ZA835090B - Aqueous-alkaline solution and process for developing positiveworking reproduction layers - Google Patents

Aqueous-alkaline solution and process for developing positiveworking reproduction layers

Info

Publication number
ZA835090B
ZA835090B ZA835090A ZA835090A ZA835090B ZA 835090 B ZA835090 B ZA 835090B ZA 835090 A ZA835090 A ZA 835090A ZA 835090 A ZA835090 A ZA 835090A ZA 835090 B ZA835090 B ZA 835090B
Authority
ZA
South Africa
Prior art keywords
positiveworking
developing
aqueous
alkaline solution
reproduction layers
Prior art date
Application number
ZA835090A
Other languages
English (en)
Inventor
Ulrich Simon
Rainer Beutel
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA835090B publication Critical patent/ZA835090B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
ZA835090A 1982-08-13 1983-07-13 Aqueous-alkaline solution and process for developing positiveworking reproduction layers ZA835090B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19823230171 DE3230171A1 (de) 1982-08-13 1982-08-13 Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten

Publications (1)

Publication Number Publication Date
ZA835090B true ZA835090B (en) 1984-03-28

Family

ID=6170811

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA835090A ZA835090B (en) 1982-08-13 1983-07-13 Aqueous-alkaline solution and process for developing positiveworking reproduction layers

Country Status (10)

Country Link
US (1) US4530895A (da)
EP (2) EP0101010A1 (da)
JP (1) JPS59501482A (da)
AU (1) AU556217B2 (da)
CA (1) CA1251678A (da)
DE (2) DE3230171A1 (da)
DK (1) DK189184A (da)
FI (1) FI75680C (da)
WO (1) WO1984000826A1 (da)
ZA (1) ZA835090B (da)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0149490B2 (en) * 1984-01-17 1993-12-15 Fuji Photo Film Co., Ltd. Presensitized plate having an anodized aluminum base with an improved hydrophilic layer
DE3409888A1 (de) * 1984-03-17 1985-09-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches aufzeichnungsmaterial und dessen verwendung in einem verfahren zum herstellen einer druckform oder einer gedruckten schaltung
JPS6211852A (ja) * 1985-07-10 1987-01-20 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成方法
US4784937A (en) * 1985-08-06 1988-11-15 Tokyo Ohka Kogyo Co., Ltd. Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant
DE3705896A1 (de) * 1986-02-24 1987-08-27 Tokyo Ohka Kogyo Co Ltd Verfahren zur herstellung eines fotoresistmusters auf einer substratflaeche und ein dafuer geeignetes schaumentfernungsmittel
JPH0638159B2 (ja) * 1986-07-18 1994-05-18 東京応化工業株式会社 ポジ型ホトレジスト用現像液
DE3884825D1 (de) * 1987-02-16 1993-11-18 Konishiroku Photo Ind Entwickler für lichtempfindliche lithographische Druckplatte, gemeinschaftlich verarbeitungsfähig für den Negativ-Typ und den Positiv-Typ und Entwicklerzusammensetzung für lichtempfindliches Material.
JPS63271256A (ja) * 1987-04-28 1988-11-09 Konica Corp 感光材料の現像液組成物
US5126230A (en) * 1987-04-06 1992-06-30 Morton International, Inc. High contrast, positive photoresist developer containing alkanolamine
US5094934A (en) * 1987-04-06 1992-03-10 Morton International, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US4808513A (en) * 1987-04-06 1989-02-28 Morton Thiokol, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
JP2591643B2 (ja) * 1988-03-03 1997-03-19 コニカ株式会社 ０−キノンジアジド化合物を含有する感光材料の現像液
US4931103A (en) * 1988-08-11 1990-06-05 E. I. Du Pont De Nemours And Company Tricholine phosphate surface treating agent
JPH0470756A (ja) * 1990-07-11 1992-03-05 Konica Corp 感光性平版印刷版の現像方法及び現像液
DE4027299A1 (de) * 1990-08-29 1992-03-05 Hoechst Ag Entwicklerzusammensetzung fuer bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische schichten und verfahren zur entwicklung solcher schichten
KR100573560B1 (ko) 1997-10-30 2006-08-30 가오가부시끼가이샤 레지스트용현상액
DE69901642T3 (de) 1998-03-14 2019-03-21 Agfa Nv Verfahren zur Herstellung einer positiv arbeitenden Druckplatte aus einem wärmeempfindlichem Bildaufzeichnungsmaterial
TWI221946B (en) 1999-01-07 2004-10-11 Kao Corp Resist developer
US6511790B2 (en) 2000-08-25 2003-01-28 Fuji Photo Film Co., Ltd. Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
DE60126461T2 (de) 2000-11-15 2007-10-25 Canon K.K. Bilderzeugungsverfahren und Bilderzeugungsvorrichtung
EP1400856B1 (en) 2002-09-20 2011-11-02 FUJIFILM Corporation Method of making lithographic printing plate
WO2007109126A2 (en) * 2006-03-17 2007-09-27 Duke University Monte carlo based model of fluorescence
TWI678596B (zh) 2018-09-13 2019-12-01 新應材股份有限公司 正型光阻組成物及圖案化聚醯亞胺層之形成方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE143920C (da) *
DE56092C (de) * 1890-03-09 1891-04-29 C. P. ELIESON in London, England Gasdruckvorrichtung bei elektrolytischen Elektricitätszählern
BE581434A (da) * 1958-08-08
BE793490A (fr) * 1972-05-23 1973-06-29 Hunt Chem Corp Philip A Article sensible a la lumiere comprenant un phenolate de diazoquinone, un liant polymerique, et une diazoquinone-siloxane
JPS50158280A (da) * 1974-06-10 1975-12-22
JPS5156226A (ja) * 1974-11-11 1976-05-17 Sanei Kagaku Kogyo Kk Hojitaipukankoseijushino genzozai
JPS534423A (en) * 1976-07-02 1978-01-17 Hitachi Ltd Surface plate for color pick up tube
US4141733A (en) * 1977-10-25 1979-02-27 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
GB1591988A (en) * 1977-12-29 1981-07-01 Vickers Ltd Lithographic printing
DE2834958A1 (de) * 1978-08-10 1980-02-21 Hoechst Ag Verfahren zum entwickeln von belichteten lichtempfindlichen druckplatten
US4294911A (en) * 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer
JPS56122130A (en) * 1980-02-28 1981-09-25 Sharp Corp Method for forming pattern of thin film transistor
DE3100856A1 (de) * 1981-01-14 1982-08-12 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3268203D1 (en) * 1981-04-10 1986-02-13 Shipley Co Metal ion-free photoresist developer composition
US4379830A (en) * 1981-10-06 1983-04-12 Polychrome Corporation Developer for positive photolithographic articles
US4423138A (en) * 1982-01-21 1983-12-27 Eastman Kodak Company Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist
US4464461A (en) * 1983-07-22 1984-08-07 Eastman Kodak Company Development of light-sensitive quinone diazide compositions

Also Published As

Publication number Publication date
FI843564A0 (fi) 1984-09-11
US4530895A (en) 1985-07-23
FI843564L (fi) 1984-09-11
DE3373370D1 (en) 1987-10-08
EP0101010A1 (de) 1984-02-22
EP0131575B1 (de) 1987-09-02
DK189184D0 (da) 1984-04-12
DK189184A (da) 1984-04-12
FI75680C (fi) 1988-07-11
JPH0431105B2 (da) 1992-05-25
AU1825083A (en) 1984-03-07
CA1251678A (en) 1989-03-28
AU556217B2 (en) 1986-10-23
WO1984000826A1 (en) 1984-03-01
DE3230171A1 (de) 1984-02-16
FI75680B (fi) 1988-03-31
JPS59501482A (ja) 1984-08-16
EP0131575A1 (de) 1985-01-23

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