ZA876229B - An arrangement and a process for the positioning and synchronization of a writing laser beam - Google Patents

An arrangement and a process for the positioning and synchronization of a writing laser beam

Info

Publication number
ZA876229B
ZA876229B ZA876229A ZA876229A ZA876229B ZA 876229 B ZA876229 B ZA 876229B ZA 876229 A ZA876229 A ZA 876229A ZA 876229 A ZA876229 A ZA 876229A ZA 876229 B ZA876229 B ZA 876229B
Authority
ZA
South Africa
Prior art keywords
laser beam
semiconductor chip
synchronization
mark
writing laser
Prior art date
Application number
ZA876229A
Other languages
English (en)
Inventor
Kempter Meinrad
Doering Elko
Original Assignee
Lasarray Holding Ag.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lasarray Holding Ag. filed Critical Lasarray Holding Ag.
Publication of ZA876229B publication Critical patent/ZA876229B/xx

Links

Classifications

    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06KGRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K7/00Methods or arrangements for sensing record carriers, e.g. for reading patterns
    • G06K7/01Details
    • G06K7/015Aligning or centering of the sensing device with respect to the record carrier
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/34Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/18, H10D48/04 and H10D48/07, with or without impurities, e.g. doping materials
    • H01L21/42Bombardment with radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B23K26/042Automatically aligning the laser beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Artificial Intelligence (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Laser Beam Printer (AREA)
  • Laser Beam Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
ZA876229A 1986-09-22 1987-08-21 An arrangement and a process for the positioning and synchronization of a writing laser beam ZA876229B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH3781/86A CH670592A5 (cg-RX-API-DMAC7.html) 1986-09-22 1986-09-22

Publications (1)

Publication Number Publication Date
ZA876229B true ZA876229B (en) 1988-03-01

Family

ID=4263345

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA876229A ZA876229B (en) 1986-09-22 1987-08-21 An arrangement and a process for the positioning and synchronization of a writing laser beam

Country Status (10)

Country Link
US (1) US4809014A (cg-RX-API-DMAC7.html)
EP (1) EP0262088B1 (cg-RX-API-DMAC7.html)
JP (1) JPS6394622A (cg-RX-API-DMAC7.html)
KR (1) KR880004559A (cg-RX-API-DMAC7.html)
AT (1) ATE64238T1 (cg-RX-API-DMAC7.html)
CA (1) CA1278392C (cg-RX-API-DMAC7.html)
CH (1) CH670592A5 (cg-RX-API-DMAC7.html)
DE (1) DE3770559D1 (cg-RX-API-DMAC7.html)
IL (1) IL83969A (cg-RX-API-DMAC7.html)
ZA (1) ZA876229B (cg-RX-API-DMAC7.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4927226A (en) * 1989-03-27 1990-05-22 General Electric Company Multiplexer for high power CW lasers
JP2004200221A (ja) * 2002-12-16 2004-07-15 Toray Eng Co Ltd レーザマーキング方法及び装置
US20050087520A1 (en) * 2003-10-28 2005-04-28 Lixiao Wang Method and apparatus for selective ablation of coatings from medical devices
US7297972B2 (en) * 2005-08-26 2007-11-20 Electro Scientific Industries, Inc. Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as a metrology target
US7315038B2 (en) * 2005-08-26 2008-01-01 Electro Scientific Industries, Inc. Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as an alignment target
BR112012019544A2 (pt) * 2010-02-04 2018-03-27 Echelon Laser Systems Lp metodo e sistema de corte com laser
US10943079B2 (en) * 2017-07-27 2021-03-09 Robert Bosch Gmbh Device for implementing a detection function and method for operating such a device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4134066A (en) * 1977-03-24 1979-01-09 International Business Machines Corporation Wafer indexing system using a grid pattern and coding and orientation marks in each grid cell
DE3123031A1 (de) * 1981-06-10 1983-01-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zur kennzeichnung von halbleiterchips und kennzeichenbarer halbleiterchip
US4695698A (en) * 1984-07-10 1987-09-22 Larassay Holding Ag Method of, and apparatus for, generating a predetermined pattern using laser radiation
DE3427611A1 (de) * 1984-07-26 1988-06-09 Bille Josef Laserstrahl-lithograph

Also Published As

Publication number Publication date
CA1278392C (en) 1990-12-27
EP0262088A1 (de) 1988-03-30
ATE64238T1 (de) 1991-06-15
EP0262088B1 (de) 1991-06-05
IL83969A (en) 1991-06-30
DE3770559D1 (de) 1991-07-11
US4809014A (en) 1989-02-28
IL83969A0 (en) 1988-02-29
CH670592A5 (cg-RX-API-DMAC7.html) 1989-06-30
JPS6394622A (ja) 1988-04-25
KR880004559A (ko) 1988-06-04

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