ZA824004B - Light-sensitive mixture based on o-naphthoquinonediazides,and light-sensitive copying material prepared therefrom - Google Patents

Light-sensitive mixture based on o-naphthoquinonediazides,and light-sensitive copying material prepared therefrom

Info

Publication number
ZA824004B
ZA824004B ZA824004A ZA824004A ZA824004B ZA 824004 B ZA824004 B ZA 824004B ZA 824004 A ZA824004 A ZA 824004A ZA 824004 A ZA824004 A ZA 824004A ZA 824004 B ZA824004 B ZA 824004B
Authority
ZA
South Africa
Prior art keywords
light
sensitive
diazide
naphthoquinone
naphthoquinonediazides
Prior art date
Application number
ZA824004A
Other languages
English (en)
Inventor
Paul Stahlhofen
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA824004B publication Critical patent/ZA824004B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Developing Agents For Electrophotography (AREA)
ZA824004A 1981-06-25 1982-06-08 Light-sensitive mixture based on o-naphthoquinonediazides,and light-sensitive copying material prepared therefrom ZA824004B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813124936 DE3124936A1 (de) 1981-06-25 1981-06-25 Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Publications (1)

Publication Number Publication Date
ZA824004B true ZA824004B (en) 1983-03-30

Family

ID=6135331

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA824004A ZA824004B (en) 1981-06-25 1982-06-08 Light-sensitive mixture based on o-naphthoquinonediazides,and light-sensitive copying material prepared therefrom

Country Status (11)

Country Link
US (1) US4517275A (ja)
EP (1) EP0068346B1 (ja)
JP (1) JPS585737A (ja)
AT (1) ATE10141T1 (ja)
AU (1) AU8509082A (ja)
BR (1) BR8203685A (ja)
CA (1) CA1213600A (ja)
DE (2) DE3124936A1 (ja)
ES (1) ES513403A0 (ja)
FI (1) FI822257L (ja)
ZA (1) ZA824004B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4735885A (en) * 1985-12-06 1988-04-05 Allied Corporation Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5196517A (en) * 1989-10-30 1993-03-23 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use as photoactive compounds
US5019478A (en) * 1989-10-30 1991-05-28 Olin Hunt Specialty Products, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5219714A (en) * 1989-10-30 1993-06-15 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5618932A (en) * 1995-05-24 1997-04-08 Shipley Company, L.L.C. Photoactive compounds and compositions
US6461794B1 (en) * 1999-08-11 2002-10-08 Kodak Polychrome Graphics Llc Lithographic printing forms

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE510563A (ja) * 1949-07-23
BE508016A (ja) * 1950-12-23
BE586713A (ja) * 1959-01-21
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS53494B2 (ja) * 1972-09-08 1978-01-09
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
DE3040157A1 (de) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Also Published As

Publication number Publication date
CA1213600A (en) 1986-11-04
ATE10141T1 (de) 1984-11-15
EP0068346B1 (de) 1984-10-31
JPH0339301B2 (ja) 1991-06-13
FI822257L (fi) 1982-12-26
DE3261128D1 (en) 1984-12-06
BR8203685A (pt) 1983-06-21
EP0068346A1 (de) 1983-01-05
DE3124936A1 (de) 1983-01-20
JPS585737A (ja) 1983-01-13
AU8509082A (en) 1983-01-06
ES8404065A1 (es) 1984-04-01
FI822257A0 (fi) 1982-06-23
US4517275A (en) 1985-05-14
ES513403A0 (es) 1984-04-01

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