhöhe mittels röntgentiefenlithographie mit opfermetallschicht

Info

Publication number
ATE139810T1
ATE139810T1 AT93303140T AT93303140T ATE139810T1 AT E139810 T1 ATE139810 T1 AT E139810T1 AT 93303140 T AT93303140 T AT 93303140T AT 93303140 T AT93303140 T AT 93303140T AT E139810 T1 ATE139810 T1 AT E139810T1
Authority
AT
Austria
Prior art keywords
metal
primary
layer
electroplated
metals
Prior art date
Application number
AT93303140T
Other languages
English (en)
Inventor
Henry Guckel
Original Assignee
Wisconsin Alumni Res Found
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wisconsin Alumni Res Found filed Critical Wisconsin Alumni Res Found
Application granted granted Critical
Publication of ATE139810T1 publication Critical patent/ATE139810T1/de

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/0215—Silicon carbide; Silicon nitride; Silicon oxycarbide
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Micromachines (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
AT93303140T 1992-04-24 1993-04-22 Herstellung von mikrostrukturen unterschiedlicher strukturhöhe mittels röntgentiefenlithographie mit opfermetallschicht ATE139810T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/874,116 US5190637A (en) 1992-04-24 1992-04-24 Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers

Publications (1)

Publication Number Publication Date
ATE139810T1 true ATE139810T1 (de) 1996-07-15

Family

ID=25363007

Family Applications (1)

Application Number Title Priority Date Filing Date
AT93303140T ATE139810T1 (de) 1992-04-24 1993-04-22 Herstellung von mikrostrukturen unterschiedlicher strukturhöhe mittels röntgentiefenlithographie mit opfermetallschicht

Country Status (9)

Country Link
US (1) US5190637A (de)
EP (1) EP0567332B1 (de)
JP (1) JP3249233B2 (de)
KR (1) KR100272829B1 (de)
AT (1) ATE139810T1 (de)
CA (1) CA2088605C (de)
DE (1) DE69303320T2 (de)
IL (1) IL104835A0 (de)
MX (1) MX9302149A (de)

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MX9302149A (es) 1993-10-01
EP0567332A2 (de) 1993-10-27
US5190637A (en) 1993-03-02
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DE69303320D1 (de) 1996-08-01
CA2088605C (en) 2001-01-02
EP0567332A3 (de) 1994-01-12
KR930022470A (ko) 1993-11-24
KR100272829B1 (ko) 2000-12-01
CA2088605A1 (en) 1993-10-25
DE69303320T2 (de) 1996-10-31
EP0567332B1 (de) 1996-06-26
IL104835A0 (en) 1993-06-10

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