AR096070A1 - Disposición de introducción de agentes químicos para un proceso de depósito de vapor químico en un sustrato, cartucho sellado y disposición de depósito de vapor químico - Google Patents

Disposición de introducción de agentes químicos para un proceso de depósito de vapor químico en un sustrato, cartucho sellado y disposición de depósito de vapor químico

Info

Publication number
AR096070A1
AR096070A1 ARP140101690A ARP140101690A AR096070A1 AR 096070 A1 AR096070 A1 AR 096070A1 AR P140101690 A ARP140101690 A AR P140101690A AR P140101690 A ARP140101690 A AR P140101690A AR 096070 A1 AR096070 A1 AR 096070A1
Authority
AR
Argentina
Prior art keywords
chemical vapor
cartridge
provision
chemical agent
chemical
Prior art date
Application number
ARP140101690A
Other languages
English (en)
Original Assignee
Diamon Fusion Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Diamon Fusion Int Inc filed Critical Diamon Fusion Int Inc
Publication of AR096070A1 publication Critical patent/AR096070A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519—Inert gas curtains
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Vacuum Packaging (AREA)

Abstract

Un sistema cerrado de introducción de agentes químicos usado para suministrar los ingredientes activos contenidos en un agente químico líquido a un sistema de depósito de vapor químico incluye un cartucho fuerte, deshumidificado, que contiene una dosis definida de agente químico líquido. El cartucho es colocado en una ranura de montaje configurada específicamente para recibir el cartucho. Una vez iniciado el sistema, un primer elemento de accionamiento mecánico lineal fija de manera segura el cartucho en la ranura, mientras que una lanza extractora adosada a un segundo elemento de accionamiento mecánico lineal perfora el cartucho por la parte de abajo, extrae el agente químico líquido y lo suministra a una cámara de vaporización. La cámara de vaporización evapora el agente químico líquido y suministra los vapores que contienen los ingredientes activos al sistema de depósito de vapor químico. El sistema de depósito de vapor químico puede incluir una cámara de tratamiento, una cinta transportadora, un sistema de aire limpio comprimido para proporcionar compartimentos de tratamiento separados dentro de la cámara, un sistema de humedad, un sistema de vapor químico y un sistema de neutralización para neutralizar productos derivados nocivos.
ARP140101690A 2013-04-24 2014-04-23 Disposición de introducción de agentes químicos para un proceso de depósito de vapor químico en un sustrato, cartucho sellado y disposición de depósito de vapor químico AR096070A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201361815649P 2013-04-24 2013-04-24

Publications (1)

Publication Number Publication Date
AR096070A1 true AR096070A1 (es) 2015-12-02

Family

ID=51788164

Family Applications (2)

Application Number Title Priority Date Filing Date
ARP140101690A AR096070A1 (es) 2013-04-24 2014-04-23 Disposición de introducción de agentes químicos para un proceso de depósito de vapor químico en un sustrato, cartucho sellado y disposición de depósito de vapor químico
ARP140101691A AR096071A1 (es) 2013-04-24 2014-04-23 Método para introducir de manera automática agentes químicos líquidos reactivos con el aire a un sustrato en una disposición cerrada de depósito de vapor químico, método para preparar un cartucho deshumidificado y método para generar revestimientos protectores

Family Applications After (1)

Application Number Title Priority Date Filing Date
ARP140101691A AR096071A1 (es) 2013-04-24 2014-04-23 Método para introducir de manera automática agentes químicos líquidos reactivos con el aire a un sustrato en una disposición cerrada de depósito de vapor químico, método para preparar un cartucho deshumidificado y método para generar revestimientos protectores

Country Status (12)

Country Link
US (2) US20140318449A1 (es)
EP (1) EP2989228A4 (es)
JP (1) JP2016524648A (es)
KR (1) KR20160022299A (es)
CN (1) CN105264112A (es)
AR (2) AR096070A1 (es)
AU (1) AU2014257128A1 (es)
BR (1) BR112015027019A2 (es)
CA (1) CA2909532A1 (es)
MX (1) MX2015014937A (es)
TW (1) TW201500574A (es)
WO (1) WO2014176378A2 (es)

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ES2665555T3 (es) * 2014-07-30 2018-04-26 Sturm Maschinen- & Anlagenbau Gmbh Dispositivo y procedimiento para el revestimiento metálico así como unidad de recepción para el dispositivo
WO2016154301A1 (en) 2015-03-24 2016-09-29 Siva Power, Inc Thermal management of evaporation sources
FR3039669B1 (fr) * 2015-07-31 2019-08-02 Air Liquide Electronics Systems Ecran tactile pivotant pour installation de distribution de gaz.
WO2018184949A1 (en) * 2017-04-07 2018-10-11 Applied Materials, Inc. Method for cleaning a vacuum chamber, apparatus for vacuum processing of a substrate, and system for the manufacture of devices having organic materials
EP3694807A1 (en) * 2017-10-09 2020-08-19 Knappco, LLC Control systems for liquid product delivery vehicles
US20190283063A1 (en) 2018-03-14 2019-09-19 Adam Zax Method and apparatus for inline coating of substrates

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Also Published As

Publication number Publication date
JP2016524648A (ja) 2016-08-18
KR20160022299A (ko) 2016-02-29
MX2015014937A (es) 2016-05-09
AR096071A1 (es) 2015-12-02
BR112015027019A2 (pt) 2017-08-22
CA2909532A1 (en) 2014-10-30
TW201500574A (zh) 2015-01-01
US20140322445A1 (en) 2014-10-30
WO2014176378A3 (en) 2015-10-29
US20140318449A1 (en) 2014-10-30
EP2989228A4 (en) 2016-12-14
US9562288B2 (en) 2017-02-07
CN105264112A (zh) 2016-01-20
AU2014257128A1 (en) 2015-11-12
WO2014176378A2 (en) 2014-10-30
EP2989228A2 (en) 2016-03-02

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