AR089044A1 - Proceso de pulverizacion reactiva - Google Patents
Proceso de pulverizacion reactivaInfo
- Publication number
- AR089044A1 AR089044A1 ARP120104504A ARP120104504A AR089044A1 AR 089044 A1 AR089044 A1 AR 089044A1 AR P120104504 A ARP120104504 A AR P120104504A AR P120104504 A ARP120104504 A AR P120104504A AR 089044 A1 AR089044 A1 AR 089044A1
- Authority
- AR
- Argentina
- Prior art keywords
- targeted target
- target
- tension
- targeted
- reactive
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000005507 spraying Methods 0.000 title abstract 2
- 239000000463 material Substances 0.000 abstract 5
- 230000010349 pulsation Effects 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000010849 ion bombardment Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0094—Reactive sputtering in transition mode
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3492—Variation of parameters during sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3476—Testing and control
- H01J37/3485—Means for avoiding target poisoning
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161566836P | 2011-12-05 | 2011-12-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AR089044A1 true AR089044A1 (es) | 2014-07-23 |
Family
ID=47504785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ARP120104504A AR089044A1 (es) | 2011-12-05 | 2012-11-30 | Proceso de pulverizacion reactiva |
Country Status (18)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5871103B2 (ja) * | 2013-06-04 | 2016-03-01 | 株式会社村田製作所 | 薄膜形成方法 |
| EP3017079B2 (de) | 2013-07-03 | 2020-09-09 | Oerlikon Surface Solutions AG, Pfäffikon | Verfahren zur herstellung von tixsi1-xn schichten |
| DE102016012460A1 (de) | 2016-10-19 | 2018-04-19 | Grenzebach Maschinenbau Gmbh | Vorrichtung und Verfahren zur Herstellung definierter Eigenschaften von Gradientenschichten in einem System mehrlagiger Beschichtungen bei Sputter - Anlagen |
| EP3406761A1 (en) | 2017-05-24 | 2018-11-28 | Walter Ag | A method for producing a coated cutting tool and a coated cutting tool |
| CN110184571A (zh) * | 2019-05-07 | 2019-08-30 | 天津君盛天成科技发展有限公司 | 高功率脉冲涂装方法 |
| WO2021160337A1 (en) * | 2020-02-11 | 2021-08-19 | Oerlikon Surface Solutions Ag, Pfäffikon | Method of surface smoothening of additive manufactured metal components |
| CN111621756B (zh) * | 2020-03-27 | 2021-12-24 | 中国科学院力学研究所 | 一种室温溅射制备晶态透明氧化铝薄膜的方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3700633C2 (de) * | 1987-01-12 | 1997-02-20 | Reinar Dr Gruen | Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma |
| DE19610012B4 (de) * | 1996-03-14 | 2005-02-10 | Unaxis Deutschland Holding Gmbh | Verfahren zur Stabilisierung eines Arbeitspunkts beim reaktiven Zerstäuben in einer Sauerstoff enthaltenden Atmosphäre |
| SE521095C2 (sv) | 2001-06-08 | 2003-09-30 | Cardinal Cg Co | Förfarande för reaktiv sputtring |
| US8025775B2 (en) * | 2002-03-15 | 2011-09-27 | Oerlikon Trading Ag, Truebbach | Vacuum plasma generator |
| JP3866615B2 (ja) | 2002-05-29 | 2007-01-10 | 株式会社神戸製鋼所 | 反応性スパッタリング方法及び装置 |
| US20050103620A1 (en) * | 2003-11-19 | 2005-05-19 | Zond, Inc. | Plasma source with segmented magnetron cathode |
| US8500965B2 (en) * | 2004-05-06 | 2013-08-06 | Ppg Industries Ohio, Inc. | MSVD coating process |
| DE102006017382A1 (de) * | 2005-11-14 | 2007-05-16 | Itg Induktionsanlagen Gmbh | Verfahren und Vorrichtung zum Beschichten und/oder zur Behandlung von Oberflächen |
| GB0608582D0 (en) * | 2006-05-02 | 2006-06-07 | Univ Sheffield Hallam | High power impulse magnetron sputtering vapour deposition |
| DE102006061324B4 (de) * | 2006-06-20 | 2008-07-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Regelung eines reaktiven Hochleistungs-Puls-Magnetronsputterprozesses und Vorrichtung hierzu |
| SE533395C2 (sv) * | 2007-06-08 | 2010-09-14 | Sandvik Intellectual Property | Sätt att göra PVD-beläggningar |
| US7685852B2 (en) | 2007-06-28 | 2010-03-30 | Rahamim Komemi | Tool for pin tumbler locks |
| US9039871B2 (en) * | 2007-11-16 | 2015-05-26 | Advanced Energy Industries, Inc. | Methods and apparatus for applying periodic voltage using direct current |
| EP2257964B1 (en) * | 2007-12-07 | 2018-07-11 | Evatec AG | Reactive sputtering with hipims |
| JP2010065240A (ja) * | 2008-09-08 | 2010-03-25 | Kobe Steel Ltd | スパッタ装置 |
| DE202010001497U1 (de) | 2010-01-29 | 2010-04-22 | Hauzer Techno-Coating B.V. | Beschichtungsvorrichtung mit einer HIPIMS-Leistungsquelle |
| KR101537883B1 (ko) | 2011-04-20 | 2015-07-17 | 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 트뤼프바흐 | 순차적 전력 펄스를 제공하기 위한 방법 |
-
2012
- 2012-11-23 ES ES12810067T patent/ES2704121T3/es active Active
- 2012-11-23 MY MYPI2014001644A patent/MY181526A/en unknown
- 2012-11-23 RU RU2014127520A patent/RU2632210C2/ru active
- 2012-11-23 KR KR1020147018427A patent/KR101990658B1/ko active Active
- 2012-11-23 WO PCT/EP2012/004848 patent/WO2013083238A1/de not_active Ceased
- 2012-11-23 SI SI201231461T patent/SI2789006T1/sl unknown
- 2012-11-23 JP JP2014545125A patent/JP6113743B2/ja not_active Expired - Fee Related
- 2012-11-23 EP EP12810067.4A patent/EP2789006B1/de active Active
- 2012-11-23 CA CA2858251A patent/CA2858251C/en not_active Expired - Fee Related
- 2012-11-23 MX MX2014006729A patent/MX368733B/es active IP Right Grant
- 2012-11-23 US US14/362,758 patent/US10458015B2/en active Active
- 2012-11-23 BR BR112014013533-9A patent/BR112014013533B1/pt active IP Right Grant
- 2012-11-23 CN CN201280069085.8A patent/CN104272429B/zh active Active
- 2012-11-23 PL PL12810067T patent/PL2789006T3/pl unknown
- 2012-11-23 SG SG11201402945YA patent/SG11201402945YA/en unknown
- 2012-11-30 TW TW101144896A patent/TWI565816B/zh not_active IP Right Cessation
- 2012-11-30 AR ARP120104504A patent/AR089044A1/es active IP Right Grant
-
2014
- 2014-06-05 PH PH12014501269A patent/PH12014501269B1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| PL2789006T3 (pl) | 2019-04-30 |
| EP2789006A1 (de) | 2014-10-15 |
| PH12014501269B1 (en) | 2019-03-08 |
| PH12014501269A1 (en) | 2014-09-08 |
| MX2014006729A (es) | 2015-02-24 |
| MX368733B (es) | 2019-10-14 |
| TWI565816B (zh) | 2017-01-11 |
| RU2014127520A (ru) | 2016-01-27 |
| CA2858251A1 (en) | 2013-06-13 |
| SI2789006T1 (sl) | 2019-02-28 |
| WO2013083238A1 (de) | 2013-06-13 |
| JP2015504970A (ja) | 2015-02-16 |
| BR112014013533B1 (pt) | 2021-09-08 |
| ES2704121T3 (es) | 2019-03-14 |
| JP6113743B2 (ja) | 2017-04-12 |
| US10458015B2 (en) | 2019-10-29 |
| TW201331401A (zh) | 2013-08-01 |
| CN104272429A (zh) | 2015-01-07 |
| CN104272429B (zh) | 2016-08-24 |
| BR112014013533A2 (pt) | 2017-06-13 |
| KR101990658B1 (ko) | 2019-06-18 |
| KR20140108672A (ko) | 2014-09-12 |
| RU2632210C2 (ru) | 2017-10-03 |
| MY181526A (en) | 2020-12-25 |
| BR112014013533A8 (pt) | 2017-06-13 |
| CA2858251C (en) | 2019-12-10 |
| SG11201402945YA (en) | 2014-10-30 |
| EP2789006B1 (de) | 2018-10-31 |
| US20140311892A1 (en) | 2014-10-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AR089044A1 (es) | Proceso de pulverizacion reactiva | |
| PH12012502307A1 (en) | Aerosol generator | |
| MY182966A (en) | Non-burning type flavor inhaler and package | |
| FR2985292B1 (fr) | Propulseur plasmique et procede de generation d'une poussee propulsive plasmique | |
| CL2017003408A1 (es) | Sistemas electrónicos de suministro de aerosol | |
| GB2499681B (en) | Atmospheric pressure ion source by interacting high velocity spray with a target | |
| CL2014001577A1 (es) | Metodo para pulverizar un objeto porque comprende crear un primer chorro de aire alrededor de un espacio objetivo, crear un segundo chorro donde el chorro fluye contra el primer chorro de aire, ubicar un objetivo dentro del espacio objetivo y emitir un spray dentro del espacio objetivo; aparato para pulverizar un objeto. | |
| GB201815839D0 (en) | Fuel spray nozzle | |
| WO2013009426A3 (en) | Shut-off system for a dispenser | |
| EP2529843A3 (en) | Reverse-flow nozzle for generating cavitating or pulsed jets | |
| IN2014CN02493A (cg-RX-API-DMAC7.html) | ||
| CL2012003239A1 (es) | Un dispositivo generador de aerosol que posee un cuerpo alargado, un acoplamiento, un cartucho que contiene un fluido presurizado que tiene un tubo axial de descarga, un disparador montado en forma giratoria en el cuerpo alrededor de un eje del disparador separado y un elemento de boquilla tubular; y generador de aerosol. | |
| CL2014000037A1 (es) | Dispositivo atomizador porque es la punta de la boquilla, una boquilla para liquidos, es un alojamiento que contiene un multiple de aire convergente, con un cono a de transicion de aire que rodea de una manera circular la boquilla para liquidos que esta conectada a una lanza central, siendo alimentada dicha lanza por una entrada; uso del dispositivo; procedimiento. | |
| SG11201402447TA (en) | Plasma processing chamber with flexible symmetric rf return strap | |
| PL2778254T3 (pl) | Osadzanie z fazy gazowej powłoki w plazmie niskociśnieniowego wyładowania łukowego i obróbka jonowa | |
| AR087682A1 (es) | Procedimiento para dispensar un agente fitosanitario y pistola rociadora | |
| IN2014DN03425A (cg-RX-API-DMAC7.html) | ||
| AR088318A1 (es) | Procedimiento para la puesta a disposicion de pulsaciones de potencia secuenciales | |
| AR088700A1 (es) | Procedimiento para la deposicion de sistemas de capas de pvd a partir de la fase de gas mediante pulverizacion sobre sustratos | |
| WO2015012929A3 (en) | Stored pressure driven cycle | |
| MX2016012983A (es) | Sistema y metodo de fabricacion de un recubrimiento de junta de campo. | |
| RU2013119370A (ru) | Способ дезинфицирования воздуха в воздушных каналах | |
| JP2015504970A5 (cg-RX-API-DMAC7.html) | ||
| HK1198499A2 (en) | Trigger mechanism for toy blowgun | |
| MX382975B (es) | Método de recubrimiento de pulso de alta potencia. |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG | Grant, registration |