DK189184A - Vandig alkalisk oploesning og fremgangsmaade til fremkaldelse af positivt-arbejdende reproduktionslag - Google Patents
Vandig alkalisk oploesning og fremgangsmaade til fremkaldelse af positivt-arbejdende reproduktionslag Download PDFInfo
- Publication number
- DK189184A DK189184A DK189184A DK189184A DK189184A DK 189184 A DK189184 A DK 189184A DK 189184 A DK189184 A DK 189184A DK 189184 A DK189184 A DK 189184A DK 189184 A DK189184 A DK 189184A
- Authority
- DK
- Denmark
- Prior art keywords
- inposing
- aque
- procedure
- positive
- reproduction layers
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19823230171 DE3230171A1 (de) | 1982-08-13 | 1982-08-13 | Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten |
PCT/EP1983/000205 WO1984000826A1 (en) | 1982-08-13 | 1983-08-03 | Aqueous alkaline solution and method for developing positively working reproduction layers |
Publications (2)
Publication Number | Publication Date |
---|---|
DK189184A true DK189184A (da) | 1984-04-12 |
DK189184D0 DK189184D0 (da) | 1984-04-12 |
Family
ID=6170811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK1891/84A DK189184D0 (da) | 1982-08-13 | 1984-04-12 | Vandig alkalisk oploesning og fremgangsmaade til fremkaldelse af positivt-arbejdende reproduktionslag |
Country Status (10)
Country | Link |
---|---|
US (1) | US4530895A (da) |
EP (2) | EP0131575B1 (da) |
JP (1) | JPS59501482A (da) |
AU (1) | AU556217B2 (da) |
CA (1) | CA1251678A (da) |
DE (2) | DE3230171A1 (da) |
DK (1) | DK189184D0 (da) |
FI (1) | FI75680C (da) |
WO (1) | WO1984000826A1 (da) |
ZA (1) | ZA835090B (da) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3569703D1 (en) * | 1984-01-17 | 1989-06-01 | Fuji Photo Film Co Ltd | Presensitized plate having an anodized aluminum base with an improved hydrophilic layer |
DE3409888A1 (de) * | 1984-03-17 | 1985-09-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches aufzeichnungsmaterial und dessen verwendung in einem verfahren zum herstellen einer druckform oder einer gedruckten schaltung |
JPS6211852A (ja) * | 1985-07-10 | 1987-01-20 | Nippon Telegr & Teleph Corp <Ntt> | パタ−ン形成方法 |
US4784937A (en) * | 1985-08-06 | 1988-11-15 | Tokyo Ohka Kogyo Co., Ltd. | Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant |
DE3705896A1 (de) * | 1986-02-24 | 1987-08-27 | Tokyo Ohka Kogyo Co Ltd | Verfahren zur herstellung eines fotoresistmusters auf einer substratflaeche und ein dafuer geeignetes schaumentfernungsmittel |
JPH0638159B2 (ja) * | 1986-07-18 | 1994-05-18 | 東京応化工業株式会社 | ポジ型ホトレジスト用現像液 |
DE3884825D1 (de) * | 1987-02-16 | 1993-11-18 | Konishiroku Photo Ind | Entwickler für lichtempfindliche lithographische Druckplatte, gemeinschaftlich verarbeitungsfähig für den Negativ-Typ und den Positiv-Typ und Entwicklerzusammensetzung für lichtempfindliches Material. |
JPS63271256A (ja) * | 1987-04-28 | 1988-11-09 | Konica Corp | 感光材料の現像液組成物 |
US4808513A (en) * | 1987-04-06 | 1989-02-28 | Morton Thiokol, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
US5126230A (en) * | 1987-04-06 | 1992-06-30 | Morton International, Inc. | High contrast, positive photoresist developer containing alkanolamine |
US5094934A (en) * | 1987-04-06 | 1992-03-10 | Morton International, Inc. | Method of developing a high contrast, positive photoresist using a developer containing alkanolamine |
JP2591643B2 (ja) * | 1988-03-03 | 1997-03-19 | コニカ株式会社 | 0−キノンジアジド化合物を含有する感光材料の現像液 |
US4931103A (en) * | 1988-08-11 | 1990-06-05 | E. I. Du Pont De Nemours And Company | Tricholine phosphate surface treating agent |
JPH0470756A (ja) * | 1990-07-11 | 1992-03-05 | Konica Corp | 感光性平版印刷版の現像方法及び現像液 |
DE4027299A1 (de) * | 1990-08-29 | 1992-03-05 | Hoechst Ag | Entwicklerzusammensetzung fuer bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische schichten und verfahren zur entwicklung solcher schichten |
KR100573560B1 (ko) | 1997-10-30 | 2006-08-30 | 가오가부시끼가이샤 | 레지스트용현상액 |
DE69901642T3 (de) | 1998-03-14 | 2019-03-21 | Agfa Nv | Verfahren zur Herstellung einer positiv arbeitenden Druckplatte aus einem wärmeempfindlichem Bildaufzeichnungsmaterial |
TWI221946B (en) | 1999-01-07 | 2004-10-11 | Kao Corp | Resist developer |
US6511790B2 (en) | 2000-08-25 | 2003-01-28 | Fuji Photo Film Co., Ltd. | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
DE60126461T2 (de) | 2000-11-15 | 2007-10-25 | Canon K.K. | Bilderzeugungsverfahren und Bilderzeugungsvorrichtung |
EP1400856B1 (en) | 2002-09-20 | 2011-11-02 | FUJIFILM Corporation | Method of making lithographic printing plate |
US7818154B2 (en) * | 2006-03-17 | 2010-10-19 | Duke University | Monte Carlo based model of fluorescence in turbid media and methods and systems for using same to determine intrinsic fluorescence of turbid media |
TWI678596B (zh) * | 2018-09-13 | 2019-12-01 | 新應材股份有限公司 | 正型光阻組成物及圖案化聚醯亞胺層之形成方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE143920C (da) * | ||||
DE56092C (de) * | 1890-03-09 | 1891-04-29 | C. P. ELIESON in London, England | Gasdruckvorrichtung bei elektrolytischen Elektricitätszählern |
NL110210C (da) * | 1958-08-08 | |||
BE793490A (fr) * | 1972-05-23 | 1973-06-29 | Hunt Chem Corp Philip A | Article sensible a la lumiere comprenant un phenolate de diazoquinone, un liant polymerique, et une diazoquinone-siloxane |
JPS50158280A (da) * | 1974-06-10 | 1975-12-22 | ||
JPS5156226A (ja) * | 1974-11-11 | 1976-05-17 | Sanei Kagaku Kogyo Kk | Hojitaipukankoseijushino genzozai |
JPS534423A (en) * | 1976-07-02 | 1978-01-17 | Hitachi Ltd | Surface plate for color pick up tube |
US4141733A (en) * | 1977-10-25 | 1979-02-27 | Eastman Kodak Company | Development of light-sensitive quinone diazide compositions |
GB1591988A (en) * | 1977-12-29 | 1981-07-01 | Vickers Ltd | Lithographic printing |
DE2834958A1 (de) * | 1978-08-10 | 1980-02-21 | Hoechst Ag | Verfahren zum entwickeln von belichteten lichtempfindlichen druckplatten |
US4294911A (en) * | 1979-06-18 | 1981-10-13 | Eastman Kodak Company | Development of light-sensitive quinone diazide compositions using sulfite stabilizer |
JPS56122130A (en) * | 1980-02-28 | 1981-09-25 | Sharp Corp | Method for forming pattern of thin film transistor |
DE3100856A1 (de) * | 1981-01-14 | 1982-08-12 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
EP0062733B1 (en) * | 1981-04-10 | 1986-01-02 | Shipley Company Inc. | Metal ion-free photoresist developer composition |
US4379830A (en) * | 1981-10-06 | 1983-04-12 | Polychrome Corporation | Developer for positive photolithographic articles |
US4423138A (en) * | 1982-01-21 | 1983-12-27 | Eastman Kodak Company | Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist |
US4464461A (en) * | 1983-07-22 | 1984-08-07 | Eastman Kodak Company | Development of light-sensitive quinone diazide compositions |
-
1982
- 1982-08-13 DE DE19823230171 patent/DE3230171A1/de not_active Withdrawn
-
1983
- 1983-07-13 ZA ZA835090A patent/ZA835090B/xx unknown
- 1983-08-03 EP EP83902527A patent/EP0131575B1/de not_active Expired
- 1983-08-03 JP JP58502585A patent/JPS59501482A/ja active Granted
- 1983-08-03 EP EP83107644A patent/EP0101010A1/de active Pending
- 1983-08-03 WO PCT/EP1983/000205 patent/WO1984000826A1/de active IP Right Grant
- 1983-08-03 US US06/599,189 patent/US4530895A/en not_active Expired - Fee Related
- 1983-08-03 DE DE8383902527T patent/DE3373370D1/de not_active Expired
- 1983-08-03 AU AU18250/83A patent/AU556217B2/en not_active Ceased
- 1983-08-12 CA CA000434469A patent/CA1251678A/en not_active Expired
-
1984
- 1984-04-12 DK DK1891/84A patent/DK189184D0/da not_active Application Discontinuation
- 1984-09-11 FI FI843564A patent/FI75680C/fi not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU1825083A (en) | 1984-03-07 |
AU556217B2 (en) | 1986-10-23 |
DE3373370D1 (en) | 1987-10-08 |
DE3230171A1 (de) | 1984-02-16 |
FI75680B (fi) | 1988-03-31 |
EP0131575B1 (de) | 1987-09-02 |
FI75680C (fi) | 1988-07-11 |
JPS59501482A (ja) | 1984-08-16 |
CA1251678A (en) | 1989-03-28 |
JPH0431105B2 (da) | 1992-05-25 |
EP0131575A1 (de) | 1985-01-23 |
ZA835090B (en) | 1984-03-28 |
FI843564L (fi) | 1984-09-11 |
FI843564A0 (fi) | 1984-09-11 |
US4530895A (en) | 1985-07-23 |
WO1984000826A1 (en) | 1984-03-01 |
EP0101010A1 (de) | 1984-02-22 |
DK189184D0 (da) | 1984-04-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AHB | Application shelved due to non-payment |