AT252683B - Verfahren und Vorrichtung zum Aufdampfen von Materialien auf eine Unterlage im Vakuum - Google Patents

Verfahren und Vorrichtung zum Aufdampfen von Materialien auf eine Unterlage im Vakuum

Info

Publication number
AT252683B
AT252683B AT507464A AT507464A AT252683B AT 252683 B AT252683 B AT 252683B AT 507464 A AT507464 A AT 507464A AT 507464 A AT507464 A AT 507464A AT 252683 B AT252683 B AT 252683B
Authority
AT
Austria
Prior art keywords
vacuum
substrate
materials
vapor deposition
deposition
Prior art date
Application number
AT507464A
Other languages
English (en)
Original Assignee
Libbey Owens Ford Glass Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Glass Co filed Critical Libbey Owens Ford Glass Co
Application granted granted Critical
Publication of AT252683B publication Critical patent/AT252683B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/16—Remelting metals
    • C22B9/22—Remelting metals with heating by wave energy or particle radiation
    • C22B9/228—Remelting metals with heating by wave energy or particle radiation by particle radiation, e.g. electron beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
AT507464A 1963-06-12 1964-06-12 Verfahren und Vorrichtung zum Aufdampfen von Materialien auf eine Unterlage im Vakuum AT252683B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US287386A US3329524A (en) 1963-06-12 1963-06-12 Centrifugal-type vapor source

Publications (1)

Publication Number Publication Date
AT252683B true AT252683B (de) 1967-03-10

Family

ID=23102660

Family Applications (1)

Application Number Title Priority Date Filing Date
AT507464A AT252683B (de) 1963-06-12 1964-06-12 Verfahren und Vorrichtung zum Aufdampfen von Materialien auf eine Unterlage im Vakuum

Country Status (12)

Country Link
US (1) US3329524A (de)
JP (1) JPS519687B1 (de)
AT (1) AT252683B (de)
BE (1) BE649234A (de)
CH (1) CH452312A (de)
DE (1) DE1521525B1 (de)
DK (1) DK128824B (de)
FR (1) FR1406666A (de)
GB (1) GB1031963A (de)
LU (1) LU46281A1 (de)
NL (1) NL6406691A (de)
SE (1) SE315461B (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3467058A (en) * 1965-12-03 1969-09-16 United States Steel Corp Apparatus for vaporizing metal
US3384049A (en) * 1966-10-27 1968-05-21 Emil R. Capita Vapor deposition apparatus including centrifugal force substrate-holding means
US3659552A (en) * 1966-12-15 1972-05-02 Western Electric Co Vapor deposition apparatus
US3502499A (en) * 1967-05-22 1970-03-24 Texas Instruments Inc Cladding method and apparatus
US3552352A (en) * 1968-02-13 1971-01-05 Du Pont Electron beam vaporization coating apparatus
US3572672A (en) * 1968-11-22 1971-03-30 Rca Corp Vacuum evaporation apparatus
US3661117A (en) * 1969-12-03 1972-05-09 Stanford Research Inst Apparatus for depositing thin lines
US3613633A (en) * 1970-03-18 1971-10-19 Schjeldahl Co G T Method and apparatus for coating articles utilizing rotating crucible coating apparatus including a centrifugal-type crucible
US3776535A (en) * 1970-04-17 1973-12-04 Optical Coating Laboratory Inc Method for evaporating aluminum
US3684268A (en) * 1970-04-17 1972-08-15 Optical Coating Laboratory Inc Source for evaporating materials
GB1440921A (en) * 1972-07-14 1976-06-30 Secr Defence Evaporation of metals
US3996469A (en) * 1975-01-06 1976-12-07 Jersey Nuclear-Avco Isotopes, Inc. Floating convection barrier for evaporation source
JPS52137789U (de) * 1976-04-15 1977-10-19
US4030964A (en) * 1976-04-29 1977-06-21 The United States Of America As Represented By The United States Energy Research And Development Administration Temperature cycling vapor deposition HgI2 crystal growth
JPS6057894U (ja) * 1983-09-20 1985-04-22 大久保　敬四郎 自動火災報知器
DE3639683A1 (de) * 1986-11-20 1988-05-26 Leybold Ag Verdampferanordnung mit einem rechteckigen verdampfertiegel und mehreren elektronenkanonen
KR920003591B1 (ko) * 1988-04-11 1992-05-04 미쯔비시주우고오교오 가부시기가이샤 연속진공증착장치
KR100615302B1 (ko) * 2005-01-21 2006-08-25 삼성에스디아이 주식회사 가열용기 지지대 및 이를 구비한 증착장치
EP1947210A1 (de) * 2007-01-16 2008-07-23 ARCELOR France Verfahren zur Beschichtung eines Substrats, Anlage zur Umsetzung des Verfahrens und Vorrichtung zur Metallzuführung zu einer solchen Anlage
TWI737718B (zh) * 2016-04-25 2021-09-01 美商創新先進材料股份有限公司 含有瀉流源的沉積系統及相關方法
WO2018175753A1 (en) * 2017-03-22 2018-09-27 University Of Delaware Centrifugal evaporation sources
CN112725714B (zh) * 2020-12-04 2022-02-18 中国工程物理研究院材料研究所 一种铀铌合金表层夹杂物的细化方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE882171C (de) * 1942-01-31 1953-07-06 Bosch Gmbh Robert Verfahren zur thermischen Verdampfung von Stoffen
DE970970C (de) * 1943-02-09 1958-11-20 Heraeus Gmbh W C Einrichtung zum Herstellen von Oberflaechenschichten durch Verdampfen oder Sublimieren des UEberzugsstoffes im Hochvakuum
DE862991C (de) * 1944-02-22 1953-01-15 Bosch Gmbh Robert Verfahren zur Herstellung von Legierungen durch Kondensation aus der Gasphase
DE848287C (de) * 1949-08-27 1952-09-01 Siemens Ag Verfahren zur Bedampfung, insbesondere zur Vakuum-Bedampfung von Isolierstoff-Folien
US2665223A (en) * 1949-12-31 1954-01-05 Nat Res Corp Process for depositing an aluminum film on a substrate by thermal vaporization
DE868091C (de) * 1950-03-07 1953-02-23 Bosch Gmbh Robert Vorrichtung zur Herstellung von Metallueberzuegen auf laufenden Baendern durch Bedampfen im Vakuum
CH311812A (de) * 1951-11-05 1955-12-15 Zeiss Carl Fa Aufdampfeinrichtung.
US2932588A (en) * 1955-07-06 1960-04-12 English Electric Valve Co Ltd Methods of manufacturing thin films of refractory dielectric materials
US2998376A (en) * 1956-10-29 1961-08-29 Temescal Metallurgical Corp High-vacuum evaporator
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US3029777A (en) * 1959-01-30 1962-04-17 Nat Res Corp Vapor deposition coating apparatus
US3020177A (en) * 1959-05-13 1962-02-06 Continental Can Co Art of vaporizing materials
US3019129A (en) * 1959-08-10 1962-01-30 Nat Res Corp Apparatus and process for coating
US3023727A (en) * 1959-09-10 1962-03-06 Ibm Substrate processing apparatus

Also Published As

Publication number Publication date
DK128824B (da) 1974-07-08
GB1031963A (en) 1966-06-02
SE315461B (de) 1969-09-29
BE649234A (de) 1964-10-01
LU46281A1 (de) 1964-12-09
JPS519687B1 (de) 1976-03-29
NL6406691A (de) 1964-12-14
US3329524A (en) 1967-07-04
CH452312A (de) 1968-05-31
FR1406666A (fr) 1965-07-23
DE1521525B1 (de) 1970-03-12

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