AR096071A1 - Método para introducir de manera automática agentes químicos líquidos reactivos con el aire a un sustrato en una disposición cerrada de depósito de vapor químico, método para preparar un cartucho deshumidificado y método para generar revestimientos protectores - Google Patents
Método para introducir de manera automática agentes químicos líquidos reactivos con el aire a un sustrato en una disposición cerrada de depósito de vapor químico, método para preparar un cartucho deshumidificado y método para generar revestimientos protectoresInfo
- Publication number
- AR096071A1 AR096071A1 ARP140101691A ARP140101691A AR096071A1 AR 096071 A1 AR096071 A1 AR 096071A1 AR P140101691 A ARP140101691 A AR P140101691A AR P140101691 A ARP140101691 A AR P140101691A AR 096071 A1 AR096071 A1 AR 096071A1
- Authority
- AR
- Argentina
- Prior art keywords
- cartridge
- chemical vapor
- chemical agent
- deposit
- dehumidified
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45519—Inert gas curtains
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Vacuum Packaging (AREA)
- Drying Of Gases (AREA)
- Gas Separation By Absorption (AREA)
Abstract
Un sistema cerrado de introducción de agentes químicos usado para suministrar los ingredientes activos contenidos en un agente químico líquido a una disposición de depósito de vapor químico incluye un cartucho fuerte, deshumidificado, que contiene una dosis definida de agente químico liquido. El cartucho es colocado en una ranura de montaje configurada específicamente para recibir el cartucho. Una vez iniciado el sistema, un primer elemento de accionamiento mecánico lineal fija de manera segura el cartucho en la ranura, mientras que una lanza extractora adosada a un segundo elemento de accionamiento mecánico lineal perfora el cartucho por la parte de abajo, extrae el agente químico liquido y lo suministra a una cámara de vaporización. La cámara de vaporización evapora el agente químico líquido y suministra los vapores que contienen los ingredientes activos al sistema de depósito de vapor químico. La disposición de depósito de vapor químico puede incluir una cámara de tratamiento, una cinta transportadora, un sistema de aire limpio comprimido para proveer compartimentos de tratamiento separados dentro de la cámara, un sistema de humedad, un sistema de vapor químico y un sistema de neutralización para neutralizar productos derivados nocivos.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361815649P | 2013-04-24 | 2013-04-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AR096071A1 true AR096071A1 (es) | 2015-12-02 |
Family
ID=51788164
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ARP140101691A AR096071A1 (es) | 2013-04-24 | 2014-04-23 | Método para introducir de manera automática agentes químicos líquidos reactivos con el aire a un sustrato en una disposición cerrada de depósito de vapor químico, método para preparar un cartucho deshumidificado y método para generar revestimientos protectores |
| ARP140101690A AR096070A1 (es) | 2013-04-24 | 2014-04-23 | Disposición de introducción de agentes químicos para un proceso de depósito de vapor químico en un sustrato, cartucho sellado y disposición de depósito de vapor químico |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ARP140101690A AR096070A1 (es) | 2013-04-24 | 2014-04-23 | Disposición de introducción de agentes químicos para un proceso de depósito de vapor químico en un sustrato, cartucho sellado y disposición de depósito de vapor químico |
Country Status (12)
| Country | Link |
|---|---|
| US (2) | US9562288B2 (es) |
| EP (1) | EP2989228A4 (es) |
| JP (1) | JP2016524648A (es) |
| KR (1) | KR20160022299A (es) |
| CN (1) | CN105264112A (es) |
| AR (2) | AR096071A1 (es) |
| AU (1) | AU2014257128A1 (es) |
| BR (1) | BR112015027019A2 (es) |
| CA (1) | CA2909532A1 (es) |
| MX (1) | MX2015014937A (es) |
| TW (1) | TW201500574A (es) |
| WO (1) | WO2014176378A2 (es) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2979766B1 (de) * | 2014-07-30 | 2018-01-17 | Sturm Maschinen- & Anlagenbau GmbH | Vorrichtung und Verfahren zur metallischen Beschichtung sowie Aufnahmeeinheit für die Vorrichtung |
| WO2016154301A1 (en) | 2015-03-24 | 2016-09-29 | Siva Power, Inc | Thermal management of evaporation sources |
| FR3039669B1 (fr) * | 2015-07-31 | 2019-08-02 | Air Liquide Electronics Systems | Ecran tactile pivotant pour installation de distribution de gaz. |
| CN109154065B (zh) * | 2017-04-07 | 2021-09-03 | 应用材料公司 | 用于清洁真空腔室的方法、用于真空处理基板的设备和用于制造具有有机材料的装置的系统 |
| EP3694807A1 (en) * | 2017-10-09 | 2020-08-19 | Knappco, LLC | Control systems for liquid product delivery vehicles |
| US20190283063A1 (en) | 2018-03-14 | 2019-09-19 | Adam Zax | Method and apparatus for inline coating of substrates |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2559259A1 (de) | 1975-12-31 | 1977-07-14 | Dynamit Nobel Ag | Silane mit verkappten funktionellen gruppen als haftvermittler |
| US4263350A (en) | 1979-12-31 | 1981-04-21 | Ppg Industries, Inc. | Silane release surfaces on glass |
| US4539061A (en) | 1983-09-07 | 1985-09-03 | Yeda Research And Development Co., Ltd. | Process for the production of built-up films by the stepwise adsorption of individual monolayers |
| JP2622178B2 (ja) * | 1989-01-17 | 1997-06-18 | キヤノン株式会社 | インクジェットカートリッジ及び該カートリッジを用いたインクジェット記録装置 |
| US5204314A (en) * | 1990-07-06 | 1993-04-20 | Advanced Technology Materials, Inc. | Method for delivering an involatile reagent in vapor form to a CVD reactor |
| US5962085A (en) | 1991-02-25 | 1999-10-05 | Symetrix Corporation | Misted precursor deposition apparatus and method with improved mist and mist flow |
| JPH0597478A (ja) | 1991-10-04 | 1993-04-20 | Nippon Sheet Glass Co Ltd | 撥水性ガラス物品およびその製造方法 |
| US5372851A (en) | 1991-12-16 | 1994-12-13 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing a chemically adsorbed film |
| US5665424A (en) | 1994-03-11 | 1997-09-09 | Sherman; Dan | Method for making glass articles having a permanent protective coating |
| US5723172A (en) | 1994-03-11 | 1998-03-03 | Dan Sherman | Method for forming a protective coating on glass |
| FR2722493B1 (fr) | 1994-07-13 | 1996-09-06 | Saint Gobain Vitrage | Vitrage hydrophobe multicouches |
| JPH09268281A (ja) | 1996-03-29 | 1997-10-14 | Toray Dow Corning Silicone Co Ltd | 車両ガラス用撥水剤組成物および車両用撥水性ガラス |
| US6245387B1 (en) | 1998-11-03 | 2001-06-12 | Diamon-Fusion International, Inc. | Capped silicone film and method of manufacture thereof |
| WO2001038602A1 (fr) * | 1999-11-22 | 2001-05-31 | Seiko Instruments Inc. | Dispositif de pulverisation de vapeur composite et dispositif de focalisation de faisceau ionique |
| US6279622B1 (en) * | 2000-02-07 | 2001-08-28 | Ethicon, Inc. | Method and system for delivering and metering liquid sterilant |
| US6572706B1 (en) * | 2000-06-19 | 2003-06-03 | Simplus Systems Corporation | Integrated precursor delivery system |
| US20070231485A1 (en) | 2003-09-05 | 2007-10-04 | Moffat William A | Silane process chamber with double door seal |
| US8361548B2 (en) | 2003-09-05 | 2013-01-29 | Yield Engineering Systems, Inc. | Method for efficient coating of substrates including plasma cleaning and dehydration |
| JP5045062B2 (ja) * | 2006-10-30 | 2012-10-10 | 住友化学株式会社 | 固体有機金属化合物の供給方法 |
| US7655932B2 (en) * | 2007-01-11 | 2010-02-02 | Varian Semiconductor Equipment Associates, Inc. | Techniques for providing ion source feed materials |
| US7955649B2 (en) * | 2007-01-17 | 2011-06-07 | Visichem Technology, Ltd. | Forming thin films using a resealable vial carrier of amphiphilic molecules |
| US7883745B2 (en) | 2007-07-30 | 2011-02-08 | Micron Technology, Inc. | Chemical vaporizer for material deposition systems and associated methods |
| EP2336078A1 (en) | 2009-12-18 | 2011-06-22 | Anheuser-Busch InBev S.A. | Pressurized gas driven liquid dispensing device comprising a piercing unit |
| TW201142066A (en) * | 2010-05-18 | 2011-12-01 | Hon Hai Prec Ind Co Ltd | Coating device |
-
2014
- 2014-04-23 CA CA2909532A patent/CA2909532A1/en not_active Abandoned
- 2014-04-23 CN CN201480023730.1A patent/CN105264112A/zh active Pending
- 2014-04-23 JP JP2016510769A patent/JP2016524648A/ja active Pending
- 2014-04-23 BR BR112015027019A patent/BR112015027019A2/pt not_active IP Right Cessation
- 2014-04-23 MX MX2015014937A patent/MX2015014937A/es unknown
- 2014-04-23 AR ARP140101691A patent/AR096071A1/es unknown
- 2014-04-23 US US14/260,233 patent/US9562288B2/en active Active
- 2014-04-23 US US14/260,231 patent/US20140318449A1/en not_active Abandoned
- 2014-04-23 AU AU2014257128A patent/AU2014257128A1/en not_active Abandoned
- 2014-04-23 WO PCT/US2014/035206 patent/WO2014176378A2/en active Application Filing
- 2014-04-23 AR ARP140101690A patent/AR096070A1/es unknown
- 2014-04-23 EP EP14788444.9A patent/EP2989228A4/en not_active Withdrawn
- 2014-04-23 KR KR1020157033332A patent/KR20160022299A/ko not_active Application Discontinuation
- 2014-04-24 TW TW103114863A patent/TW201500574A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AU2014257128A1 (en) | 2015-11-12 |
| EP2989228A4 (en) | 2016-12-14 |
| CA2909532A1 (en) | 2014-10-30 |
| US9562288B2 (en) | 2017-02-07 |
| AR096070A1 (es) | 2015-12-02 |
| MX2015014937A (es) | 2016-05-09 |
| US20140318449A1 (en) | 2014-10-30 |
| BR112015027019A2 (pt) | 2017-08-22 |
| KR20160022299A (ko) | 2016-02-29 |
| EP2989228A2 (en) | 2016-03-02 |
| CN105264112A (zh) | 2016-01-20 |
| US20140322445A1 (en) | 2014-10-30 |
| WO2014176378A2 (en) | 2014-10-30 |
| WO2014176378A3 (en) | 2015-10-29 |
| TW201500574A (zh) | 2015-01-01 |
| JP2016524648A (ja) | 2016-08-18 |
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