ZA845108B - Aqueous-alkaline developer for negative-working reproduction layers - Google Patents
Aqueous-alkaline developer for negative-working reproduction layersInfo
- Publication number
- ZA845108B ZA845108B ZA845108A ZA845108A ZA845108B ZA 845108 B ZA845108 B ZA 845108B ZA 845108 A ZA845108 A ZA 845108A ZA 845108 A ZA845108 A ZA 845108A ZA 845108 B ZA845108 B ZA 845108B
- Authority
- ZA
- South Africa
- Prior art keywords
- aqueous
- negative
- alkaline developer
- reproduction layers
- working reproduction
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US52592683A | 1983-08-25 | 1983-08-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA845108B true ZA845108B (en) | 1985-03-27 |
Family
ID=24095180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA845108A ZA845108B (en) | 1983-08-25 | 1984-07-04 | Aqueous-alkaline developer for negative-working reproduction layers |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0134407B1 (en) |
JP (1) | JPS6070449A (en) |
BR (1) | BR8404222A (en) |
CA (1) | CA1243876A (en) |
DE (1) | DE3463577D1 (en) |
ZA (1) | ZA845108B (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6211852A (en) * | 1985-07-10 | 1987-01-20 | Nippon Telegr & Teleph Corp <Ntt> | Formation of pattern |
JPS63170646A (en) * | 1987-01-08 | 1988-07-14 | Konica Corp | Preparation of printing plate from photosensitive lithographic printing plate which is improved in developability and the like |
JPS63271256A (en) * | 1987-04-28 | 1988-11-09 | Konica Corp | Developing solution composition of photosensitive material |
US4851324A (en) * | 1987-07-27 | 1989-07-25 | Hoechst Celanese Corporation | Phenoxy propanol containing developer compositions for lithographic plates having neutral pH |
US4828965A (en) * | 1988-01-06 | 1989-05-09 | Olin Hunt Specialty Products Inc. | Aqueous developing solution and its use in developing positive-working photoresist composition |
US5290665A (en) * | 1989-06-01 | 1994-03-01 | Fuji Photo Film Co., Ltd. | Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative |
JPH035756A (en) * | 1989-06-01 | 1991-01-11 | Fuji Photo Film Co Ltd | Developer for waterless ps plate |
US5035982A (en) * | 1989-07-14 | 1991-07-30 | Eastman Kodak Company | Aqueous developer composition for developing negative working lithographic printing plate |
US5171636A (en) * | 1989-12-12 | 1992-12-15 | Enichem Synthesis S.P.A. | Photochromatic and thermochromatic spiro-oxazepin-oxazine compounds and the process for their preparation |
CA2098169C (en) * | 1992-07-23 | 1998-09-22 | John E. Walls | Aqueous developer for lithographic printing plates with improved desensitizing capability |
DE69315046T2 (en) * | 1992-12-17 | 1998-06-04 | Eastman Kodak Co | Aqueous developer for lithographic printing plates which leads to reduced sludge formation |
US5380623A (en) * | 1992-12-17 | 1995-01-10 | Eastman Kodak Company | Aqueous developer for lithographic printing plates which provides improved oleophilicity |
US7186498B2 (en) | 2003-10-02 | 2007-03-06 | Willi-Kurt Gries | Alkaline developer for radiation sensitive compositions |
EP1521123B1 (en) * | 2003-10-02 | 2013-08-07 | Agfa Graphics N.V. | Alkaline Developer for radiation sensitive compositions |
JP5228631B2 (en) * | 2008-05-29 | 2013-07-03 | 富士フイルム株式会社 | Lithographic printing plate developing treatment solution and method for preparing a lithographic printing plate |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50108005A (en) * | 1974-01-31 | 1975-08-26 | ||
DE3140186A1 (en) * | 1981-10-09 | 1983-04-28 | Hoechst Ag, 6230 Frankfurt | DEVELOPER AND METHOD FOR DEVELOPING EXPOSED NEGATIVE WORKING REPRODUCTION LAYERS |
-
1984
- 1984-05-19 DE DE8484105733T patent/DE3463577D1/en not_active Expired
- 1984-05-19 EP EP84105733A patent/EP0134407B1/en not_active Expired
- 1984-06-29 CA CA000457885A patent/CA1243876A/en not_active Expired
- 1984-07-04 ZA ZA845108A patent/ZA845108B/en unknown
- 1984-08-24 JP JP59175313A patent/JPS6070449A/en active Granted
- 1984-08-24 BR BR8404222A patent/BR8404222A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0134407B1 (en) | 1987-05-06 |
CA1243876A (en) | 1988-11-01 |
EP0134407A1 (en) | 1985-03-20 |
JPH0414783B2 (en) | 1992-03-13 |
BR8404222A (en) | 1985-07-23 |
JPS6070449A (en) | 1985-04-22 |
DE3463577D1 (en) | 1987-06-11 |
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